Mr. David Nguyen Profile

David Nguyen

Phd Student at Ecole Polytechnique Federale de Lausanne

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Publications (6)

Proceedings Article | 26 April 2016 Presentation

Statistical parametric mapping of stimuli-evoked changes in quantitative blood flow using extended-focus optical coherence microscopy (Conference Presentation)

Paul Marchand, Arno Bouwens, Vincent Shamaei, David Nguyen, Jerome Extermann, Tristan Bolmont, Theo Lasser

Proceedings Volume 9690, 96901H (2016) https://doi.org/10.1117/12.2210982

KEYWORDS: Brain mapping, Optical coherence microscopy, Blood circulation, Magnetic resonance imaging, Blood, Neuroimaging, Brain, Functional magnetic resonance imaging, Doppler effect, Magnetism

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Proceedings Article | 18 August 2014 Paper

Shaping intensity behind amplitude masks for proximity correction lithography: design, measurement, and realization

Krishnaparvathy Puthankovilakam, Toralf Scharf, Qing Tan, Hans Peter Herzig, David Nguyen, Uwe Vogler, Arianna Bramati, Reinhard Voelkel

Proceedings Volume 9203, 92031B (2014) https://doi.org/10.1117/12.2060954

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Lithographic illumination, Resolution enhancement technologies, Printing, Microscopes, Beam splitters, Objectives, Structural design

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Proceedings Article | 31 March 2014 Paper

Lithographic process window optimization for mask aligner proximity lithography

Reinhard Voelkel, Uwe Vogler, Arianna Bramati, Andreas Erdmann, Nezih Ünal, Ulrich Hofmann, Marc Hennemeyer, Ralph Zoberbier, David Nguyen, Juergen Brugger

Proceedings Volume 9052, 90520G (2014) https://doi.org/10.1117/12.2046332

KEYWORDS: Lithography, Photomasks, Lithographic illumination, Critical dimension metrology, Photoresist materials, Tolerancing, Molybdenum, Diffraction, Silicon, Photoresist developing

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SPIE Journal Paper | 24 September 2013 Open Access

Publisher’s note: Light confinement effect of nonspherical nanoscale solid immersion lenses

Myun-Sik Kim, Toralf Scharf, David Nguyen, Ethan Keeler, Skyler Rydberg, Wataru Nakagawa, Gaël Osowiecki, Reinhard Voelkel, Hans Peter Herzig

JM3, Vol. 12, Issue 04, 041299, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.041299

KEYWORDS: Solids, Lenses, Photonics, Micro optics, Microelectromechanical systems, Photonic devices, Computer engineering

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SPIE Journal Paper | 12 June 2013

Light confinement effect of nonspherical nanoscale solid immersion lenses

Myun-Sik Kim, Toralf Scharf, David Nguyen, Ethan Keeler, Skyler Rydberg, Wataru Nakagawa, Gaël Osowiecki, Reinhard Voelkel, Hans Peter Herzig

JM3, Vol. 12, Issue 02, 023015, (June 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.023015

KEYWORDS: Solids, Nanolithography, Lenses, Spherical lenses, Polymethylmethacrylate, Lithography, Electron beam lithography, Silicon, Microscopes, Objectives

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Proceedings Article | 5 March 2013 Paper

Light confinement effect of non-spherical nanoscale solid immersion lenses

Myun-Sik Kim, Toralf Scharf, David Nguyen, Ethan Keeler, Skyler Rydberg, Wataru Nakagawa, Gaël Osowecki, Hans Peter Herzig, Reinhard Voelkel

Proceedings Volume 8613, 86131B (2013) https://doi.org/10.1117/12.2002145

KEYWORDS: Solids, Nanolithography, Spherical lenses, Polymethylmethacrylate, Electron beam lithography, Lithography, Lenses, Silicon, 3D metrology, Microscopes

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Showing 5 of 6 publications

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