Dr. Koen D'Havé Profile

Dr. Koen D'Havé

at imec

SPIE Involvement:

Author

Publications (26)

Proceedings Article | 28 April 2023 Presentation + Paper

Presentation + Paper

Overview of stitching for high NA: imaging and overlay experimental and simulation results

Natalia Davydova, Vincent Wiaux, Lieve van Look, Joost Bekaert, Frank Timmermans, Bram Slachter, Eelco van Setten, Marcel Beckers, Simon van Gorp, Cees Lambregts, Chung-Tien Li, Arthur van de Nes, Koen D'Havé, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Diederik de Bruin, Stephen Hsu, Rene Carpaij, Laura Huddleston, Claire van Lare, Tatiana Kovalevich

Proceedings Volume 12494, 124940Q (2023) https://doi.org/10.1117/12.2658511

KEYWORDS: Photomasks, Optical proximity correction, Reflection, Critical dimension metrology, Tantalum, Reflectivity, Metrology, Semiconducting wafers, Scanners, Reticles

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Proceedings Article | 23 March 2020 Presentation + Paper

Presentation + Paper

Novel monitoring of EUV litho cluster for manufacturing insertion

Vincent Truffert, Kit Ausschnitt, Vineet V. Nair, Koen D'Havé

Proceedings Volume 11323, 113230S (2020) https://doi.org/10.1117/12.2551881

KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Metrology, Manufacturing, Stochastic processes, Optical lithography, Extreme ultraviolet lithography, Overlay metrology, Line width roughness, Line edge roughness, Optical simulations, Scatterometry

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Proceedings Article | 8 October 2018 Presentation + Paper

Presentation + Paper

Pattern shift response metrology

Kit Ausschnitt, Vincent Truffert, Koen D'Have, Philippe Leray

Proceedings Volume 10810, 108100T (2018) https://doi.org/10.1117/12.2502353

KEYWORDS: Semiconducting wafers, Metrology, Scanning electron microscopy, Overlay metrology, Photomasks, Critical dimension metrology, Extreme ultraviolet lithography, Etching, Chemical mechanical planarization, Optical lithography

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Proceedings Article | 12 April 2013 Paper

Paper

Impact of process decisions and alignment strategy on overlay for the 14nm node

David Laidler, Koen D’havé, Philippe Leray, Jan Hermans, Juergen Boemmels, Shaunee Cheng, Huixiong Dai, Yongmei Chen, Chris Ngai, Bencherki Mebarki

Proceedings Volume 8683, 868306 (2013) https://doi.org/10.1117/12.2011968

KEYWORDS: Optical alignment, Etching, Back end of line, Metals, Copper, Double patterning technology, Chemical mechanical planarization, Scanners, Neodymium, Optical lithography

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Proceedings Article | 12 April 2013 Paper

Paper

Lithography imaging control by enhanced monitoring of light source performance

Paolo Alagna, Omar Zurita, Joshua Thornes, Koen D'havé, Lieve Van Look , Joost Bekaert , Nakgeuon Seong, Gregory Rechsteiner, Ivan Lalovic

Proceedings Volume 8683, 86830S (2013) https://doi.org/10.1117/12.2013213

KEYWORDS: Semiconducting wafers, Lithography, Optical lithography, Metrology, Polarization, Light sources, Critical dimension metrology, Scanners, Control systems, Lithographic illumination

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Proceedings Article | 5 April 2012 Paper

Paper

High-speed, full 3D feature metrology for litho monitoring, matching, and model calibration with scatterometry

Fahong Li, Philippe Leray, Lieve van Look, Joost Bekaert, Alek Chen, Anne-Laure Charley, Hugo Cramer, Shaunee Cheng

Proceedings Volume 8324, 83240R (2012) https://doi.org/10.1117/12.919050

KEYWORDS: Scatterometry, Scanners, 3D modeling, Optical proximity correction, 3D metrology, Calibration, Metrology, Lithography, Scatter measurement, Scanning electron microscopy

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Proceedings Article | 14 March 2012 Paper

Paper

Progress in EUV lithography towards manufacturing from an exposure tool perspective

Koen D'havé, Shaunee Cheng, Philippe Foubert, Mircea Dusa, Eric Hendrickx, David Laidler, Jan Hermans

Proceedings Volume 8322, 832202 (2012) https://doi.org/10.1117/12.917616

KEYWORDS: Semiconducting wafers, Reticles, Optical alignment, Scanners, Extreme ultraviolet lithography, Overlay metrology, Critical dimension metrology, Extreme ultraviolet, Silicon, Manufacturing

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Proceedings Article | 13 March 2012 Paper

Paper

Modeling for field-to-field overlay error

Koen D'havé, Shaunee Cheng

Proceedings Volume 8326, 83260U (2012) https://doi.org/10.1117/12.916345

KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Reticles, Data modeling, Calibration, Motion models, Control systems, Optical lithography, Current controlled current source

