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In this study, we present a design for a transmissive phase-type metasurface lens for EUV photolithography. After careful consideration of various materials and pore shapes, we selected molybdenum as the optimal substrate material due to its superior optical properties in the EUV range. Finally, we achieved 2π phase modulation while maintaining high transmittance through a patterned vacuum-guided approach, enabling high-precision wavefront modulation. This choice maximizes the performance and efficiency of the metasurface in the EUV regime.
Numerical simulations demonstrate that the metasurface lens exhibits excellent optical performance. Our findings contribute to the ongoing exploration of photolithography and hold potential for transforming future EUV technologies, particularly in applications requiring high-precision optical components.
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