Dr. Reinhard Völkel Profile

Dr. Reinhard Völkel

CEO at Focuslight Switzerland SA

SPIE Involvement:

Conference Program Committee | Conference Chair | Author | Editor

Area of Expertise:

micro-optics , start-ups , illumination , wafer-level optics , automotive lighting , lithography

Websites:

Company Website

Profile Summary

Executive with profound background in technology and digital. Strong interpersonal and networking skills, inspirational leadership, strategic thinking, and execution skills. Experienced with all stages of the development cycle of innovative startups, scaleups and tech companies.

General Management, Technology Management, Research & Development, Strategic Planning, Business Development, Project Management, Relationship Development, Intellectual Property, Quality Assurance, Problem Resolution, Communications, Technical Publications, Technical Presentations and Finance.

Expert Innosuisse - Suisse Innovation Agency
SPIE Fellow, OSA Senior Member, Member of EOS, DGAO, SSOM, Swissmem, Swissphotonics and Sand Hill Angels.

Technical: Photonics, Nanotechnology, Engineering, Micro-Optical Elements, Microlens Arrays, Optical Design, Optical Interconnections, Fiber Optics, Telecom, Datacom, Silicon Photonics, Optical Bio-Chips, Chemical Micro-Chips, Optical Sensors, Metrology, MEMS, MOEMS, Bio-MEMS, Microfluidic, Laser, Med-Tech, Data Sciences, Big Data, Miniaturized Cameras, Ultra-Flat Cameras, Wafer-Level Cameras, Wafer-Level Packaging, Wafer-Based Micro-Fabrication.

Publications (77)

Proceedings Article | 5 March 2022 Presentation + Paper

Presentation + Paper

Analytical analysis of the optical parameters of lenses for astigmatic beams

Giorgio Quaranta, Jeremy Béguelin, Wilfried Noell, Toralf Scharf, Reinhard Völkel

Proceedings Volume 12007, 120070P (2022) https://doi.org/10.1117/12.2625469

KEYWORDS: Microlens, Lenses, Integrated optics, Aspheric lenses, Photoresist materials, Photonic integrated circuits, Reactive ion etching, Optics manufacturing, Microlens array, Etching

Read Abstract +

SPIE Journal Paper | 31 August 2021 Open Access

Open Access

Commented review on refractive microlenses and microlens arrays metrology

Jeremy Béguelin, Reinhard Voelkel, Toralf Scharf

JOM, Vol. 1, Issue 03, 030901, (August 2021) https://doi.org/10.1117/12.10.1117/1.JOM.1.3.030901

KEYWORDS: Microlens, Metrology, Microscopes, Microlens array, Profilometers, Manufacturing, Micro optics, Optics manufacturing, Optical microsystems, Spherical lenses

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Proceedings Article | 30 August 2019 Presentation + Paper

Presentation + Paper

Leveraging wafer-level manufacturing process limitations to increase large-scale fused silica microlens array uniformity

Raoul Kirner, Jeremy Béguelin, Wilfried Noell, Martin Eisner, Toralf Scharf, Reinhard Voelkel

Proceedings Volume 11103, 111030A (2019) https://doi.org/10.1117/12.2529195

KEYWORDS: Microlens, Picture Archiving and Communication System, Microlens array, Wafer-level optics, Manufacturing, Optics manufacturing, Tolerancing, Reactive ion etching, Semiconducting wafers

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Proceedings Article | 30 August 2019 Presentation + Paper

Presentation + Paper

Specification of aspherical surfaces used as refractive elements in micro-optical systems

Jeremy Béguelin, Toralf Scharf, Wilfried Noell, Reinhard Voelkel

Proceedings Volume 11103, 1110309 (2019) https://doi.org/10.1117/12.2528636

KEYWORDS: Microlens, Tolerancing, Wavefront aberrations, Optics manufacturing, Geometrical optics, Optical design, Ray tracing, Imaging systems, Zernike polynomials

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Proceedings Article | 21 June 2019 Presentation + Paper

Presentation + Paper

Correction of surface error occurring in microlenses characterization performed by optical profilers

Jeremy Béguelin, Torald Scharf, Wilfried Noell, Reinhard Voelkel

Proceedings Volume 11056, 110560Z (2019) https://doi.org/10.1117/12.2525693

KEYWORDS: Microlens, Microscopes, Confocal microscopy, Micro optics, Machine learning, Neural networks, Wavefront aberrations

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Proceedings Article | 26 March 2019 Paper

Paper

Spatial coherence properties of an LED-based illumination system for mask-aligner lithography

Johana Bernasconi, Toralf Scharf, Raoul Kirner, Wilfried Noell, Reinhard Voelkel, Hans Peter Herzig

Proceedings Volume 10958, 109581D (2019) https://doi.org/10.1117/12.2514964

KEYWORDS: Spatial coherence, Lithographic illumination, Light emitting diodes, Lithography, Reflectors

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Proceedings Article | 15 June 2018 Paper

Paper

Improved calibration of vertical scanning optical profilometers for spherical profiles measurements

Jeremy Béguelin, Toralf Scharf, Wilfried Noell, Reinhard Voelkel

Proceedings Volume 10692, 1069207 (2018) https://doi.org/10.1117/12.2306797

KEYWORDS: Calibration, Profilometers, Spherical lenses, Optical spheres, Microlens, Aspheric lenses, Micro optics, Metrology

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Proceedings Article | 24 May 2018 Paper

Paper

Assessing microlens quality based on 3D irradiance measurement at the focal spot area

Jeremy Béguelin, Michail Symeonidis, Wilfried Noell, Reinhard Voelkel, Toralf Scharf

