CONFERENCE PROCEEDINGS
Advanced Search
Joon-Seuk Lee
Lithography Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 27 April 2023 Poster + Paper
Residuals reduction in imaging-based overlay using color per layer
Shlomit Katz, Suk Won Park, Joonsang You, Hyunjun Kim, Honggoo Lee, Jungchan Kim, Dongyoung Lee, Hongbok Yeon, Joonseuk Lee, Sang-Ho Lee, Jae Wook Seo, Dor Yehuda, Junho Kim, Hongcheon Yang, Dohwa Lee, Nanglyeom Oh, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Ohad Bachar
Proceedings Volume 12496, 1249626 (2023) https://doi.org/10.1117/12.2655681
KEYWORDS: Metrology, Overlay metrology, High volume manufacturing, Optical parametric oscillators, Optical gratings, Visualization
Proceedings Article | 22 February 2021 Presentation + Paper
Qualification of small alignment mark by on-product overlay performance
Proceedings Volume 11613, 116130J (2021) https://doi.org/10.1117/12.2584618
KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Algorithm development, Semiconductor manufacturing, Scanners, Process control, Device simulation
Proceedings Article | 30 March 2017 Paper
Process resilient overlay target designs for advanced memory manufacture
Joonseuk Lee, Mirim Jung, Honggoo Lee, Youngsik Kim, Sangjun Han, Michael Adel, Tal Itzkovich, Vladimir Levinski, Victoria Naipak, Anna Golotsvan, Amnon Manassen, Yuri Paskover, Tom Leviant, Efi Megged, Myungjun Lee, Mark Smith, Do-Hwa Lee, DongSub Choi, Zephyr Liu
Proceedings Volume 10145, 1014524 (2017) https://doi.org/10.1117/12.2258376
KEYWORDS: Overlay metrology, Metrology, Lithography, Manufacturing, Semiconducting wafers, Optical lithography, Polarization, Modulation, Critical dimension metrology, Image segmentation
Proceedings Article | 24 March 2016 Paper
Lithography aware overlay metrology target design method
Myungjun Lee, Mark Smith, Joonseuk Lee, Mirim Jung, Honggoo Lee, Youngsik Kim, Sangjun Han, Michael Adel, Kangsan Lee, Dohwa Lee, Dongsub Choi, Zephyr Liu, Tal Itzkovich, Vladimir Levinski, Ady Levy
Proceedings Volume 9778, 97781L (2016) https://doi.org/10.1117/12.2218653
KEYWORDS: Overlay metrology, Metrology, Lithography, Scanners, Lithographic illumination, Personal protective equipment, Optical lithography, Resolution enhancement technologies, Optical proximity correction, Photomasks, SRAF
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top