Mr. Masakazu Hamaji Profile

Masakazu Hamaji

Manager at Nippon Control System Corp

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Author

Publications (12)

Proceedings Article | 20 November 2024 Poster + Paper

Enhancing mask process correction on curvilinear data with Bézier curve representation

Ai Kaneko, Yohei Sogabe, So Yanaihara, Toshikazu Nagatani, Taigo Fujii, Tomokazu Hayashi, Masakazu Hamaji

Proceedings Volume 13216, 1321622 (2024) https://doi.org/10.1117/12.3034585

KEYWORDS: Data corrections, Data processing, Bias correction, Tolerancing, Deformation, Data conversion, Metals, Error analysis, SRAF, Mask making

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Proceedings Article | 12 November 2024 Poster + Paper

Practical challenges of Bézier curves in mask data preparation

Masakazu Hamaji, Rie Funoki, Taigo Fujii, Aki Shigeta, Tomokazu Hayashi, Shuichiro Ohara

Proceedings Volume 13216, 1321621 (2024) https://doi.org/10.1117/12.3034563

KEYWORDS: Tolerancing, Semiconducting wafers, Data processing, Data conversion

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Proceedings Article | 29 September 2023 Paper

The impact of real curve layout in mask data preparation

Masakazu Hamaji, Toshikazu Hayashi, Aki Shigeta, Rie Funoki, Shuichiro Ohara

Proceedings Volume 12915, 129150C (2023) https://doi.org/10.1117/12.2687544

KEYWORDS: Tolerancing, Optical proximity correction, Mathematical optimization, Algorithm development, Manufacturing, Lithography, Photomasks

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Proceedings Article | 29 September 2023 Paper

New multi-beam mask data preparation method for EUV high volume data

Kyungsup Shin, Sunyoung Kim, Jihyeon Choi, Eokbong Kim, Sanghee Lee, Harald Hoeller-Lugmayr, Amir Moqanaki, Annette Schnettelker, Mathias Tomandl, Christof Zillner, Yohei Torigoe, Taigo Fujii, Ryunosuke Miyake, Mizuki Odaka, Issei Masumoto, Masakazu Hamaji

Proceedings Volume 12915, 129150D (2023) https://doi.org/10.1117/12.2683168

KEYWORDS: Extreme ultraviolet, Design and modelling, Electronic design automation, Algorithm development, Mathematical optimization, Data conversion, Product engineering, Optical proximity correction, Nanofabrication, Lithography

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Proceedings Article | 12 October 2021 Presentation + Paper

File formats for curvilinear multi-beam writing of 193i and EUV masks

Christof Zillner, Amir Moqanaki, Harald Höller, Elmar Platzgummer, Masakazu Hamaji, Taigo Fujii

Proceedings Volume 11855, 1185512 (2021) https://doi.org/10.1117/12.2602375

KEYWORDS: Photomasks, Extreme ultraviolet, Information technology, Data processing, Data conversion, Data storage, Extreme ultraviolet lithography, Data corrections

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Proceedings Article | 13 October 2020 Poster + Paper

Mask contribution to OPC model accuracy

Adam Lyons, Tom Wallow, Christoph Hennerkes, Chris Spence, Maxence Delorme, David Rio, Dai Tsunoda, Yohei Torigoe, Masakazu Hamaji

Proceedings Volume 11517, 115171D (2020) https://doi.org/10.1117/12.2573160

KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Process modeling, Extreme ultraviolet, Semiconducting wafers, Metrology, Calibration, Finite element methods

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Proceedings Article | 3 October 2018 Paper

Applying MPC for EUV mask fabrication

Dai Tsunoda, Yohei Torigoe, Yutaro Sato, Masakazu Hamaji, Gek-Soon Chua, Christian Bürgel

Proceedings Volume 10810, 108101H (2018) https://doi.org/10.1117/12.2502068

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Calibration, Extreme ultraviolet lithography, Critical dimension metrology, Mask making

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Proceedings Article | 16 October 2017 Presentation + Paper

Manufacturing challenges for curvilinear masks

Chris Spence, Quan Zhang, Vincent Shu, Been-Der Chen, Stanislas Baron, Yasuko Saito, Masakazu Hamaji, Yasuaki Horima, Shuichiro Ohara

Proceedings Volume 10451, 1045104 (2017) https://doi.org/10.1117/12.2280470

KEYWORDS: Photomasks, Optical proximity correction, Lithography, SRAF, Mask making, Process modeling

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Proceedings Article | 4 October 2016 Paper

OPC care-area feedforwarding to MPC

Brian Dillon, Yi-Hsing Peng, Masakazu Hamaji, Dai Tsunoda, Tomoyuki Muramatsu, Shuichiro Ohara, Yi Zou, Vincent Arnoux, Stanislas Baron, Xiaolong Zhang

Proceedings Volume 9985, 99851A (2016) https://doi.org/10.1117/12.2242972

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Modulation, Beam shaping, Metals, SRAF, Control systems, Source mask optimization

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Proceedings Article | 8 October 2014 Paper

General shot refinement technique on fracturing of curvilinear shape for VSB mask writer

Takuya Tao, Nobuyasu Takahashi, Masakazu Hamaji, Jisoong Park, Sukho Lee, Sunghoon Park

Proceedings Volume 9235, 923521 (2014) https://doi.org/10.1117/12.2069240

KEYWORDS: Photomasks, Vestigial sideband modulation, Ions, Lithography, Resolution enhancement technologies, Optical proximity correction, Modulation, Data processing, Model-based design, Control systems

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Proceedings Article | 9 September 2013 Paper

Novel fracturing algorithm to reduce shot count for curvy shape

Takuya Tao, Nobuyasu Takahashi, Masakazu Hamaji

Proceedings Volume 8880, 88802J (2013) https://doi.org/10.1117/12.2030796

KEYWORDS: Photomasks, Model-based design, Detection and tracking algorithms, Vestigial sideband modulation, Algorithm development, Lithography, Modulation, SRAF, Resolution enhancement technologies, Computer simulations

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Proceedings Article | 25 September 2010 Paper

Study of data I/O performance on distributed disk system in mask data preparation

Shuichiro Ohara, Hiroyuki Odaira, Tomoyuki Chikanaga, Masakazu Hamaji, Yasuharu Yoshioka

Proceedings Volume 7823, 78233C (2010) https://doi.org/10.1117/12.864250

KEYWORDS: Nondestructive evaluation, Distributed computing, Data storage servers, Databases, Data storage, Data communications, Control systems, Photomask technology, Current controlled current source, Data conversion

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Showing 5 of 12 publications

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