Dr. Wookrae Kim Profile

Dr. Wookrae Kim

at Samsung Electronics Co. Ltd.

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Author

Publications (8)

Proceedings Article | 10 August 2023 Presentation + Paper

RCWA acceleration for channel-hole structures with a neural network

Hyomin Ahn, Yoonsung Bae, Jeung Song, Namyoon Kim, Joonyoung Ahn, Sungmin Jo, Wookrae Kim, Myungjun Lee

Proceedings Volume 12619, 126190G (2023) https://doi.org/10.1117/12.2680983

KEYWORDS: Scattering, Neural networks, Light scattering, Diffraction, Data modeling, Machine learning

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Proceedings Article | 27 April 2023 Presentation + Paper

Mueller matrix metrology with multi-angle information using multiple self-interference

Garam Choi, Jinyong Kim, Daehoon Han, Young-Uk Jin, Soonhong Hwang, Jinseob Kim, Wookrae Kim, Jaehwang Jung, Seungwoo Lee, Taejoong Kim, Jinwoo Ahn, Myungjun Lee, Gideok Kim, Su-Young Lee, Yusin Yang

Proceedings Volume 12496, 1249610 (2023) https://doi.org/10.1117/12.2657852

KEYWORDS: Mueller matrices, Line edge roughness, Polarization, Metrology, Simulations, Critical dimension metrology, Holograms, Ellipsometry, Holography

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Proceedings Article | 13 June 2022 Presentation

Interferometric ellipsometry for massive angular spectra to overcome sensitivity limitation in device metrology

Jaehwang Jung, Jinseob Kim, Jinyong Kim, Seungwoo Lee, Seoyeon Jeong, Inho Shin, Wookrae Kim, Changhoon Choi, Myungjun Lee

Proceedings Volume 12053, 120530R (2022) https://doi.org/10.1117/12.2607442

KEYWORDS: Ellipsometry, Metrology, Interferometry, Semiconducting wafers, Wafer-level optics, Spectroscopic ellipsometry, Silica, Optical metrology, Microscopy, Mathematical modeling

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Proceedings Article | 26 May 2022 Presentation + Paper

Sensitivity and repeatability performance on overlay and CD measurement by incorporating hologram based ellipsometry

Yasuhiro Hidaka, Jinyong Kim, Jaehwang Jung, Mitsunori Numata, Wookrae Kim, Shinji Ueyama, Myungjun Lee

Proceedings Volume 12053, 1205311 (2022) https://doi.org/10.1117/12.2614734

KEYWORDS: Holograms, Ellipsometry, Overlay metrology, Polarization, Critical dimension metrology, Metrology, Image sensors, Reflectivity, Objectives, Semiconducting wafers

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Proceedings Article | 26 May 2022 Presentation + Paper

High-speed wafer magnetic field inspection for semiconductor manufacturing

Shinji Ueyama, Jinseob Kim, Mitsunori Numata, Wookrae Kim, Ingi Kim, Myungjun Lee

Proceedings Volume 12053, 120530G (2022) https://doi.org/10.1117/12.2614750

KEYWORDS: Magnetism, Inspection, Semiconducting wafers, Sensors, Objectives, Cameras, Wafer inspection, Light sources, Kerr effect, Image filtering

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SPIE Journal Paper | 20 April 2022 Open Access

Toward realization of high-throughput hyperspectral imaging technique for semiconductor device metrology

Changhyeong Yoon, Gwangsik Park, Daehoon Han, Sang-il Im, Sungmin Jo, Jinseob Kim, Wookrae Kim, Changhoon Choi, Myungjun Lee

JM3, Vol. 21, Issue 02, 021209, (April 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.021209

KEYWORDS: Semiconducting wafers, Cameras, Critical dimension metrology, Semiconductors, Spectral resolution, Spatial resolution, Hyperspectral imaging, Imaging systems, Metrology, Wafer-level optics

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Proceedings Article | 1 August 2021 Presentation + Paper

A new approach in optical metrology with multi-angle information through self-interferometric ellipsometry

Wookrae Kim, Jaehwang Jung, Jinseob Kim, Inho Shin, Namyoon Kim, Myungjun Lee

Proceedings Volume 11817, 1181707 (2021) https://doi.org/10.1117/12.2593375

KEYWORDS: Ellipsometry, Metrology, Semiconducting wafers, Reconstruction algorithms, Semiconductors, Polarization, Objectives, Image sensors, Optical metrology, Linear polarizers

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Proceedings Article | 15 March 2021 Presentation + Paper

A breakthrough on throughput and accuracy limitation in ellipsometry using self-interference holographic analysis

Jaehwang Jung, Yasuhiro Hidaka, Jinseob Kim, Mitsunori Numata, Wookrae Kim, Shinji Ueyama, Myungjun Lee

Proceedings Volume 11611, 116111J (2021) https://doi.org/10.1117/12.2581555

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Showing 5 of 8 publications

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