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Dr. Qiang Zhang
at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 16 October 2017 Paper
Dark field technology for EUV and optical mask blank inspection
Qiuping Nie, David Aupperle, Alexander Tan, Bill Kalsbeck, Qiang Zhang, Gregg Inderhees
Proceedings Volume 10451, 104511D (2017) https://doi.org/10.1117/12.2281057
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Reticles, Scattering, Light scattering, Particles, EUV optics, Defect detection, Optics manufacturing
Proceedings Article | 29 September 2010 Paper
Extending a 193 nm mask inspector for 22 nm HP EUV mask inspection
Proceedings Volume 7823, 78231Q (2010) https://doi.org/10.1117/12.865839
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Polarization, Extreme ultraviolet lithography, Reticles, Modulation, Defect inspection, Data modeling, Lithography
Proceedings Article | 25 May 2010 Paper
EUV mask inspection with 193 nm inspector for 32 and 22 nm HP
Proceedings Volume 7748, 77481Y (2010) https://doi.org/10.1117/12.864093
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Modulation, Lithography, Image enhancement, Reflectivity, Polarization
Proceedings Article | 20 March 2010 Paper
Mask inspection technologies for 22nm HP and beyond
Proceedings Volume 7636, 76360V (2010) https://doi.org/10.1117/12.850766
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Modulation, Lithography, Image enhancement, Reflectivity, Polarization
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