Proceedings Volume 10678, 106780B (2018) https://doi.org/10.1117/12.2306136

KEYWORDS: Microlens, Interferometry, Microscopes, Confocal microscopy, Wavefronts, Optical components, Objectives

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Proceedings Article | 20 March 2018 Paper

Paper

Enabling proximity mask-aligner lithography with a 193nm CW light source

Raoul Kirner, Andreas Vetter, Dmitrijs Opalevs, Matthias Scholz, Patrick Leisching, Toralf Scharf, Wilfried Noell, Carsten Rockstuhl, Reinhard Voelkel

Proceedings Volume 10587, 105871F (2018) https://doi.org/10.1117/12.2297171

KEYWORDS: Lithography, Diffusers, Diffractive optical elements, Lithographic illumination, Continuous wave operation, Semiconductor lasers, 193nm lithography, Beam shaping, Microlens array, Light sources and illumination

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Proceedings Article | 20 March 2018 Paper

Paper

Mask-aligner Talbot lithography using a 193nm CW light source

Andreas Vetter, Raoul Kirner, Dmitrijs Opalevs, Matthias Scholz, Patrick Leisching, Toralf Scharf, Wilfried Noell, Carsten Rockstuhl, Reinhard Voelkel

Proceedings Volume 10587, 105870W (2018) https://doi.org/10.1117/12.2296503

KEYWORDS: Photomasks, Lithography, Lithographic illumination, Semiconducting wafers, Light sources, Semiconductor lasers, Beam shaping, Continuous wave operation, Crystals, Diffusers

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Proceedings Article | 15 February 2018 Paper

Paper

Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications

D. Opalevs, M. Scholz, J. Stuhler, C. Gilfert, L. J. Liu, X. Y. Wang, A. Vetter, R. Kirner, T. Scharf, W. Noell, C. Rockstuhl, R. K. Li, C. T. Chen, R. Voelkel, P. Leisching

Proceedings Volume 10511, 105112C (2018) https://doi.org/10.1117/12.2290288

KEYWORDS: Laser systems engineering, Crystals, Deep ultraviolet, Lithography, Semiconductor lasers, Laser applications, Continuous wave operation, Nonlinear crystals, Photomasks, Laser crystals

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Proceedings Article | 27 February 2017 Paper

Paper

Light fields behind microstructures: study of the Babinet-principle in the Fresnel regime

Toralf Scharf, Myun-Sik Kim, Krishnaparvathy Puthankovilakam, Hans Peter Herzig, Reinhard Voelkel

Proceedings Volume 10120, 1012010 (2017) https://doi.org/10.1117/12.2251379

KEYWORDS: Computer simulations, Objectives, Modulation, Distance measurement, Radio propagation, Electromagnetism, Diffraction, Near field diffraction, Interferometry, Electromagnetic radiation, Diffraction gratings, Singular optics, Polarization, Near field, Nanofabrication

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Proceedings Article | 20 February 2017 Presentation + Paper

Presentation + Paper

Scaling effect and its impact on wavelength-scale microlenses

Myun-Sik Kim, Toralf Scharf, Hans Peter Herzig, Reinhard Voelkel

Proceedings Volume 10116, 1011608 (2017) https://doi.org/10.1117/12.2256635

KEYWORDS: Microlens, Diffraction, Refraction, Lenses, Micro optics, Microelectromechanical systems, Optical components, Photonics, Geometrical optics, Optical spheres, Scattering, Glasses, Near field

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Proceedings Article | 27 September 2016 Presentation + Paper

Presentation + Paper

Array imaging system for lithography

Raoul Kirner, Kevin Mueller, Pauline Malaurie, Uwe Vogler, Wilfried Noell, Toralf Scharf, Reinhard Voelkel

Proceedings Volume 9951, 99510A (2016) https://doi.org/10.1117/12.2237339

KEYWORDS: Imaging systems, Imaging arrays, Microlens array, Lithography, Microlens, Semiconducting wafers, Photomasks, Superposition, Point spread functions, Multichannel imaging systems

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Proceedings Article | 15 March 2016 Paper

Paper

Phase analysis of amplitude binary mask structures

Krishnaparvathy Puthankovilakam, Toralf Scharf, Hans Peter Herzig, Uwe Vogler, Arianna Bramati, Reinhard Voelkel

Proceedings Volume 9780, 97800V (2016) https://doi.org/10.1117/12.2219062

KEYWORDS: Printing, Optical proximity correction, Binary data, Phase measurement, Phase shift keying, Image resolution, Microscopy, Diffraction, Visualization, Phase shifting

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Proceedings Article | 15 March 2016 Paper

Paper

Transition of optical regime in miniaturized optical systems: light interactions beyond the refraction limit

Myun-Sik Kim, Toralf Scharf, Carsten Rockstuhl, Wataru Nakagawa, Reinhard Voelkel, Hans Peter Herzig

Proceedings Volume 9760, 97600W (2016) https://doi.org/10.1117/12.2225366

KEYWORDS: Refraction, Photonic nanostructures, Optical components, Spherical lenses, Electromagnetic scattering, Diffraction, Mie scattering, Optical aberrations, Miniature imaging systems, Optical spheres, Photonics, Geometrical optics, Objectives, Silicon, Nanotechnology

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Proceedings Article | 15 March 2016 Paper

Paper

Coherence management in lithography printing systems

Johana Bernasconi, Toralf Scharf, Hans Peter Herzig, Reinhard Voelkel, Arianna Bramati

Proceedings Volume 9780, 978016 (2016) https://doi.org/10.1117/12.2219115

KEYWORDS: Lithographic illumination, Lithography, Printing, Spatial coherence, Photomasks, Diffraction, Imaging systems, Coherence (optics), Optical proximity correction, Electroluminescent displays, Microlens array, LED lighting