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Proceedings Article | 13 March 2012 Paper

Paper

Mix and match overlay optimization strategy for advanced lithography tools (193i and EUV)

Jan Hermans, David Laidler, Koen D'havé, Shaunee Cheng

Proceedings Volume 8326, 83260M (2012) https://doi.org/10.1117/12.916969

KEYWORDS: Scanners, Extreme ultraviolet lithography, Overlay metrology, Extreme ultraviolet, Semiconducting wafers, Reticles, Optical alignment, Lithography, Metrology, Silicon

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Proceedings Article | 30 September 2011 Paper

Paper

3D features measurement using YieldStar: an angle resolved polarized scatterometer

Fahong Li, Mircea Dusa, Anne-Laure Charley, Paul Hinnen, Philippe Leray, Koen D'havé, Peter Vanoppen, Shaunee Cheng

Proceedings Volume 8169, 81690Q (2011) https://doi.org/10.1117/12.897582

KEYWORDS: 3D metrology, Scatterometry, Critical dimension metrology, Metrology, Lithography, 3D modeling, Optical proximity correction, Diffraction, Calibration, Scatter measurement

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Proceedings Article | 20 April 2011 Paper

Paper

3D features measurement using YieldStar, an angle resolved polarized scatterometer

Shaunee Cheng, Paul Hinnen, Mircea Dusa, Fahong Li, Peter Vanoppen, Koen D'havé, Anne-Laure Charley, Philippe Leray

Proceedings Volume 7971, 79712E (2011) https://doi.org/10.1117/12.881276

KEYWORDS: 3D metrology, Metrology, Critical dimension metrology, Lithography, Scatterometry, Scanning electron microscopy, Scatter measurement, 3D modeling, Optical proximity correction, Process control

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Proceedings Article | 20 April 2011 Paper

Paper

Diffraction based overlay re-assessed

Philippe Leray, Shaunee Cheng, David Laidler, Koen D'havé

Proceedings Volume 7971, 797114 (2011) https://doi.org/10.1117/12.882353

KEYWORDS: Overlay metrology, Calibration, Metrology, Semiconducting wafers, Process control, Etching, Silicon, Scanners, Metals, Diffraction

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Proceedings Article | 23 March 2011 Paper

Paper

Optical proximity stability control of ArF immersion clusters

Jan-Willem Gemmink, Joost Bekaert, Koen Schreel, Koen D'havé, Bart Laenens, Geert Vandenberghe, Shaunee Cheng, Lieve Van Look

Proceedings Volume 7973, 79730R (2011) https://doi.org/10.1117/12.881606

KEYWORDS: Semiconducting wafers, Scanners, Fiber optic illuminators, Critical dimension metrology, Scatterometry, Diffractive optical elements, Scanning electron microscopy, Wafer-level optics, Photomasks, Control systems

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Proceedings Article | 23 March 2011 Paper

Paper

Scanner matching for standard and freeform illumination shapes using FlexRay

K. Schreel, G. Vandenberghe, L. Van Look, J. Ghan, W. Shao, J. Bekaert, K. D'havé, P. van Adrichem, J. T. Neumann, B. Laenens

Proceedings Volume 7973, 79731I (2011) https://doi.org/10.1117/12.881607

KEYWORDS: Scanners, Fiber optic illuminators, Semiconducting wafers, Photomasks, Reticles, Diffractive optical elements, Cadmium, Critical dimension metrology, Manufacturing, Optical lithography

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Proceedings Article | 2 April 2010 Paper

Paper

Scatterometry metrology validation with respect to process control

Shaunee Cheng, Philippe Leray, Koen D'havé, David Laidler, Anne-Laure Charley

Proceedings Volume 7638, 76380X (2010) https://doi.org/10.1117/12.848535

KEYWORDS: Scatterometry, Process control, Critical dimension metrology, Lithography, Metrology, Semiconducting wafers, Scanning electron microscopy, Scanners, Scatter measurement, Reflectometry

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Proceedings Article | 2 April 2010 Paper

Paper

A single metrology tool solution for complete exposure tool setup

Peter Vanoppen, Paul Hinnen, Philippe Leray, Shaunee Cheng, Koen D'havé, Anne-Laure Charley, Mircea Dusa, David Laidler

Proceedings Volume 7638, 763809 (2010) https://doi.org/10.1117/12.848388

KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Metrology, Calibration, Control systems, Scatterometry, Process control, Reticles, Diffraction

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Proceedings Article | 2 April 2010 Paper

Paper

Focus and dose deconvolution technique for improved CD control of immersion clusters

Paul Hinnen, Mircea Dusa, Koen D'havé, Philippe Leray, Shaunee Cheng, Peter Vanoppen, David Laidler, Anne-Laure Charley

