Surface figuring and measurement methods with spatial resolution close to 0.1 mm for x-ray mirror fabrication

H. Mimura; H. Yumoto; S. Matsuyama; K. Yamamura; Y. Sano; K. Endo; Y. Mori; Y. Nishino; M. Yabashi; K. Tamasaku; T. Ishikawa; K. Yamauchi

doi:10.1117/12.623103

16 September 2005 Surface figuring and measurement methods with spatial resolution close to 0.1 mm for x-ray mirror fabrication

H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, K. Yamauchi

Author Affiliations +

Proceedings Volume 5921, Advances in Metrology for X-Ray and EUV Optics; 59210M (2005) https://doi.org/10.1117/12.623103
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

We developed the computer-controlled figuring system having controllability of removal depths with nanometer accuracy and spatial resolutions close to 0.1mm. In this system, Elastic Emission Machining (EEM) using nozzle-type EEM head and Microstitching Interferometry (MSI) are employed as a machining method and a figure measurement method. In EEM, very small stationary spot profiles ware obtained, selecting small circle nozzle aperture of a 0.15 mm diameter. Surface figuring is performed with controlling scanning speeds of sample stages, so that a measured profile turned into designed one. MSI, which was developed on the basis of interferometric stitching technologies, has reproducibility at subnanometer level and with spatial resolution of 0.03 mm. In this study, we demonstrated computer controlled figuring, focusing on removal of high frequency figurer errors. Figure accuracy of 0.2 nm (RMS) was achieved in a cross-section profile with a length of 90mm.

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H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, and K. Yamauchi "Surface figuring and measurement methods with spatial resolution close to 0.1 mm for x-ray mirror fabrication", Proc. SPIE 5921, Advances in Metrology for X-Ray and EUV Optics, 59210M (16 September 2005); https://doi.org/10.1117/12.623103

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