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Proceedings Article | 4 March 2016 Paper

Paper

Structured amplitude and phase fields behind microstructures: the quest for high contrast modulation at proximity

Toralf Scharf, Myun-Sik Kim, Krishnaparvathy Puthankovilakam, Johana Bernasconi, Hans-Peter Herzig, Uwe Vogler, Reinhard Voelkel

Proceedings Volume 9764, 97640B (2016) https://doi.org/10.1117/12.2214341

KEYWORDS: Photomasks, Phase shift keying, Phase measurement, Modulation, Printing, Lithography, Neodymium, Diffraction, Stray light, Geometrical optics

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SPIE Journal Paper | 29 January 2016 Open Access

Open Access

Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy

Krishnaparvathy Puthankovilakam, Toralf Scharf, Myun-Sik Kim, Ali Naqavi, Hans Peter Herzig, Tina Weichelt, Uwe Zeitner, Uwe Vogler, Reinhard Voelkel

JM3, Vol. 15, Issue 02, 021203, (January 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021203

KEYWORDS: Phase shifts, Photomasks, Printing, Phase measurement, Microscopy, Diffraction, Quartz, Semiconducting wafers, Resolution enhancement technologies

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Proceedings Article | 22 June 2015 Paper

Paper

Overview of characterization and metrology techniques for microlenses and microlens arrays

Myun-Sik Kim, Lisa Allegre, Jonathan Sunarjo, Wilfried Noell, Reinhard Voelkel

Proceedings Volume 9525, 95251D (2015) https://doi.org/10.1117/12.2183692

KEYWORDS: Microlens, Profilometers, Microlens array, Interferometers, Metrology, Objectives, Confocal microscopy, Wavefronts, Optical spheres, Manufacturing

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Proceedings Article | 18 March 2015 Paper

Paper

Advanced Mask Aligner Lithography (AMALITH)

Reinhard Voelkel, Uwe Vogler, Arianna Bramati

Proceedings Volume 9426, 94261M (2015) https://doi.org/10.1117/12.2085792

KEYWORDS: Photomasks, Lithography, Printing, Lithographic illumination, Semiconducting wafers, Integrated optics, Optical proximity correction, Diffraction, Molybdenum, Photoresist materials

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Proceedings Article | 18 March 2015 Paper

Paper

Intensity and phase fields behind Phase Shifting Masks studied with High Resolution Interference Microscopy

Krishnaparvathy Puthankovilakam, Toralf Scharf, Hans Peter Herzig, Tina Weichelt, Uwe Zeitner, Uwe Vogler, Reinhard Voelkel

Proceedings Volume 9426, 94260I (2015) https://doi.org/10.1117/12.2085804

KEYWORDS: Printing, Photomasks, Phase shifts, Diffraction, Phase shifting, Microscopy, Phase measurement, Optical proximity correction, Quartz, Tolerancing

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Proceedings Article | 10 March 2015 Paper

Paper

Interferometric study on Gouy phase anomaly of microlens array

Myun-Sik Kim, Toralf Scharf, Wilfried Noell, Hans Peter Herzig, Reinhard Voelkel

Proceedings Volume 9386, 93860Z (2015) https://doi.org/10.1117/12.2182201

KEYWORDS: Spherical lenses, Microlens, Phase shifts, Finite-difference time-domain method, Interferometry, Microlens array, Diffraction, Phase measurement, Phase shift keying, Micro optics

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Proceedings Article | 18 August 2014 Paper

Paper

Shaping intensity behind amplitude masks for proximity correction lithography: design, measurement, and realization

Krishnaparvathy Puthankovilakam, Toralf Scharf, Qing Tan, Hans Peter Herzig, David Nguyen, Uwe Vogler, Arianna Bramati, Reinhard Voelkel

Proceedings Volume 9203, 92031B (2014) https://doi.org/10.1117/12.2060954

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Lithographic illumination, Resolution enhancement technologies, Printing, Microscopes, Beam splitters, Objectives, Structural design

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Proceedings Article | 31 March 2014 Paper

Paper

Lithographic process window optimization for mask aligner proximity lithography

Reinhard Voelkel, Uwe Vogler, Arianna Bramati, Andreas Erdmann, Nezih Ünal, Ulrich Hofmann, Marc Hennemeyer, Ralph Zoberbier, David Nguyen, Juergen Brugger

Proceedings Volume 9052, 90520G (2014) https://doi.org/10.1117/12.2046332

KEYWORDS: Lithography, Photomasks, Lithographic illumination, Critical dimension metrology, Photoresist materials, Tolerancing, Molybdenum, Diffraction, Silicon, Photoresist developing

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Proceedings Article | 31 March 2014 Paper

Paper

Micro-optics: enabling technology for illumination shaping in optical lithography

Reinhard Voelkel

Proceedings Volume 9052, 90521U (2014) https://doi.org/10.1117/12.2046116

KEYWORDS: Lithographic illumination, Photomasks, Semiconducting wafers, Lithography, Optical lithography, Optics manufacturing, Micro optics, Integrated optics, Diffraction, Microlens array

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Proceedings Article | 7 March 2014 Paper

Paper

Talbot lithography as an alternative for contact lithography for submicron features

L. A. Dunbar, D. Nguyen, B. Timotijevic, U. Vogler, S. Veseli, G. Bergonzi, S. Angeloni, A. Bramati, R. Voelkel, R. Stanley

Proceedings Volume 8974, 89740F (2014) https://doi.org/10.1117/12.2036896

KEYWORDS: Semiconducting wafers, Photomasks, Lithography, Optical lithography, Submicron lithography, Wafer-level optics, Distance measurement, Molybdenum, Photoresist materials, Silicon

