Mr. Il-Yong Jang Profile

Il-Yong Jang

Sr Member of Technical Staff at Toppan Photomask Inc

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Author

Publications (20)

Proceedings Article | 17 November 2016 Paper

Improvement of photomask CD uniformity using spatially resolved optical emission spectroscopy

Junhwa Jung, Youngkeun Kim, Il-Yong Jang, Byung-Gook Kim, Chan-Uk Jeon, Minwook Kang, Changmin Lee, Jae Hahn

Proceedings Volume 9985, 99851S (2016) https://doi.org/10.1117/12.2242406

KEYWORDS: Photomasks, Etching, Plasma, Chromium, Argon, Dry etching, Chlorine, Emission spectroscopy, Critical dimension metrology, Plasma etching

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SPIE Journal Paper | 15 May 2015 Open Access

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas Pistor, Gregory Denbeaux

JM3, Vol. 14, Issue 02, 023505, (May 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.2.023505

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Chemical species, Inspection, Computer simulations, Interfaces, Transmission electron microscopy, Modeling and simulation, Waveguides

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Proceedings Article | 16 March 2015 Paper

Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

Proceedings Volume 9422, 94220Q (2015) https://doi.org/10.1117/12.2175842

KEYWORDS: Photomasks, Extreme ultraviolet, Multilayers, Chemical species, Extreme ultraviolet lithography, Inspection, Monte Carlo methods, Computer simulations, Waveguides, Transmission electron microscopy

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Proceedings Article | 28 July 2014 Paper

Ruthenium (Ru) peeling and predicting robustness of the capping layer using finite element method (FEM) modeling

Il-Yong Jang, Arun John, Frank Goodwin, Su-Young Lee, Byung-Gook Kim, Seong-Sue Kim, Chan-Uk Jeon, Jae Hyung Kim, Yong Hoon Jang

Proceedings Volume 9256, 92560I (2014) https://doi.org/10.1117/12.2069991

KEYWORDS: Ruthenium, Silicon, Extreme ultraviolet, Finite element methods, Interfaces, Oxides, Oxygen, Neodymium, Photomasks, Oxidation

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Proceedings Article | 17 April 2014 Paper

Durability of Ru-based EUV masks and the improvement

Suyoung Lee, Jungyoup Kim, Soo-Wan Koh, Ilyong Jang, Jaehyuck Choi, Hyungho Ko, Hwan-Seok Seo, Seong-Sue Kim, Byung Gook Kim, Chan-Uk Jeon

Proceedings Volume 9048, 90480J (2014) https://doi.org/10.1117/12.2046556

KEYWORDS: Ruthenium, Ultraviolet radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Transmission electron microscopy, Photomasks, Silica, Scanning electron microscopy, Annealing, Oxygen

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Proceedings Article | 17 April 2014 Paper

Investigating printability of native defects on EUV mask blanks through simulations and experiments

Mihir Upadhyaya, Vibhu Jindal, Henry Herbol, Il-Yong Jang, Hyuk Joo Kwon, Jenah Harris-Jones, Gregory Denbeaux

Proceedings Volume 9048, 90483L (2014) https://doi.org/10.1117/12.2057761

KEYWORDS: Finite-difference time-domain method, Photomasks, Chemical species, Transmission electron microscopy, Multilayers, Extreme ultraviolet lithography, Extreme ultraviolet, Monte Carlo methods, Atomic force microscopy, Inspection

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Proceedings Article | 3 October 2013 Paper

Investigation of EUVL reticle capping layer peeling under wet cleaning

Sherjang Singh, Davide Dattilo, Uwe Dietze, Arun Kadaksham, Il-Yong Jang, Frank Goodwin

Proceedings Volume 8880, 888010 (2013) https://doi.org/10.1117/12.2031430

KEYWORDS: Lamps, Photomasks, Extreme ultraviolet lithography, Ruthenium, Oxygen, Mercury, Reticles, Semiconducting wafers, Reflectivity, Ultraviolet radiation

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Proceedings Article | 28 June 2013 Paper

