Dr. Pieter Woltgens Profile

Dr. Pieter Woltgens

at ASML Netherlands BV

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Author

Publications (5)

Proceedings Article | 9 April 2024 Presentation + Paper

Advanced EUV patterning of 2D TMDs for CMOS integration

Vina Faramarzi, Etienne de Poortere, Syam Parayil Venugopalan, Pieter Woltgens, Youngtag Woo, Mark van de Kerkhof, Pawan Kumar, Henry Medina Silva, Pierre Morin, Inge Asselberghs, Chelsey Dorow, Kevin O'Brien, Kirby Maxey, Uygar Avci

Proceedings Volume 12956, 129560I (2024) https://doi.org/10.1117/12.3011818

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Photons, Electrons, 2D materials, Field effect transistors, Direct write lithography, Advanced patterning

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Proceedings Article | 26 May 2022 Paper

Logic via printability enhancement using restricted via placement and exhaustive SRAF placement on a staggered grid

Pieter Wöltgens, Alberto Colina, David Rio, Maxence Delorme, Tatiana Kovalevich, Arame Thiam, Frieda van Roey, Odysseas Zografos

Proceedings Volume 12051, 120510I (2022) https://doi.org/10.1117/12.2614260

KEYWORDS: SRAF, Logic, Semiconducting wafers, Lithography, Photomasks, Optical proximity correction, Critical dimension metrology, Printing, Extreme ultraviolet lithography, Statistical analysis

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Proceedings Article | 30 October 2020 Presentation + Paper

Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications

Vincent Wiaux, Joost Bekaert, Tatiana Kovalevich, Julien Ryckaert, Eric Hendrickx, Natalia Davydova, Pieter Woltgens, Ming-Chun Tien, Laurens de Winter, Mark Maslow, Kars Troost

Proceedings Volume 11517, 1151713 (2020) https://doi.org/10.1117/12.2573155

KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Imaging systems, Extreme ultraviolet, Optical proximity correction, Image resolution

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Proceedings Article | 2 April 2020 Presentation + Paper

Simulation investigation of enabling technologies for EUV single exposure of Via patterns in 3nm logic technology

Weimin Gao, Tsann-Bim Chiou, Shih-En Tseng, Pieter Wöltgens, Moyra McManus, Nak Seong, Anthony Yen

Proceedings Volume 11323, 113231L (2020) https://doi.org/10.1117/12.2552888

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Logic, Optical lithography, Photomasks, Resolution enhancement technologies, Source mask optimization, Optical proximity correction, Metals, Nanoimprint lithography

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Proceedings Article | 4 September 2015 Paper

Getting ready for EUV in HVM

Gerald Dicker, Diederik de Bruin, Brennan Peterson, Pieter Wöltgens, Boudewijn Sluijk, Peter Jenkins

Proceedings Volume 9661, 96610F (2015) https://doi.org/10.1117/12.2195622

KEYWORDS: Extreme ultraviolet, Manufacturing, Logic, Metals, Extreme ultraviolet lithography, Logic devices, Optical lithography, Semiconducting wafers, Photomasks, Lithography

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