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SPIE Journal Paper | 24 September 2013 Open Access

Open Access

Publisher’s note: Light confinement effect of nonspherical nanoscale solid immersion lenses

Myun-Sik Kim, Toralf Scharf, David Nguyen, Ethan Keeler, Skyler Rydberg, Wataru Nakagawa, Gaël Osowiecki, Reinhard Voelkel, Hans Peter Herzig

JM3, Vol. 12, Issue 04, 041299, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.041299

KEYWORDS: Solids, Lenses, Photonics, Micro optics, Microelectromechanical systems, Photonic devices, Computer engineering

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SPIE Journal Paper | 12 June 2013

Light confinement effect of nonspherical nanoscale solid immersion lenses

Myun-Sik Kim, Toralf Scharf, David Nguyen, Ethan Keeler, Skyler Rydberg, Wataru Nakagawa, Gaël Osowiecki, Reinhard Voelkel, Hans Peter Herzig

JM3, Vol. 12, Issue 02, 023015, (June 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.023015

KEYWORDS: Solids, Nanolithography, Lenses, Spherical lenses, Polymethylmethacrylate, Lithography, Electron beam lithography, Silicon, Microscopes, Objectives

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Proceedings Article | 13 May 2013 Paper

Paper

Optical characterization method for very small microlenses (sub-50 micron) for industrial mass-production applications

Myun-Sik Kim, Jonathan Sunarjo, Kenneth Weible, Reinhard Voelkel

Proceedings Volume 8788, 87880G (2013) https://doi.org/10.1117/12.2020589

KEYWORDS: Microlens, 3D metrology, Microlens array, Spherical lenses, Microscopes, Wavefronts, Confocal microscopy, Objectives, Image processing, Wafer-level optics

Read Abstract +

Proceedings Article | 5 March 2013 Paper

Paper

Advanced mask aligner lithography (AMALITH)

L. A. Dunbar, G. Bergonzi, U. Vogler, S. Angeloni, R. Kirner, A. Bramati, B. Timotijevic , R. Voelkel, R. Stanley

Proceedings Volume 8613, 86131D (2013) https://doi.org/10.1117/12.2003043

KEYWORDS: Photomasks, Lithography, Lithographic illumination, Optical lithography, Semiconducting wafers, Micro optics, Molybdenum, Wafer-level optics, Neodymium, Submicron lithography

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Proceedings Article | 5 March 2013 Paper

Paper

Low-NA focused vortex beam lithography for below 100-nm feature size at 405 nm illumination

Myun-Sik Kim, Toralf Scharf, Hans Peter Herzig, Reinhard Voelkel

Proceedings Volume 8613, 86131A (2013) https://doi.org/10.1117/12.2002138

KEYWORDS: Lithography, Nanolithography, Polarizers, Polarization, Scanning electron microscopy, Dielectric polarization, Photoresist materials, Photomasks, Lithographic illumination, Solids

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Proceedings Article | 5 March 2013 Paper

Paper

Light confinement effect of non-spherical nanoscale solid immersion lenses

Myun-Sik Kim, Toralf Scharf, David Nguyen, Ethan Keeler, Skyler Rydberg, Wataru Nakagawa, Gaël Osowecki, Hans Peter Herzig, Reinhard Voelkel

Proceedings Volume 8613, 86131B (2013) https://doi.org/10.1117/12.2002145

KEYWORDS: Solids, Nanolithography, Spherical lenses, Polymethylmethacrylate, Electron beam lithography, Lithography, Lenses, Silicon, 3D metrology, Microscopes

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Proceedings Article | 18 December 2012 Paper

Paper

High numerical aperture silicon collimating lens for mid-infrared quantum cascade lasers manufactured using wafer-level techniques

Eric Logean, Lubos Hvozdara, Joab Di-Francesco, Hans Peter Herzig, Reinhard Voelkel, Martin Eisner, Pierre-Yves Baroni, Michel Rochat, Antoine Müller

Proceedings Volume 8550, 85500Q (2012) https://doi.org/10.1117/12.981165

KEYWORDS: Silicon, Quantum cascade lasers, Semiconducting wafers, Mid-IR, Etching, Photoresist processing, Aspheric lenses, Manufacturing, Reactive ion etching, Micro optics

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Proceedings Article | 26 November 2012 Paper

Paper

Wafer-level micro-optics: trends in manufacturing, testing, packaging and applications

Reinhard Voelkel, Li Gong, Juergen Rieck, Alan Zheng

Proceedings Volume 8557, 855702 (2012) https://doi.org/10.1117/12.981779

KEYWORDS: Micro optics, Semiconducting wafers, Manufacturing, Microlens, Diffractive optical elements, Optics manufacturing, Photomasks, Lithography, Microlens array, Etching

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Proceedings Article | 13 March 2012 Paper

Paper

Advanced mask aligner lithography (AMALITH)

Reinhard Voelkel, Uwe Vogler, Arianna Bramati, Tina Weichelt, Lorenz Stuerzebecher, Uwe Zeitner, Kristian Motzek, Andreas Erdmann, Michael Hornung, Ralph Zoberbier

Proceedings Volume 8326, 83261Y (2012) https://doi.org/10.1117/12.916509

KEYWORDS: Photomasks, Lithography, Lithographic illumination, Optical proximity correction, Molybdenum, Semiconducting wafers, Photoresist materials, Resolution enhancement technologies, Printing, Integrated optics

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Proceedings Article | 16 February 2012 Paper

