Dr. Shintaro Yamada Profile

Dr. Shintaro Yamada

Sr. Chemist at DuPont Electronics & Industrial

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Publications (18)

Proceedings Article | 13 June 2022 Presentation

Improving wet etch resistance of organic underlayers

Anton Chavez, Iou-Sheng Ke, Sabrina Wong, Shintaro Yamada

Proceedings Volume PC12055, PC1205508 (2022) https://doi.org/10.1117/12.2612350

KEYWORDS: Wet etching, Resistance, Metals, Etching, Tin, Image processing, Titanium, Polymers, Polymer thin films, Plasma

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Proceedings Article | 22 February 2021 Presentation + Paper

Reducing the absorbance of a high etch resistant spin-on carbon hardmask

Anton Chavez, Iou-Sheng Ke, Sabrina Wong, Curtis Williamson, Li Cui, Paul LaBeaume, Jim Cameron, Shintaro Yamada

Proceedings Volume 11612, 116120F (2021) https://doi.org/10.1117/12.2583630

KEYWORDS: Etching, Absorbance, Carbon, Resistance, System on a chip, Reactive ion etching, Polymers, Image processing, Photoresist materials, Optical lithography

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Proceedings Article | 23 March 2020 Paper

Design considerations for high etch resistance spin-on carbon underlayers

Li Cui, Iou-Sheng Ke, Anton Chavez, Keren Zhang, Paul LaBeaume, Suzanne Coley, Shintaro Yamada, Jim Cameron, Lei Zhang, William Marshall, Benjamin Foltz

Proceedings Volume 11326, 113261N (2020) https://doi.org/10.1117/12.2552024

KEYWORDS: System on a chip, Polymers, Etching, Resistance, Carbon, Polymer thin films, X-rays, FT-IR spectroscopy, Reactive ion etching

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Proceedings Article | 23 March 2020 Paper

Planarized spin-on carbon hardmask

Iou-Sheng (Ike) Ke, Sheng Liu, Keren Zhang, Li Cui, Suzanne Coley, Shintaro Yamada, Jim Cameron

Proceedings Volume 11326, 1132617 (2020) https://doi.org/10.1117/12.2549015

KEYWORDS: System on a chip, Etching, Thin film coatings, Polymers, Resistance, Carbon, Chemical vapor deposition, Coating, Reactive ion etching, Silicon

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Proceedings Article | 25 March 2019 Paper

High temperature spin on carbon materials with excellent planarization and CVD compatibility

Keren Zhang, Li Cui, Shintaro Yamada, Jim Cameron, Sabrina Wong, Lawrence Chen, Suzanne Coley, Dan Greene, Joshua Kaitz, Iou-Sheng Ke, Bhooshan Popere, Paul LaBeaume, Benjamin Foltz, Lei Zhang, Kenneth Kearns, Johnpeter Ngunjiri

Proceedings Volume 10960, 1096019 (2019) https://doi.org/10.1117/12.2514968

KEYWORDS: Chemical vapor deposition, Carbon, Polymers, Resistance, Coating, Etching, 193nm lithography, Materials

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Proceedings Article | 13 March 2018 Paper

The development of an SC1 removable si-anti-reflective-coating

Shintaro Yamada, Iou-Sheng Ke, Charlotte Cutler, Li Cui, Paul LaBeaume, Daniel Greene, Bhooshan Popere, Chris Sullivan, JoAnne Leonard, Suzanne Coley, Sabrina Wong, Owendi Ongayi, Jim Cameron, Michael Clark, Thomas Fitzgibbons

Proceedings Volume 10586, 105860L (2018) https://doi.org/10.1117/12.2297687

KEYWORDS: Etching, Dry etching, Lithography, Polymers, Reflectivity, Ion implantation

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Proceedings Article | 20 March 2015 Paper

Development of spin-on metal hardmask (SOMHM) for advanced node

Shintaro Yamada, Deyan Wang, Vivian Chuang, Cong Liu, Sabrina Wong, Michael Clark, Charlotte Cutler, William Williams, Paul Baranowski, Mingqi Li, Joe Mattia, JoAnne Leonard, Peter Trefonas, Kathleen O’Connell, Cheng bai Xu

Proceedings Volume 9425, 94251X (2015) https://doi.org/10.1117/12.2086005

KEYWORDS: Metals, Etching, Reflectivity, Dry etching, Photoresist materials, Polymers, Chemical vapor deposition, Oxygen, Photomasks, Silicon

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Proceedings Article | 29 March 2006 Paper

Fundamental parameter extraction for a dry/immersion hybrid photoresist for contact hole applications

Stewart Robertson, Shintaro Yamada, Joanne Leonard

Proceedings Volume 6153, 615312 (2006) https://doi.org/10.1117/12.658030

KEYWORDS: Diffusion, Photoresist materials, Lithography, Semiconducting wafers, Water, Thin film coatings, Wafer-level optics, Absorption, Data modeling, Immersion lithography