Defect printability studies at SEMATECH

Il-Yong Jang, Ranganath Teki, Vibhu Jindal, Frank Goodwin, Masaki Satake, Ying Li, Danping Peng, Sungmin Huh, Seong-Sue Kim

Proceedings Volume 8701, 870111 (2013) https://doi.org/10.1117/12.2028069

KEYWORDS: Semiconducting wafers, Double positive medium, Photomasks, Critical dimension metrology, Data modeling, Calibration, Extreme ultraviolet, Extreme ultraviolet lithography, Printing, Inspection

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Proceedings Article | 1 April 2013 Paper

Defect printability comparing actinic printing with advanced simulation for EUV masks

Il-Yong Jang, Ranganath Teki, Vibhu Jindal, Frank Goodwin, Masaki Satake, Ying Li, Danping Peng, Sungmin Huh, Seong-Sue Kim

Proceedings Volume 8679, 86790H (2013) https://doi.org/10.1117/12.2011493

KEYWORDS: Semiconducting wafers, Double positive medium, Photomasks, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Transmission electron microscopy, Critical dimension metrology, Inspection, Software development

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Proceedings Article | 8 November 2012 Paper

The E-beam resist test facility: performance testing and benchmarking of E-beam resists for advanced mask writers

Matt Malloy, Il Yong Jang, Mac Mellish, Lloyd Litt, Ananthan Raghunathan, John Hartley

Proceedings Volume 8522, 85220N (2012) https://doi.org/10.1117/12.978665

KEYWORDS: Photomasks, Photoresist processing, Semiconducting wafers, Metrology, Line width roughness, Silicon, Finite element methods, Polymers, Electron beam lithography, Extreme ultraviolet

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With each new generation of e-beam mask writers comes the ability to write leading edge photomasks with improved patterning performance and increased throughput. However, these cutting-edge e-beam tools are often used with older generation resists, preventing the end-user from taking full advantage of the tool’s potential. The generation gap between tool and resist will become even more apparent with the commercialization of multi-beam mask writers, which are expected to be available for pilot line use around 2015. The mask industry needs resists capable of meeting the resolution, roughness, and sensitivity requirements of these advanced tools and applications.

The E-beam Resist Test Facility (ERTF) has been established to fill the need for consortium-based testing of e-beam resists for mask writing applications on advanced mask writers out to the 11nm half-pitch node and beyond. SEMATECH and the College of Nanoscale Science and Engineering (CNSE) began establishing the ERTF in early 2012 to test e-beam resist samples from commercial suppliers and university labs against the required performance metrics for each application at the target node. Operations officially began on June 12, 2012, at which time the first e-beam resist samples were tested. The ERTF uses the process and metrology infrastructure available at CNSE, including a Vistec VB300 Vectorscan e-beam tool adjusted to operate at 50kv. Initial testing results show that multiple resists already meet, or are close to meeting, the resolution requirements for mask writing at the 11nm node, but other metrics such as line width roughness still need improvement.

An overview of the ERTF and its capabilities is provided here. Tools, baseline processes, and operation strategy details are discussed, and resist testing and benchmarking results are shown. The long-term outlook for the ERTF and plans to expand capability and testing capacity, including resist testing for e-beam direct write lithography, are also discussed.

Proceedings Article | 14 October 2011 Paper

30nm full field quartz template replicated from Si master for FLASH active layer NIL

Duhyun Lee, Byung-Kyu Lee, Woong Ko, Jae-Kwan Kim, Kiyeon Yang, Byounghoon Seung, Ilyong Jang, Mun Ja Kim, Byunggook Kim, ChangMin Park, Jeongho Yeo, Changyoul Moon

Proceedings Volume 8166, 81661U (2011) https://doi.org/10.1117/12.898747

KEYWORDS: Quartz, Silicon, Etching, Nanoimprint lithography, Chromium, Oxides, Photomasks, Line width roughness, Electron beam lithography, Semiconducting wafers

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Proceedings Article | 11 May 2009 Paper

The novel plasma etching process for defect reduction in photomask fabrication

Ji-Hyun Lee, Il-Yong Jang, Yu Suk Jeong, Byounghoon Seung, Seong-Yong Moon, Sang-Gyun Woo, Han Ku Cho