Paper

Dynamically deformable reflective membrane for laser beam shaping and smoothing

J. Masson, R. Bitterli, A. Bich, W. Noell, R. Voelkel, K. Weible, N. de Rooij

Proceedings Volume 8252, 82520K (2012) https://doi.org/10.1117/12.909092

KEYWORDS: Micromirrors, Semiconducting wafers, Beam shaping, Optical simulations, Reflectivity, Diffusers, Diffraction, Silicon, Actuators, Wafer-level optics

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Proceedings Article | 30 September 2011 Paper

Paper

Wafer-level micro-optics: trends in manufacturing, testing, and packaging

Reinhard Voelkel, Kenneth Weible, Martin Eisner

Proceedings Volume 8169, 81690C (2011) https://doi.org/10.1117/12.897114

KEYWORDS: Micro optics, Semiconducting wafers, Microlens, Manufacturing, Diffractive optical elements, Microlens array, Photomasks, Lithography, Packaging, Etching

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Proceedings Article | 21 September 2011 Paper

Paper

Simulation tools for advanced mask aligner lithography

Arianna Bramati, Uwe Vogler, Balint Meliorisz, Kristian Motzek, Michael Hornung, Reinhard Voelkel

Proceedings Volume 8167, 81670U (2011) https://doi.org/10.1117/12.897572

KEYWORDS: Photomasks, Lithography, Lithographic illumination, Optical proximity correction, Molybdenum, Semiconducting wafers, Optical lithography, Photoresist materials, Light sources, Integrated optics

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Proceedings Article | 21 September 2011 Paper

Paper

Mask aligner process enhancement by spatial filtering

Uwe Vogler, Andreas Bich, Reinhard Voelkel, Lorenz Stuerzebecher, Uwe Zeitner, Michael Hornung

Proceedings Volume 8170, 81700E (2011) https://doi.org/10.1117/12.897713

KEYWORDS: Photomasks, Lithographic illumination, Lithography, Molybdenum, Semiconducting wafers, Spatial filters, Light sources, Integrated optics, Diffraction, Optical filters

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Proceedings Article | 14 February 2011 Paper

Paper

Shaping light with MOEMS

W. Noell, S. Weber, J. Masson, J. Extermann, L. Bonacina, A. Bich, R. Bitterli, H. P. Herzig, D. Kiselev, T. Scharf, R. Voelkel, K. Weible, J.-P. Wolf, N. de Rooij

Proceedings Volume 7930, 79300P (2011) https://doi.org/10.1117/12.873051

KEYWORDS: Mirrors, Diffusers, Microopto electromechanical systems, Actuators, Micromirrors, Silicon, Ultraviolet radiation, Beam shaping, Pulse shaping, Magnetism

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Proceedings Article | 13 May 2010 Paper

Paper

Half-tone proximity lithography

Torsten Harzendorf, Lorenz Stuerzebecher, Uwe Vogler, Uwe Zeitner, Reinhard Voelkel

Proceedings Volume 7716, 77160Y (2010) https://doi.org/10.1117/12.854307

KEYWORDS: Photomasks, Diffraction, Lithography, Lithographic illumination, Micro optics, Point spread functions, Binary data, Molybdenum, Modulation, Chromium

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Proceedings Article | 17 February 2010 Paper

Paper

Deformable silicon membrane for dynamic linear laser beam diffuser

J. Masson, A. Bich, H. P. Herzig, R. Bitterli, W. Noell, T. Scharf, R. Voelkel, K. Weible, N. de Rooij

Proceedings Volume 7594, 75940F (2010) https://doi.org/10.1117/12.842015

KEYWORDS: Diffusers, Mirrors, Silicon, Aluminum, Semiconductor lasers, Magnetism, Actuators, Coating, Deep reactive ion etching, Crystals

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Proceedings Article | 24 August 2009 Paper

Paper

Dynamic array spot shaping for laser micro machining

A. Bich, K. Weible, R. Voelkel, M. Zimmermann, I. Harder, N. Lindlein, J. Masson, R. Bitterli, W. Noell, T. Scharf

Proceedings Volume 7430, 74300I (2009) https://doi.org/10.1117/12.828435

KEYWORDS: Microlens array, Beam homogenizers, Optical components, Telescopes, Homogenization, Beam shaping, Diffractive optical elements, Excimer lasers, Diffusers, Microlens

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Proceedings Article | 22 August 2009 Paper

Paper

Dynamic MEMS-based linear (1D) diffusers for laser beam homogenizing and beam shaping

J. Masson, A. Bich, W. Noell, R. Voelkel, K. Weible, N. De Rooij

Proceedings Volume 7430, 74300H (2009) https://doi.org/10.1117/12.827663

KEYWORDS: Diffusers, Electrodes, Silicon, Actuators, Mirrors, Optical simulations, Beam shaping, Semiconducting wafers, Finite element methods, Prototyping

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Proceedings Article | 25 September 2008 Paper

Paper

Laser beam homogenizing: limitations and constraints

Reinhard Voelkel, Kenneth Weible

Proceedings Volume 7102, 71020J (2008) https://doi.org/10.1117/12.799400

KEYWORDS: Microlens array, Diffusers, Light sources, Microlens, Collimation, Laser applications, Beam shaping, Manufacturing, Gaussian beams, Speckle pattern

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Proceedings Article | 17 September 2008 Paper

Paper

Refractive statistical concave 1D diffusers for laser beam shaping

Roland Bitterli, Myunsik Kim, Toralf Scharf, Hans-Peter Herzig, Andreas Bich, Christine Dumouchel, Sylvain Roth, Reinhard Völkel, K. Weible

Proceedings Volume 7062, 70620P (2008) https://doi.org/10.1117/12.793605

KEYWORDS: Diffusers, Photomasks, Etching, Diffusion, Silica, Data modeling, Microlens, Isotropic etching, Spherical lenses, Optical components

