Jae-Wuk Ju
Principal Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 10 April 2024 Poster + Paper
Changkyu Lee, Sumin Jang, Baikkyu Hong, Ikhyun Jeong, Sunouk Nam, Hyunsok Kim, Jaewuk Ju, Minho Jung, Mingyu Kim, Hongpeng Su, Yanan Wang, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Roie Volkovich, Nadav Gutman, Ohad Bachar, Renan Milo
Proceedings Volume 12955, 129552H (2024) https://doi.org/10.1117/12.3010101
KEYWORDS: Overlay metrology, Semiconducting wafers, Wafer level optics, Metrology, Optical gratings, Process control, Optical parametric oscillators, Time metrology, Optical alignment

Proceedings Article | 27 April 2023 Poster + Paper
Proceedings Volume 12496, 124962E (2023) https://doi.org/10.1117/12.2657632
KEYWORDS: Overlay metrology, Semiconducting wafers, Advanced process control, Scanners, Scatterometry, Process control, Signal processing, Metrology, Control systems, Optical parametric oscillators

Proceedings Article | 20 March 2020 Paper
Ik-Hyun Jeong, Seung-Woo Koo, Hyun-Sok Kim, Jung-Il Hwang, Dong-Jin Lee, Min-Shik Kim, Jae-Wuk Ju, Kang-Min Lee, Young-Sik Kim, Cees Lambregts, Rizvi Rahman, Marc Hauptmann, Raheleh Pishkari, Allwyn Boustheen, Kwang-Young Hu, Paul Böcker, Dong-Hak Lee, In-Ho Joo, Kang-San Lee
Proceedings Volume 11325, 113252X (2020) https://doi.org/10.1117/12.2552028
KEYWORDS: Overlay metrology, Etching, Inspection, Semiconducting wafers, Metrology, Feedback loops, Scanners, Spatial frequencies, High volume manufacturing

Proceedings Article | 20 March 2019 Presentation + Paper
Ik-Hyun Jeong , Seung-Woo Koo, Hyun-Sok Kim, Jae-Wuk Ju, Young-Sik Kim, Yong-Tae Cho, Heung-Joo Kim, Katja Viatkina, Tom van Hemert, Ruud de Wit, David Deckers, Owen Chen, Nang-Lyeom Oh, Marcus Musselman, Marcus Carbery, Ssuwei Chen, Lucian Schmidt, Heidi Kwon, Jae Gyoo Lee
Proceedings Volume 10963, 1096308 (2019) https://doi.org/10.1117/12.2516578
KEYWORDS: Etching, Overlay metrology, Scanners, Semiconducting wafers, Metrology, Critical dimension metrology, Lithography, Plasma, Process control, Optical lithography

Proceedings Article | 20 March 2019 Presentation + Paper
Ik-Hyun Jeong, Hyun-Sok Kim, Yeong-Oh Kong, Ji-Hyun Song, Jae-Wuk Ju, Young-Sik Kim, Cees Lambregts, Miao Yu, Rizvi Rahman, Leendertjan Karssemeijer, Elliott McNamara, Paul Böcker, Jong-Cheol Choi, Nang-Lyeom Oh, Kang-San Lee, Jin-Seo Lee
Proceedings Volume 10961, 109610A (2019) https://doi.org/10.1117/12.2516259
KEYWORDS: Optical alignment, Semiconducting wafers, Calibration, Data modeling, Overlay metrology, Metrology, Scanners, High volume manufacturing, Lithography, Sensors

Showing 5 of 10 publications
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