Dr. Su-Young Lee Profile

Dr. Su-Young Lee

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 10 April 2024 Poster

Validation of high-throughput AFM for copper pad metrology in high volume manufacturing

Kyung Souk Yi, Min Hong, Jiyeon Kim, Eunpa Kim, Kwang Soo Kim, Kyong Wook Noh, Su-Young Lee, Myungjun Lee, Yusin Yang, Hokyun Chin, Arseniy Kalinin, Irene Battisti, Erik Simons, Seokhan Kim, ShihWei Yu, Nelda Antonovaité, Niranjan Saikumar, Rudolf Wilhelm, Hamed Sadeghian

Proceedings Volume 12955, 129552U (2024) https://doi.org/10.1117/12.3010488

KEYWORDS: Semiconducting wafers, High volume manufacturing, Metrology, Copper, Chemical mechanical planarization, Surface finishing, Semiconductor manufacturing, Process control, Miniaturization, Atomic force microscopy

Proceedings Article | 10 April 2024 Presentation + Paper

E-beam simulation for advanced SEM applications in semiconductor industry

Wooyoung Cheon, Taejin Moon, In Kwon, Jinwoo Lee, Jaeyong Lee, Yongjae Kwon, Ashok Ramu, Seonghoon Jin, Tsuji Yukihide, Hyunwoo Chae, Chulwoo Park, Hyunsuk Choi, Kwangseok Lee, Byungseong Ahn, Jaehun Yang, Ami Ma, Qhwan Kim, Donghyeok Im, Jaehyun Bae, Jongcheon Sun, Su-Young Lee, Shinwook Yi, Jiseong Doh, Kyu Baik Chang, Songyi Han, Jaehoon Jeong, Yusin Yang, Dae Sin Kim

Proceedings Volume 12955, 129551J (2024) https://doi.org/10.1117/12.3010074

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, TCAD, Scattering, Inspection, Semiconductors, Computer simulations, Physics, Critical dimension metrology

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Proceedings Article | 27 April 2023 Presentation + Paper

Massive overlay metrology solution by realizing imaging Mueller matrix spectroscopic ellipsometry

Jaehyeon Son, Juntaek Oh, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee

Proceedings Volume 12496, 124960L (2023) https://doi.org/10.1117/12.2657414

KEYWORDS: Overlay metrology, Mueller matrices, Semiconducting wafers, Spectroscopic ellipsometry, Critical dimension metrology, Imaging spectroscopy, Metrology, Polarization, Polysomnography, Image sensors

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Proceedings Article | 27 April 2023 Paper

Wide-field massive CD metrology based on the imaging Mueller-matrix ellipsometry for semiconductor devices

Juntaek Oh, Jaehyeon Son, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee

Proceedings Volume 12496, 124962X (2023) https://doi.org/10.1117/12.2658131

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Metrology, Semiconductors, Mueller matrices, Ellipsometry, Inspection

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Proceedings Article | 27 April 2023 Presentation + Paper

Mueller matrix metrology with multi-angle information using multiple self-interference

Garam Choi, Jinyong Kim, Daehoon Han, Young-Uk Jin, Soonhong Hwang, Jinseob Kim, Wookrae Kim, Jaehwang Jung, Seungwoo Lee, Taejoong Kim, Jinwoo Ahn, Myungjun Lee, Gideok Kim, Su-Young Lee, Yusin Yang

Proceedings Volume 12496, 1249610 (2023) https://doi.org/10.1117/12.2657852

KEYWORDS: Mueller matrices, Line edge roughness, Polarization, Metrology, Simulations, Critical dimension metrology, Holograms, Ellipsometry, Holography

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Proceedings Article | 28 July 2014 Paper

Ruthenium (Ru) peeling and predicting robustness of the capping layer using finite element method (FEM) modeling

Il-Yong Jang, Arun John, Frank Goodwin, Su-Young Lee, Byung-Gook Kim, Seong-Sue Kim, Chan-Uk Jeon, Jae Hyung Kim, Yong Hoon Jang

Proceedings Volume 9256, 92560I (2014) https://doi.org/10.1117/12.2069991

KEYWORDS: Ruthenium, Silicon, Extreme ultraviolet, Finite element methods, Interfaces, Oxides, Oxygen, Neodymium, Photomasks, Oxidation

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Proceedings Article | 17 April 2014 Paper

Durability of Ru-based EUV masks and the improvement

Suyoung Lee, Jungyoup Kim, Soo-Wan Koh, Ilyong Jang, Jaehyuck Choi, Hyungho Ko, Hwan-Seok Seo, Seong-Sue Kim, Byung Gook Kim, Chan-Uk Jeon

Proceedings Volume 9048, 90480J (2014) https://doi.org/10.1117/12.2046556

KEYWORDS: Ruthenium, Ultraviolet radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Transmission electron microscopy, Photomasks, Silica, Scanning electron microscopy, Annealing, Oxygen

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Proceedings Article | 1 April 2013 Paper

Effects of multilayer period on EUVL imaging for 2X node and beyond

Su-Young Lee, Hwan-Seok Seo, Tae-Geun Kim, Sang-Hyun Kim, Roman Chalykh, Seong-Sue Kim, Chan-Uk Jeon

Proceedings Volume 8679, 867903 (2013) https://doi.org/10.1117/12.2011076

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Cadmium, Neodymium, Ions, Wafer-level optics

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Proceedings Article | 17 October 2008 Paper

Analysis of process margin in EUV mask repair with nano-machining

Su-Young Lee, Geun-Bae Kim, Hong-Seok Sim, Sang-Hyeon Lee, Hwa-Sung Kim, Jung-Hwan Lee, Hwan-Seok Seo, Hak-Seung Han, Seong-Sue Kim, Seong-Yong Moon, Sang-Gyun Woo, Ron Bozak, Andrew Dinsdale, Tod Robinson, David Lee, HanKu Cho

Proceedings Volume 7122, 71222I (2008) https://doi.org/10.1117/12.801415

KEYWORDS: Photomasks, Extreme ultraviolet, Error analysis, Extreme ultraviolet lithography, Scanning electron microscopy, Semiconducting wafers, Diffractive optical elements, Image processing, Critical dimension metrology, Factor analysis

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Proceedings Article | 14 May 2007 Paper

Requirements of nano-machining repair system for 45-nm node

Sang-Hyeon Lee, Hwa-Sung Kim, Hong-Seok Shim, Su-Young Lee, Geun-Bae Kim, Hyuk-Joo Kwon, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 6607, 660712 (2007) https://doi.org/10.1117/12.728951

KEYWORDS: Scanning electron microscopy, Photomasks, Diamond, Neodymium, Critical dimension metrology, Chromium, Quartz, Transmittance, Adhesives, Atomic force microscopy

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Showing 5 of 10 publications

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