Dr. Steven Brems Profile

Dr. Steven Brems

Principle Member of Technical Staff at imec

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Publications (8)

Proceedings Article | 10 April 2024 Presentation + Paper

Unraveling strength and mechanical properties of CNT-based EUV pellicle

Hyun-Gyu Kang, Ivan Pollentier, Marina Timmermans, Steven Brems, Emily Gallagher

Proceedings Volume 12953, 129530M (2024) https://doi.org/10.1117/12.3010378

KEYWORDS: Pellicles, Extreme ultraviolet lithography, Scanners, Permeability, Extreme ultraviolet, Plasma, Materials properties, Resistance, Hydrogen, Fabrication

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Proceedings Article | 30 November 2023 Paper

Wafer-scale graphene electro-absorption modulators fabricated in a 300 mm CMOS platform

Didit Yudistira, Chenghan Wu, Steven Brems, Daire Cott, Alexey Milenin, Kevin Vandersmissen, Arantxa Maestre, Alba Centeno, Amaia Zurutuza, Joris Van Campenhout, Cedric Huyghebaert, Inge Asselberghs, Dries Van Thourhout, Marianna Pantouvaki

Proceedings Volume 12794, 1279408 (2023) https://doi.org/10.1117/12.3008414

KEYWORDS: Graphene, Semiconducting wafers, Resistance, Etching, Silicon, Metals, Chemical mechanical planarization, Waveguides, Oxides, Capacitance

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SPIE Journal Paper | 27 July 2021

Carbon nanotube EUV pellicle tunability and performance in a scanner-like environment

Marina Timmermans, Ivan Pollentier, Maxim Korytov, Thomas Nuytten, Stefanie Sergeant, Thierry Conard, Johan Meersschaut, Yide Zhang, Masoud Dialameh, Wilfried Alaerts, Ehsan Jazaeri, Valentina Spampinato, Alexis Franquet, Steven Brems, Cedric Huyghebaert, Emily Gallagher

JM3, Vol. 20, Issue 03, 031010, (July 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.031010

KEYWORDS: Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Raman spectroscopy, Scanners, Carbon, Carbon nanotubes, Plasma, Particles, Coating

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Background: An extreme ultraviolet (EUV)-transparent pellicle must be used during lithography to protect the photomask from fall-on particles. A pellicle made of free-standing carbon nanotube (CNT) films stops particles despite the presence of gaps while demonstrating high EUV transmission, mechanical stability, low EUV scattering and reflectivity, and DUV transmission that enables through-pellicle mask inspection. Aim: The CNT EUV pellicle properties can be tailored based on the diversity of CNT structures and tunability of their configuration within the CNT film (density, bundle size, composition, etc.) as shown in this work. A remaining challenge is extending the CNT EUV pellicle lifetime in the scanner environment of EUV-induced hydrogen-based plasma, and the effects on different CNT films are explored here. Approach: Optical and thermal properties of different CNT pellicles with respect to the CNT material type, density, composition, and bundle size were explored. The ability of uncoated CNT EUV pellicles to withstand high EUV powers in the hydrogen-based environment was tested. Transmission, spectroscopic, and chemical mapping of the exposed CNT membranes were performed to explore the material modifications under various exposure conditions. Results: Uncoated CNT pellicles withstand 600-W source power equivalent in the EUV scanner-like gas environment but exhibit structural changes with prolonged exposure. Multiwalled CNT pellicles exhibit less EUV transmission change as compared to single-walled CNT pellicles under the same exposure conditions. The protection of CNT material from structural degradation by means of coating was shown. Conclusions: These investigations add to the understanding of CNT EUV pellicle tunability for optimal performance and lifetime limiters of CNT pellicles under the influence of EUV radiation and plasma. We anticipate the need for coating the CNT pellicle to protect the CNT material against plasma damage for the current scanner conditions. Optimization of both the CNT membrane and its coating is in progress.

SPIE Journal Paper | 8 June 2021

EUV scattering from carbon nanotube pellicles: measurement and control

Ivan Pollentier, Marina Timmermans, Cedric Huyghebaert, Steven Brems, Emily Gallagher, Bernhard Lüttgenau, Sascha Brose

JM3, Vol. 20, Issue 02, 021007, (June 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.021007

KEYWORDS: Pellicles, Extreme ultraviolet, Scattering, Extreme ultraviolet lithography, Scanners, Carbon nanotubes, Sensors, Printing, Distance measurement, Scatter measurement

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Proceedings Article | 23 March 2021 Presentation + Paper

CNT EUV pellicle tunability and performance in a scanner-like environment

Proceedings Volume 11609, 116090Y (2021) https://doi.org/10.1117/12.2584519

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon nanotubes, Scanners, Plasma, Thermography, Photomask technology, Hydrogen, Spectroscopy

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Proceedings Article | 12 March 2021 Presentation + Paper

EUV scattering from CNT pellicles: measurement and control

Ivan Pollentier, Marina Timmermans, Cedric Huyghebaert, Steven Brems, Emily Gallagher, Bernhard Luettgenau, Sascha Brose

Proceedings Volume 11609, 1160911 (2021) https://doi.org/10.1117/12.2584718

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Proceedings Article | 23 March 2020 Presentation + Paper

The EUV CNT pellicle: balancing material properties to optimize performance

Ivan Pollentier, Marina Timmermans, Cedric Huyghebaert, Steven Brems, Emily Gallagher

Proceedings Volume 11323, 113231G (2020) https://doi.org/10.1117/12.2552357

KEYWORDS: Pellicles, Extreme ultraviolet, Particles, Coating, Atmospheric particles, Extreme ultraviolet lithography, Scattering, Light scattering, Scanners

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Proceedings Article | 28 April 2017 Presentation

New materials for modulators and switches in silicon photonics (Conference Presentation)

Dries Van Thourhout, Marianna Pantouvaki, Herbert D'Heer, Koen Alexander, Bart Kuyken, Inge Asselberghs, Steven Brems, Cedric Huyghebaert, Leili Abdollahi Shiramin, Chiara Alessandri, John George, Jeroen Beeckman, Min-Hsiang Hsu, Clement Merckling, Joris Van Campenhout

Proceedings Volume 10108, 1010803 (2017) https://doi.org/10.1117/12.2253679

KEYWORDS: Current controlled current source, Modulators, Silicon photonics, Switches, Silicon, Integration, Photonic integrated circuits, Graphene, Ferroelectric materials

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Showing 5 of 8 publications

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