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Proceedings Article | 12 September 2008 Paper

Paper

Randomly varying micro-optical elements for the generation of uniform intensity profiles in coherent laser sources

K. Weible, A. Bich, S. Roth, C. Dumouchel, P. Pernet, M. Eisner, R. Völkel, R. Bitterli, T. Scharf, W. Noell

Proceedings Volume 7062, 70620R (2008) https://doi.org/10.1117/12.795926

KEYWORDS: Diffusers, Microlens array, Microlens, Beam homogenizers, Homogenization, Eye, Laser sources, Spherical lenses, Light sources, Collimation

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Proceedings Article | 14 February 2008 Paper

Paper

Multifunctional micro-optical elements for laser beam homogenizing and beam shaping

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H.-P. Herzig, Nico De Rooij

Proceedings Volume 6879, 68790Q (2008) https://doi.org/10.1117/12.762923

KEYWORDS: Diffusers, Microlens array, Microlens, Beam homogenizers, Laser applications, Homogenization, Telescopes, Beam shaping, Diffraction, Mirrors

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Proceedings Article | 26 September 2007 Paper

Paper

Microlens laser beam homogenizer: from theory to application

Maik Zimmermann, Norbert Lindlein, Reinhard Voelkel, Kenneth Weible

Proceedings Volume 6663, 666302 (2007) https://doi.org/10.1117/12.731391

KEYWORDS: Microlens array, Light sources, Microlens, Diffusers, Diffraction, Homogenization, Beam homogenizers, Excimer lasers, Eye, Spherical lenses

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Proceedings Article | 21 April 2006 Paper

Paper

Novel optics/micro-optics for miniature imaging systems

Jacques Duparré, Reinhard Völkel

Proceedings Volume 6196, 619607 (2006) https://doi.org/10.1117/12.662757

KEYWORDS: Eye, Objectives, Microlens, Microlens array, Imaging systems, Image resolution, Semiconducting wafers, Micro optics, Channel projecting optics, Wafer-level optics

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Proceedings Article | 21 April 2006 Paper

Paper

Achromatic microlenses

Patrick Ruffieux, Toralf Scharf, Hans Peter Herzig, Reinhard Voelkel, Kenneth Weible

Proceedings Volume 6185, 618514 (2006) https://doi.org/10.1117/12.661962

KEYWORDS: Microlens, Diffraction, Geometrical optics, Gaussian beams, Refractive index, Optical properties, Wave propagation, Chromatic aberrations, Micro optics, Refraction

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Proceedings Article | 17 October 2005 Paper

Paper

Microoptical artificial compound eyes: from design to experimental verification of two different concepts

Jacques Duparré, Frank Wippermann, Peter Dannberg, Peter Schreiber, Andreas Bräuer, Reinhard Völkel, Toralf Scharf

Proceedings Volume 5962, 59622A (2005) https://doi.org/10.1117/12.625081

KEYWORDS: Eye, Objectives, Opacity, Sensors, Microlens, Microlens array, Imaging systems, Image resolution, Semiconducting wafers, Stars

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Proceedings Article | 14 October 2005 Paper

Paper

Micro-optics: manufacturing and characterization

R. Voelkel, M. Eisner, K. Weible

Proceedings Volume 5965, 596501 (2005) https://doi.org/10.1117/12.624133

KEYWORDS: Micro optics, Microlens, Manufacturing, Semiconducting wafers, Microlens array, Diffraction, Semiconductors, Coating, Interferometers, Optics manufacturing

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Proceedings Article | 8 September 2004 Paper

Paper

Comparative study of glass and plastic refractive microlenses and their fabrication techniques

Heidi Ottevaere, Royall Cox, Hans Peter Herzig, Takaaki Miyashita, Kris Naessens, Mohammad Taghizadeh, Reinhard Volkel, H.J. Woo, Hugo Thienpont

Proceedings Volume 5453, (2004) https://doi.org/10.1117/12.546709

KEYWORDS: Microlens, Photovoltaics, Reactive ion etching, Fabrication, Digital Light Processing, Lithography, Printing, Laser ablation, Geology, Mining

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Proceedings Article | 17 August 2004 Paper

Paper

Metrology of refractive microlens arrays

Kenneth Weible, Reinhard Volkel, Martin Eisner, Samuel Hoffmann, Toralf Scharf, Hans-Peter Herzig

Proceedings Volume 5458, (2004) https://doi.org/10.1117/12.545458

KEYWORDS: Microlens, Microlens array, Interferometers, Aspheric lenses, Spherical lenses, Metrology, Wavefronts, Optical spheres, Reactive ion etching, Semiconducting wafers

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Proceedings Article | 18 February 2004 Paper

Paper

Theoretical analysis of an artificial superposition compound eye for application in ultra flat digital image acquisition devices

Jacques Duparre, Peter Schreiber, Reinhard Volkel

Proceedings Volume 5249, (2004) https://doi.org/10.1117/12.516268

KEYWORDS: Eye, Lenses, Imaging systems, Sensors, Image segmentation, Monochromatic aberrations, Telescopes, Microlens, Superposition, Digital imaging

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Proceedings Article | 24 January 2004 Paper

Paper

Artificial compound eyes: different concepts and their application for ultraflat image acquisition sensors

Jacques Duparre, Peter Schreiber, Peter Dannberg, Toralf Scharf, Petri Pelli, Reinhard Voelkel, Hans-Peter Herzig, Andreas Braeuer

Proceedings Volume 5346, (2004) https://doi.org/10.1117/12.530208

KEYWORDS: Eye, Lenses, Microlens array, Sensors, Semiconducting wafers, Microlens, Superposition, Imaging systems, Image acquisition, Cameras

