Derek Shi
at ASML Shenzhen
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12051, 1205109 (2022) https://doi.org/10.1117/12.2616830
KEYWORDS: Semiconducting wafers, Chromatic aberrations, Data modeling, Calibration, Source mask optimization, Photomasks, SRAF, Copper indium disulfide, Optical lithography, Image processing

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