Prof. Young-Je Kwark Profile

Prof. Young-Je Kwark

at Soongsil University

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 4 May 2005 Paper

Inorganic polymer resists for EUVL

Juan Pablo Bravo-Vasquez, Young-Je Kwark, Christopher Ober, Heidi Cao, Hai Deng

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600172

KEYWORDS: Silicon, Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Absorbance, Lithography, Electron beam lithography, Chlorine, Humidity, Nitrogen

Read Abstract +

Proceedings Article | 4 May 2005 Paper

Materials for future lithography

Seung Wook Chang, Da Yang, Junyan Dai, Nelson Felix, Daniel Bratton, Kousuke Tsuchiya, Young-Je Kwark, Juan-Pablo Bravo-Vasquez, Christopher Ober, Heidi Cao, Hai Deng

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.607235

KEYWORDS: Glasses, Line edge roughness, Extreme ultraviolet lithography, Electron beam lithography, Lithography, Extreme ultraviolet, Polymers, Silicon, Chemical elements, Molecules

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Silicon backbone polymers as EUV resists

Juan Pablo Bravo-Vasquez, Young-Je Kwark, Christopher Ober, Heidi Cao, Hai Deng, Robert Meagley

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536438

KEYWORDS: Silicon, Polymers, Chlorine, Extreme ultraviolet, Polymerization, Lithography, Nitrogen, Absorbance, Transparency, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 12 June 2003 Paper

Novel silicon-containing polymers as photoresist materials for EUV lithography

Young-Je Kwark, Juan-Pablo Bravo-Vasquez, Christopher Ober, Heidi Cao, Hai Deng, Robert Meagley

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485184

KEYWORDS: Silicon, Polymers, Polymerization, Extreme ultraviolet lithography, Extreme ultraviolet, Ruthenium, Molybdenum, Transparency, Metals, Lithography

Read Abstract +

Proceedings Article | 24 July 2002 Paper

Highly transparent resist platforms for 157-nm microlithography: an update

Vaishali Vohra, Katsuji Douki, Young-Je Kwark, Xiang-Qian Liu, Christopher Ober, Young Bae, Will Conley, Daniel Miller, Paul Zimmerman

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474169

KEYWORDS: Polymers, Fluorine, Transparency, Polymerization, Etching, Lithography, Resistance, Absorbance, Scanning electron microscopy, Photoresist materials

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years