Dr. Taegeun Kim Profile

Dr. Taegeun Kim

Senior Engineer at SAMSUNG Electronics Co Ltd

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Author

Publications (4)

Proceedings Article | 1 April 2013 Paper

Effects of multilayer period on EUVL imaging for 2X node and beyond

Su-Young Lee, Hwan-Seok Seo, Tae-Geun Kim, Sang-Hyun Kim, Roman Chalykh, Seong-Sue Kim, Chan-Uk Jeon

Proceedings Volume 8679, 867903 (2013) https://doi.org/10.1117/12.2011076

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Cadmium, Neodymium, Ions, Wafer-level optics

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Proceedings Article | 23 March 2012 Paper

Printability study of pattern defects in the EUV mask as a function of hp nodes

Tae-Geun Kim, Hwan-Seok Seo, In-Yong Kang, Chang Young Jeong, Sungmin Huh, Jihoon Na, Seong-Sue Kim, Chan-Uk Jeon, Iacopo Mochi, Kenneth Goldberg

Proceedings Volume 8322, 83220A (2012) https://doi.org/10.1117/12.916052

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Scanning electron microscopy, Scanners, Lithography, Photoresist processing, Semiconductors

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Proceedings Article | 14 October 2011 Paper

EUVL mask inspection using 193nm wavelength for 30nm node and beyond

Jihoon Na, Wonil Cho, Tae-Geun Kim, In-Yong Kang, Byungcheol Cha, Inkyun Shin, Han-Ku Cho

Proceedings Volume 8166, 81661H (2011) https://doi.org/10.1117/12.898896

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Extreme ultraviolet lithography, Modulation, Defect detection, Scanning electron microscopy, Scanners, Reflectivity, Wafer-level optics

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Proceedings Article | 20 March 2010 Paper

Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

Hwan-Seok Seo, Dong-Gun Lee, Byung-Sup Ahn, Cha-Won Koh, In-Yong Kang, Tae Geun Kim, Hoon Kim, Dongwan Kim, Seong-Sue Kim, Han-Ku Cho

Proceedings Volume 7636, 76360X (2010) https://doi.org/10.1117/12.847955

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Lithography, Inspection, Line width roughness, Scanners, Critical dimension metrology, Electroluminescence

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