Mr. Byeongki Kang Profile

Byeongki Kang

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Publications (3)

Proceedings Article | 13 November 2024 Presentation

Massive on-cell overlay metrology solution based on Mueller-matrix analysis for advanced process control

Changhyeong Yoon, Hyukjoon Cho, Ji Yong Shin, Kihun Kang, Juntaek Oh, Donggun Lee, Jaehyun Son, Seunga Lim, Eunsoo Hwang, Jinsoo Lee, ByeongKi Kang, Jaewon Lee, Jinwoo Ahn, Taeyong Jo, Jungho Ahn, Jihye Lee, Seulki Kim, Kyunghoon Park, JangKyu Lee, Heedong Kwak, Younghoon Sohn, Yusin Yang, Myungjun Lee

Proceedings Volume PC13215, PC132150B (2024) https://doi.org/10.1117/12.3032695

KEYWORDS: Overlay metrology, Advanced process control, Metrology, Semiconductors, Imaging systems, Ellipsometry, Time metrology, Semiconductor manufacturing, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 27 April 2023 Presentation + Paper

Massive overlay metrology solution by realizing imaging Mueller matrix spectroscopic ellipsometry

Jaehyeon Son, Juntaek Oh, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee

Proceedings Volume 12496, 124960L (2023) https://doi.org/10.1117/12.2657414

KEYWORDS: Overlay metrology, Mueller matrices, Semiconducting wafers, Spectroscopic ellipsometry, Critical dimension metrology, Imaging spectroscopy, Metrology, Polarization, Polysomnography, Image sensors

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Proceedings Article | 27 April 2023 Paper

Wide-field massive CD metrology based on the imaging Mueller-matrix ellipsometry for semiconductor devices

Juntaek Oh, Jaehyeon Son, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee

Proceedings Volume 12496, 124962X (2023) https://doi.org/10.1117/12.2658131

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Metrology, Semiconductors, Mueller matrices, Ellipsometry, Inspection

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