Proceedings Volume 7379, 737906 (2009) https://doi.org/10.1117/12.824247

KEYWORDS: Etching, Chromium, Plasma, Fluorine, Particles, Chlorine, Dielectrics, Plasma etching, Photomasks, Aluminum

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Proceedings Article | 17 October 2008 Paper

Control of the sidewall angle of an absorber stack using the Faraday cage system for the change of pattern printability in EUVL

Il-Yong Jang, Sung-Min Huh, Seong-Yong Moon, Sang-Gyun Woo, Jin-Kwan Lee, Sang Heup Moon, HanKu Cho

Proceedings Volume 7122, 712228 (2008) https://doi.org/10.1117/12.801413

KEYWORDS: Etching, Critical dimension metrology, Photomasks, Oxides, Tantalum, Extreme ultraviolet lithography, Optical properties, Plasma, Semiconducting wafers, Extreme ultraviolet

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Proceedings Article | 5 November 2005 Paper

A study of Cr to Mosi in situ dry etching process to reduce plasma induced defect

Il-Yong Jang, Young-Ju Park, Hyuk-Joo Kwon, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 59920O (2005) https://doi.org/10.1117/12.631951

KEYWORDS: Etching, Chromium, Particles, Plasma, Chlorine, Reactive ion etching, Dry etching, Photomasks, Chemistry, Manufacturing

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Proceedings Article | 20 August 2004 Paper

New approach for quartz dry etching using hardmask for sub-90-nm photomask technology

Sungmin Huh, Ki-Sung Yoon, Il-Yong Jang, Jung-Hyun Hwang, In-Kyun Shin, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557675

KEYWORDS: Quartz, Etching, Photomasks, Dry etching, Chromium, Diffractive optical elements, Polymers, Resolution enhancement technologies, Phase shifts, Ions

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Proceedings Article | 17 December 2003 Paper

Research on the origin of particle generation in ICP plasma reactor

Jeong-Yoon Lee, Nam-Kyu Kim, Il-Yong Jang, Sung-Yong Mun, Sung-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517957

KEYWORDS: Particles, Plasma, Chemistry, Plasma etching, Etching, Polymers, Ions, Photomasks, Aluminum, Critical dimension metrology

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Proceedings Article | 17 December 2003 Paper

New method for approaching the loading-free process for photomask Cr etching

Il-Yong Jang, Jeong-Yun Lee, Sung-Yong Moon, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517842

KEYWORDS: Etching, Chromium, Photomasks, Oxygen, Dry etching, Chlorine, Critical dimension metrology, Manufacturing, Mask making, Scanning electron microscopy

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Proceedings Article | 28 August 2003 Paper

Developement of etch rate uniformity adjustment technology for photomask quartz etch in manufacturing the 100% attenuated PSM

Il-Yong Jang, Jeong-Yoon Lee, Yong-Hoon Kim, Sung-Woon Choi, Jung-Min Sohn

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504196

KEYWORDS: Etching, Photomasks, Quartz, Manufacturing, Ions, Plasma, Dry etching, Resolution enhancement technologies, Chromium, Integrated circuits

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Proceedings Article | 27 December 2002 Paper

Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes

Yo-Han Choi, Jong-Rak Park, Moon-Gyu Sung, Seung-Hune Yang, Soon-Ho Kim, Ho-June Lee, Jeong-Yun Lee, Il-Yong Jang, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468099

KEYWORDS: Photomasks, Critical dimension metrology, Error analysis, Photoresist processing, Data modeling, Quantitative analysis, Chemically amplified resists, Integrated circuits, Semiconducting wafers, Etching

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Proceedings Article | 27 December 2002 Paper

Analytical approach to X-phenomenon in alternating phase-shifting masks

Jong Rak Park, Soon Ho Kim, Hojune Lee, Il-Yong Jang, Yo-Han Choi, Seung-Hune Yang, Jeong-Yoon Lee, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468092

KEYWORDS: Photomasks, Phase shifts, Error analysis, Semiconducting wafers, Fourier transforms, Reticles, Wafer-level optics, Convolution, Image acquisition, Holmium

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