Proceedings Volume 7638, 763808 (2010) https://doi.org/10.1117/12.848444

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanners, Data modeling, Scatterometry, Metrology, Lithography, Finite element methods, Reticles, Scatter measurement

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Proceedings Article | 24 March 2009 Paper

Paper

Track optimization and control for 32nm node double patterning and beyond

Len Tedeschi, Craig Rosslee, Philippe Leray, David Laidler, Koen D'havé

Proceedings Volume 7272, 727236 (2009) https://doi.org/10.1117/12.814849

KEYWORDS: Etching, Semiconducting wafers, Double patterning technology, Calibration, Metrology, Photoresist processing, Scanners, Polarization, Zone plates, Critical dimension metrology

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Proceedings Article | 23 March 2009 Paper

Paper

Immersion specific error contribution to overlay control

David Laidler, Koen D'havé, Shaunee Cheng

Proceedings Volume 7272, 72720D (2009) https://doi.org/10.1117/12.814923

KEYWORDS: Semiconducting wafers, Data modeling, Overlay metrology, Scanners, Error analysis, Immersion lithography, Double patterning technology, Motion models, Process modeling, Reticles

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Proceedings Article | 4 December 2008 Paper

Paper

Cluster optimization to improve CD control as an enabler for double patterning

Koen D'havé, Len Tedeschi, David Laidler, Craig Rosslee, Philippe Leray

Proceedings Volume 7140, 714023 (2008) https://doi.org/10.1117/12.805239

KEYWORDS: Semiconducting wafers, Etching, Critical dimension metrology, Double patterning technology, Error analysis, Scanners, Metrology, Polarization, Photoresist processing, Lithographic illumination

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Proceedings Article | 24 March 2008 Paper

Paper

Sources of overlay error in double patterning integration schemes

Koen D’havé, David Laidler, Shaunee Cheng, Philippe Leray

Proceedings Volume 6922, 69221E (2008) https://doi.org/10.1117/12.773575

KEYWORDS: Semiconducting wafers, Optical alignment, Overlay metrology, Double patterning technology, Metrology, Etching, Manufacturing, Oxides, Photomasks, Immersion lithography

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Proceedings Article | 4 April 2007 Paper

Paper

Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner

Koen D'havé, David Laidler, Takahiro Machida, Shaunee Cheng

Proceedings Volume 6518, 651805 (2007) https://doi.org/10.1117/12.714255

KEYWORDS: Semiconducting wafers, Scanners, Monochromatic aberrations, Calibration, Metrology, Optical alignment, Reticles, Wafer testing, Immersion lithography, Overlay metrology

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Proceedings Article | 20 August 2005 Paper

Paper

A study of near-lossless analog phase modulation in V-shaped switching FLC cells

Koen D'have, Sheila Galt, David Engstrom, Jorgen Bengtsson, Per Rudquist

Proceedings Volume 5936, 593610 (2005) https://doi.org/10.1117/12.617173

KEYWORDS: Polarization, Phase modulation, Switching, Polarizers, Liquid crystals, Phase shift keying, Analog electronics, Modulation, Amplitude modulation, Poincaré sphere

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Proceedings Article | 10 November 2003 Paper

Paper

Beam steering by combining two binary-phase-modulated FLC SLMs

David Engstrom, Tomasz Matuszczyk, Marek Skeren, Koen D'have, Sverker Hard, Bjorn Lofving, Per Rudquist

Proceedings Volume 5181, (2003) https://doi.org/10.1117/12.502379

KEYWORDS: Spatial light modulators, Beam steering, Diffraction, Sensors, Charge-coupled devices, Diffraction gratings, Modulation, Binary data, Phase modulation, Manufacturing

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SPIE Journal Paper | 1 October 2001

Novel passive polymer waveguides integrated with electro-optically active ferroelectric liquid crystals

David Hermann, Giusy Scalia, Claire Pitois, F. De Marco, K. D'have, Giancarlo Abbate, Mikael Lindgren, Anders Hult

OE, Vol. 40, Issue 10, (October 2001) https://doi.org/10.1117/12.10.1117/1.1403739

KEYWORDS: Waveguides, Polymers, Polymer multimode waveguides, Prisms, Refractive index, Electro optics, Glasses, Photorefractive polymers, Polymer thin films, Ferroelectric LCDs

Proceedings Article | 17 March 2000 Paper

Paper

Antiferroelectric liquid crystals with 45(0) tilt: new electro-optic effects in liquid crystals

Herman Pauwels, M. Matuszczyk, K. D'have, Sven Lagerwall, Per Rudquist, Roman Dabrowski

Proceedings Volume 3955, (2000) https://doi.org/10.1117/12.379981

KEYWORDS: Liquid crystals, Polarization, Polarizers, Electro optics, Phase shift keying, Glasses, Modulation, LCDs, Switching, Scattering

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Showing 5 of 26 publications

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