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Proceedings Article | 9 November 2001 Paper

Paper

Fabrication of aspherical microlenses in fused silica and silicon

Reinhard Voelkel, Martin Eisner, Kenneth Weible

Proceedings Volume 4440, (2001) https://doi.org/10.1117/12.448056

KEYWORDS: Microlens, Silica, Reactive ion etching, Silicon, Microlens array, Etching, Aspheric lenses, Optical lithography, Semiconducting wafers, Fabrication

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SPIE Journal Paper | 1 May 2001

Microlens systems for fluorescence detection in chemical microsystems

Jean-Christophe Roulet, Reinhard Voelkel, Hans Peter Herzig, Sabeth Verpoorte, Nico de Rooij, Rene Daendliker

OE, Vol. 40, Issue 05, (May 2001) https://doi.org/10.1117/12.10.1117/1.1359522

KEYWORDS: Microlens, Luminescence, Molecules, Glasses, Fluorescence spectroscopy, Sensors, Spherical lenses, Photoresist materials, Semiconducting wafers, Microfabrication

Proceedings Article | 18 August 2000 Paper

Paper

Refractive microlenses for ultraflat photolithographic projection systems

Reinhard Voelkel, Martin Eisner, Christian Ossmann, Kenneth Weible

Proceedings Volume 4179, (2000) https://doi.org/10.1117/12.395683

KEYWORDS: Microlens, Microlens array, Photomasks, Reactive ion etching, Projection lithography, Projection systems, Silica, Semiconducting wafers, Optical lithography, Etching

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Proceedings Article | 27 August 1999 Paper

Paper

Natural optical design concepts for highly miniaturized camera systems

Reinhard Voelkel

Proceedings Volume 3737, (1999) https://doi.org/10.1117/12.360049

KEYWORDS: Eye, Imaging systems, Sensors, Optical design, Superposition, Cameras, Micro optics, Microlens array, Diffraction, Microlens

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SPIE Journal Paper | 1 November 1998

Properties of moire magnifiers

Hala Kamal, Reinhard Voelkel, Javier Alda

OE, Vol. 37, Issue 11, (November 1998) https://doi.org/10.1117/12.10.1117/1.601889

KEYWORDS: Microlens array, Imaging arrays, Optical engineering, Superposition, Optical arrays, Cameras, Visualization, Moire patterns, Microtechnology, Microlens

Proceedings Article | 7 September 1998 Paper

Paper

Optical microsystems for imaging

Reinhard Voelkel, Christian Ossmann, Toralf Scharf, Hans Peter Herzig, Rene Daendliker

Proceedings Volume 3410, (1998) https://doi.org/10.1117/12.324016

KEYWORDS: Eye, Sensors, Lenses, Moire patterns, Imaging systems, Microlens array, Diffraction, Receptors, Telescopes, Micro optics

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Proceedings Article | 24 September 1997 Paper

Paper

Design, fabrication, and testing of micro-optical components for sensors and microsystems

Reinhard Voelkel, Philippe Nussbaum, Jean-Christophe Roulet, Peter Blattner, Kenneth Weible, Hans Peter Herzig

Proceedings Volume 3099, (1997) https://doi.org/10.1117/12.281227

KEYWORDS: Microlens, Microlens array, Photomasks, Lenses, Silica, Reactive ion etching, Photoresist materials, Sensors, Geometrical optics, Imaging systems

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SPIE Journal Paper | 1 November 1996

Microlens array imaging system for photolithography

Reinhard Voelkel, Hans Peter Herzig, Philippe Nussbaum, Rene Daendliker, William Hugle

OE, Vol. 35, Issue 11, (November 1996) https://doi.org/10.1117/12.10.1117/1.601080

KEYWORDS: Imaging systems, Microlens array, Lithography, Image resolution, Microlens, Wavefronts, Printing, Imaging arrays, Optical lithography, Modulation transfer functions

Proceedings Article | 1 September 1996 Paper

Paper

Multiple aperture imaging system for lithography

R. Völkel

Proceedings Volume 2778, 277804 (1996) https://doi.org/10.1117/12.2298886

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Proceedings Article | 26 August 1996 Paper

Paper

Micro-optics for sensor applications

Philippe Nussbaum, Reinhard Voelkel, Hans Peter Herzig, Rene Daendliker

Proceedings Volume 2783, (1996) https://doi.org/10.1117/12.248510

KEYWORDS: Microlens array, Microlens, Sensors, Silica, Lenses, Lithography, Reactive ion etching, Spherical lenses, Photomasks, Photoresist materials

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Proceedings Article | 28 August 1995 Paper

Paper

Construction of a programmable multilayer analogue neural network using space invariant interconnects

Neil Collings, Alireza Pourzand, Reinhard Voelkel

Proceedings Volume 2565, (1995) https://doi.org/10.1117/12.217667

KEYWORDS: Liquid crystals, Neural networks, Calibration, Electronics, Diffraction, Diffraction gratings, Imaging systems, Televisions, Light valves, Optical design

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Proceedings Article | 26 July 1993 Paper

Paper

Optoelectronic board-to-board interconnection with high packing density using a light-guiding plate supplied with grating couplers and field lenses

R. Volkel

Proceedings Volume 1983, 19835P (1993) https://doi.org/10.1117/12.2308624

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Proceedings Article | 1 July 1993 Paper

Paper

Optoelectronic interconnects with holographic optical elements

Reinhard Voelkel, M. Heissmeier, Harald Kobolla, Ulrich Krackhardt, S. Rosner, Juerg Schmidt, Johannes Schwider, John Sheridan, Norbert Streibl, F. Zobel

