Mr. Sung-Won Kwon Profile

Sung-Won Kwon

at SAMSUNG Electronics Co Ltd

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Publications (6)

Proceedings Article | 16 October 2017 Presentation

EUV mask readiness for HVM (Conference Presentation)

Heebom Kim, Chang Young Jeong, Donggun Lee, Ji Hoon Na, Hwan-Seok Seo, Mun Ja Kim, Sung-Won Kwon, Chan-Uk Jeon

Proceedings Volume 10451, 104510I (2017) https://doi.org/10.1117/12.2280687

KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Inspection, Extreme ultraviolet lithography, High volume manufacturing, Scanners, Transmittance

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Proceedings Article | 18 March 2015 Paper

High coverage of litho hotspot detection by weak pattern scoring

Jinho Park, NamJae Kim, Jae-hyun Kang, Seung Weon Paek, Steve Kwon, Marwah Shafee, Kareem Madkour, Wael ElManhawy, Joe Kwan, Jean-Marie Brunet

Proceedings Volume 9427, 942703 (2015) https://doi.org/10.1117/12.2087473

KEYWORDS: Phase modulation, Lithography, Image classification, Library classification systems, Visualization, Process modeling, Design for manufacturing, Manufacturing, Yield improvement, Land mines

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Achieving lithographic printability at advanced nodes (14nm and beyond) can impose significant restrictions on physical design, including large numbers of complex design rule checks (DRC) and compute-intensive detailed process model checking. Early identifying of yield-limiter hotspots is essential for both foundries and designers to significantly improve process maturity. A real challenge is to scan the design space to identify hotspots, and decide the proper course of action regarding each hotspot. Building a scored pattern library with real candidates for hotspots for both foundries and designers is of great value. Foundries are looking for the most used patterns to optimize their technology for and identify patterns that should be forbidden, while designers are looking for the patterns that are sensitive to their neighboring context to perform lithographic simulation with their context to decide if they are hotspots or not.[1] In this paper we propose a framework to data mine designs to obtain set of representative patterns of each design, our aim is to sample the designs at locations that can be potential yield limiting. Though our aim is to keep the total number of patterns as small as possible to limit the complexity, still the designer is free to generate layouts results in several million of patterns that define the whole design space. In order to handle the large number of patterns that represent the design building block constructs, we need to prioritize the patterns according to their importance. The proposed pattern classification methodology depends on giving scores to each pattern according to the severity of hotspots they cause, the probability of their presence in the design and the likelihood of causing a hotspot. The paper also shows how the scoring scheme helps foundries to optimize their master pattern libraries and priorities their efforts in 14nm technology and beyond. Moreover, the paper demonstrates how the hotspot scoring helps in improving the runtime of lithographic simulation verification by identifying which patterns need to be optimized to correctly describe candidate hotspots, so that only potential problematic patterns are simulated.

Proceedings Article | 25 September 2010 Paper

Plasma monitoring of chrome dry etching for mask making

Sung-Won Kwon, Dong-Chan Kim, Dong-Seok Nam, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 7823, 78230F (2010) https://doi.org/10.1117/12.866828

KEYWORDS: Etching, Chromium, Plasma, Photomasks, Plasma etching, Oxygen, Chlorine, Dry etching, Emission spectroscopy, Mask making

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Proceedings Article | 14 May 2007 Paper

Study of mask structure for 45-nm node based on manufacturability and lithographic performance

Jong Gul Doh, Cheol Hong Park, Yong Seung Moon, Bo Hye Kim, Sung Won Kwon, Sun Young Choi, Sung Hyuck Kim, Seong Yoon Kim, Byung Gook Kim, Sang Gyun Woo, Han Ku Cho

Proceedings Volume 6607, 66071U (2007) https://doi.org/10.1117/12.728977

KEYWORDS: Photomasks, Binary data, Chromium, Etching, Absorbance, Lithography, Manufacturing, Semiconducting wafers, Optical simulations, Electron beam lithography

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Proceedings Article | 20 May 2006 Paper

Photomask dry-etching techniques for hard mask

Sung-Won Kwon, Young-Ju Park, Sung-Yoon Kim, Han-shin Lee, Hyuk-Joo Kwon, Seung-Woon Choi, Woo-Sung Han

Proceedings Volume 6283, 62831T (2006) https://doi.org/10.1117/12.681756

KEYWORDS: Etching, Photomasks, Dry etching, Photoresist processing, Chlorine, Plasma etching, Chemistry, Critical dimension metrology, Plasma, Lead

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Proceedings Article | 28 August 2003 Paper

Investigation on micro-trench formation of alternating aperture phase shift masks

Sung-Won Kwon, Heong-Sup Jeong, Lee-Ju Kim, Chang-Nam Ahn, Hong-Seok Kim

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504175

KEYWORDS: Etching, Photomasks, Quartz, Fluorine, Surface roughness, Scanning electron microscopy, Ions, Atomic force microscopy, Phase shifts, Plasma systems

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Showing 5 of 6 publications

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