Mr. Pawan Rawat Profile

Pawan Rawat

at TowerJazz Texas

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 10 April 2013 Paper

CD optimization methodology for extending optical lithography

C. Wong, G. Seevaratnam, T. Wiltshire, N. Felix, T. Brunner, P. Rawat, M. Escalante, W. Kim, E. Rottenkolber, A. Elmalk, V. Wang, C. Leewis, P. Hinnen

Proceedings Volume 8681, 868137 (2013) https://doi.org/10.1117/12.2009397

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scatterometry, Metrology, Photomasks, Etching, Scatter measurement, Scanning electron microscopy, Lithography, Semiconductors

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SPIE Journal Paper | 1 October 2010

Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry targets

Alok Vaid, Matthew Sendelbach, Daniel Moore, Timothy Brunner, Nelson Felix, Pawan Rawat, Cornel Bozdog, Hyang Kyun Kim, Michael Sendler, Stanislav Stepanov, Victor Kucerov

JM3, Vol. 9, Issue 04, 041306, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514707

KEYWORDS: Scatterometry, Semiconducting wafers, Optical properties, Critical dimension metrology, Optical testing, Finite element methods, Diffractive optical elements, Lithography, Data modeling, Metrology

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Proceedings Article | 2 April 2010 Paper

Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings

Alok Vaid, Matthew Sendelbach, Daniel Moore, Timothy Brunner, Nelson Felix, Pawan Rawat, Cornel Bozdog, Helen Kim, Michael Sendler, Stanislav Stepanov, Victor Kucerov

Proceedings Volume 7638, 76381H (2010) https://doi.org/10.1117/12.846648

KEYWORDS: Scatterometry, Finite element methods, Semiconducting wafers, Optical properties, Critical dimension metrology, Diffractive optical elements, Metrology, Data modeling, Optical testing, Scatter measurement

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Proceedings Article | 2 April 2010 Paper

CDSEM focus/dose monitor for product applications

Chas Archie, Eric Solecky, Pawan Rawat, Timothy Brunner, Kenji Yoshimoto, Roger Cornell, Ofer Adan

Proceedings Volume 7638, 763804 (2010) https://doi.org/10.1117/12.846694

KEYWORDS: Semiconducting wafers, Line width roughness, Lithography, Scanners, Scatterometry, Scanning electron microscopy, Optical lithography, Optical testing, Finite element methods, Edge roughness

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