Xichen Sheng
at ASML Shanghai
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12051, 1205109 (2022) https://doi.org/10.1117/12.2616830
KEYWORDS: Semiconducting wafers, Chromatic aberrations, Data modeling, Calibration, Source mask optimization, Photomasks, SRAF, Copper indium disulfide, Optical lithography, Image processing

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11327, 113270B (2020) https://doi.org/10.1117/12.2552001
KEYWORDS: Etching, Metrology, Calibration, Scanning electron microscopy, Data modeling, Optical proximity correction, Critical dimension metrology, Performance modeling, Image processing, Semiconducting wafers

Proceedings Article | 17 May 2019 Paper
Wei Yuan, Yifei Lu, Yuhang Zhao, Shoumian Chen, Ming Li, Hongmei Hu, Shuxin Yao, Zhunhua Liu, Qiaoqiao Li, Yu Tian, Zhiquan Zhou, Lirong Gu, Jinze Wang, Xichen Sheng, Guanyong Yan, Yazhong Zheng, Yueliang Yao, Yanjun Xiao, Liang Liu, Qian Zhao, Mu Feng, Jun Chen, Jun Lang
Proceedings Volume 10961, 109610N (2019) https://doi.org/10.1117/12.2516236
KEYWORDS: Metrology, Calibration, Data modeling, Scanning electron microscopy, Optical proximity correction, Performance modeling, Critical dimension metrology, Semiconducting wafers, Image processing, Photomasks

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