Proceedings Volume 1849, (1993) https://doi.org/10.1117/12.147109

KEYWORDS: Diffraction, Holographic optical elements, Mirrors, Optoelectronics, Holography, Geometrical optics, Free space optics, Diffraction gratings, Channel projecting optics, Optical interconnects

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Proceedings Article | 2 March 1993 Paper

Paper

Holographic optical elements for interconnects and sensors

Juerg Schmidt, Reinhard Voelkel, Johannes Schwider, John Sheridan, Wilhelm Stork, Norbert Streibl, M. Stieglmeier, Franz Durst

Proceedings Volume 1732, (1993) https://doi.org/10.1117/12.140406

KEYWORDS: Holographic optical elements, Beam splitters, Sensors, Semiconductor lasers, Holography, Laser Doppler velocimetry, Diffraction, Glasses, Optical components, Diffraction gratings

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Proceedings Article | 13 January 1993 Paper

Paper

Holographic optical coupling and beamsplitting elements for optoelectronic interconnects and sensors

Juerg Schmidt, Reinhard Voelkel, S. Rosner, Wilhelm Stork, John Sheridan, Franz Durst, Johannes Schwider, Norbert Streibl

Proceedings Volume 1751, (1993) https://doi.org/10.1117/12.138889

KEYWORDS: Glasses, Sensors, Holographic optical elements, Holography, Optical components, Optoelectronics, Reflection, Semiconductor lasers, Laser Doppler velocimetry, Holograms

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SPIE Journal Paper | 1 October 1991

Optoelectronic interconnection based on a light-guiding plate with holographic coupling elements

H.-J. Haumann, Harald Kobolla, Frank Sauer, Juerg Schmidt, Johannes Schwider, Wilhelm Stork, Norbert Streibl, Reinhard Voelkel

OE, Vol. 30, Issue 10, (October 1991) https://doi.org/10.1117/12.10.1117/12.55955

KEYWORDS: Glasses, Holography, Optoelectronics, Sensors, Collimation, Semiconductor lasers, PIN photodiodes, Waveguides, Reflection, Data communications

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Proceedings Article | 1 September 1991 Paper

Paper

Holographic space-variant prism arrays for free-space data permutation in digital optical networks

Harald Kobolla, Frank Sauer, Johannes Schwider, Norbert Streibl, Reinhard Voelkel

Proceedings Volume 1507, (1991) https://doi.org/10.1117/12.47040

KEYWORDS: Holography, Signal to noise ratio, Prisms, Diffraction, Digital holography, Optical components, Optical networks, Data processing, Networks, Free space optics

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Proceedings Article | 1 July 1990 Paper

Paper

Possibilities and limitations of space-variant holographic optical elements for switching networks and general interconnects

Johannes Schwider, Wilhelm Stork, Norbert Streibl, Reinhard Voelkel

Proceedings Volume 1319, (1990) https://doi.org/10.1117/12.22125

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Proceedings Article | 1 July 1990 Paper

Paper

Holographic coupling elements for optical bus systems based on a light-guiding optical backplane

H.-J. Haumann, Harald Kobolla, Frank Sauer, Johannes Schwider, Wilhelm Stork, Norbert Streibl, Reinhard Voelkel

Proceedings Volume 1319, (1990) https://doi.org/10.1117/12.34867

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Showing 5 of 77 publications

Proceedings Volume Editor (1)

SPIE Conference Volume | 19 October 2021

Optical Fabrication, Testing, and Metrology VII

Conference Committee Involvement (25)

3D Printed Optics and Additive Photonic Manufacturing IV

8 April 2024 | Strasbourg, France

Optical Fabrication and Testing VIII

8 April 2024 | Strasbourg, France

Digital Optical Technologies 2023

26 June 2023 | Munich, Germany

3D Printed Optics and Additive Photonic Manufacturing III

4 April 2022 | Strasbourg, France

Optical Fabrication, Testing, and Metrology VII

13 September 2021 | Online Only, Spain

Digital Optical Technologies 2021

21 June 2021 | Online Only, Germany

Optical Lithography XXXIV

22 February 2021 | Online Only, California, United States

3D Printed Optics and Additive Photonic Manufacturing II

7 April 2020 | Online Only, France

Digital Optics for Immersive Displays II (DOID20)

7 April 2020 | Online Only, France

Optical Microlithography XXXIII

25 February 2020 | San Jose, California, United States

Digital Optical Technologies II

24 June 2019 | Munich, Germany

Optical Microlithography XXXII

26 February 2019 | San Jose, California, United States

Optical Fabrication, Testing, and Metrology VI

15 May 2018 | Frankfurt, Germany

Digital Optics for Immersive Displays (DOID18)

24 April 2018 | Strasbourg, France

3D Printed Optics and Additive Photonic Manufacturing

23 April 2018 | Strasbourg, France

Optical Microlithography XXXI

27 February 2018 | San Jose, California, United States

Digital Optical Technologies

26 June 2017 | Munich, Germany

Optical Microlithography XXX

28 February 2017 | San Jose, California, United States

Optical Microlithography XXIX

23 February 2016 | San Jose, California, United States

Optical Fabrication, Testing, and Metrology V

7 September 2015 | Jena, Germany

Optical Microlithography XXVIII

24 February 2015 | San Jose, California, United States

Optical Microlithography XXVII

25 February 2014 | San Jose, California, United States

Optical Fabrication, Testing, and Metrology IV

7 September 2011 | Marseille, France

Optical Fabrication, Testing, and Metrology III

2 September 2008 | Glasgow, Scotland, United Kingdom

Lithographic and Micromachining Techniques for Optical Component Fabrication II

3 August 2003 | San Diego, California, United States

Showing 5 of 25 Conference Committees

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