Development of a figure correction method having spatial resolution close to 0.1 mm

Yuzo Mori; Kazuto Yamauchi; Kazuya Yamamura; Hidekazu Mimura; Yasuhisa Sano; Akira Saito; Katsuyoshi Endo; Alexei Souvorov; Makina Yabashi; Kenji Tamasaku; Tetsuya Ishikawa

doi:10.1117/12.520825

13 January 2004 Development of a figure correction method having spatial resolution close to 0.1 mm

Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Katsuyoshi Endo, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa

Author Affiliations +

Proceedings Volume 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications; (2004) https://doi.org/10.1117/12.520825
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

A new figure correction method is applied to fabricate an elliptical mirror to realize a one-dimensionally diverging X-ray beam having high image quality. Mutual relations between figure errors and intensity uniformities of diverging X-ray beams are also investigated using a wave-optical simulator and indicate that figure errors in relatively short spatial wavelength ranges lead to high-contrast interference fringes. By using the microstitching interferometer and elastic emission machining, figure correction of an elliptical mirror with lateral resolution close to 0.1mm was carried out. A one-dimensional diverging X-ray obtained by the fabricated mirror was observed at SPring-8 and evaluated to have a sufficiently flat intensity distribution.

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Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Katsuyoshi Endo, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, and Tetsuya Ishikawa "Development of a figure correction method having spatial resolution close to 0.1 mm", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); https://doi.org/10.1117/12.520825

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