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Proceedings Article | 12 June 2003 Paper

Design and study of resist materials for 157-nm lithography

Shintaro Yamada, Sungseo Cho, Anthony Zampini

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485106

KEYWORDS: Polymers, Fluorine, Absorbance, Etching, Lithography, Photoresist materials, Polymerization, Transparency, Chemical species, Silicon

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Proceedings Article | 12 June 2003 Paper

Bilayer technology for ArF and F2 lithography: the development of resists to minimize silicon outgassing

George Barclay, Subbareddy Kanagasabapathy, Gerd Pohlers, Joseph Mattia, Kao Xiong, Sheri Ablaza, James Cameron, Tony Zampini, Tao Zhang, Shintaro Yamada, Francois Huby, Kenneth Wiley

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485141

KEYWORDS: Silicon, Polymers, Etching, Lithography, Photoresist materials, Imaging systems, Resistance, Chromatography, Calibration, Photoresist developing

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Proceedings Article | 24 July 2002 Paper

Investigation of a fluorinated ESCAP-based resist for 157-nm lithography

Sungseo Cho, Axel Klauck-Jacobs, Shintaro Yamada, Cheng-Bai Xu, JoAnne Leonard, Anthony Zampini

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474251

KEYWORDS: Polymers, Absorbance, Etching, Fluorine, Lithography, Resistance, Dry etching, Photoresist materials, Thin films, Oxides

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Proceedings Article | 24 August 2001 Paper

Resist materials for 157-nm microlithography: an update

Raymond Hung, Hoang Tran, Brian Trinque, Takashi Chiba, Shintaro Yamada, Daniel Sanders, Eric Connor, Robert Grubbs, John Klopp, Jean Frechet, Brian Thomas, Gregory Shafer, Darryl DesMarteau, Will Conley, C. Grant Willson

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436870

KEYWORDS: Polymers, Absorbance, Fluorine, Carbon monoxide, Polymerization, Palladium, Transparency, Nickel, Lithography, Vacuum ultraviolet

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Proceedings Article | 23 June 2000 Paper

Design and study of aqueous processable positive-tone photoresists

Shintaro Yamada, Jordan Owens, Timo Rager, Morton Nielsen, Jeff Byers, C. Grant Willson

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388341

KEYWORDS: Polymers, Photoresist materials, Etching, Switches, Dry etching, Antimony, Standards development, Photoresist developing, Imaging systems, Silicon

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Proceedings Article | 23 June 2000 Paper

Polymers for 157-nm photoresist applications: a progress report

Kyle Patterson, Mikio Yamachika, Raymond Hung, Colin Brodsky, Shintaro Yamada, Mark Somervell, Brian Osborn, Daniel Hall, Gordana Dukovic, Jeff Byers, Will Conley, C. Grant Willson

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388320

KEYWORDS: Photoresist materials, Polymers, Absorbance, Photoresist developing, Transparency, Deep ultraviolet, Etching, Vacuum ultraviolet, Resistance, Fluorine

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Proceedings Article | 29 June 1998 Paper

Design and study of water-soluble positive- and negative-tone imaging materials

Jennifer Havard, Dario Pasini, Jean Frechet, David Medeiros, Kyle Patterson, Shintaro Yamada, C. Grant Willson

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312351

KEYWORDS: Polymers, Carbonates, Chemistry, Molecules, Switches, Polymer thin films, Spectroscopy, Nitrogen, Chemical species, Standards development

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Proceedings Article | 29 June 1998 Paper

New water-processable chemically amplified resists: three steps, two tones, one solvent

Graham Darling, Alexander Vekselman, Shintaro Yamada

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312402

KEYWORDS: Polymers, Etching, Plasma etching, Plasma, Resistance, Liquids, Chemically amplified resists, Carbonates, Semiconducting wafers, Image resolution

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Proceedings Article | 29 June 1998 Paper

Positive- and negative-tone water-processable photoresists: a progress report

Shintaro Yamada, David Medeiros, Kyle Patterson, Wei-Lun Jen, Timo Rager, Qinghuang Lin, Carlos Lenci, Jeff Byers, Jennifer Havard, Dario Pasini, Jean Frechet, C. Grant Willson

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312414

KEYWORDS: Polymers, Photoresist materials, Switches, Photoresist developing, Etching, Imaging systems, Resistance, Photoresist processing, Polymer thin films, Chromophores

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Proceedings Article | 7 July 1997 Paper

Design of a positive-tone water-soluble resist

Jennifer Havard, Jean Frechet, Dario Pasini, Brenda Mar, Shintaro Yamada, David Medeiros, C. Grant Willson

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275844

KEYWORDS: Coating, Polymers, Chemistry, Ultraviolet radiation, Photochemistry, Image processing, Electron beams, Imaging systems, Silicon, Semiconducting wafers

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Showing 5 of 18 publications

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