Dr. Hanyou Chu Profile

Dr. Hanyou Chu

Research Scientist at Tokyo Electron America Inc

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Publications (7)

Proceedings Article | 24 March 2008 Paper

Forward solve algorithms for optical critical dimension metrology

P. Jiang, H. Chu, J. Hench, Dan Wack

Proceedings Volume 6922, 69221O (2008) https://doi.org/10.1117/12.773003

KEYWORDS: Algorithm development, Finite element methods, Critical dimension metrology, Silicon, Maxwell's equations, Scatterometry, Refractive index, Chemical elements, Dielectrics, Matrices

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Proceedings Article | 10 May 2005 Paper

Performance of measuring contact holes using the Opti-Probe 7341 3-D RT/CD technology

Osman Sorkhabi, Heath Pois, Hanyou Chu, Youxian Wen, Jon Opsal, Won Kim

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598955

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Process control, Metrology, Inspection, Data modeling, Reflectometry, Spectroscopy, Optical lithography, Lithography

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Proceedings Article | 24 May 2004 Paper

Finite difference algorithm in real-time optical CD applications

Jon Opsal, Hanyou Chu, Jingmin Leng

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.556583

KEYWORDS: Silicon, Critical dimension metrology, Scatterometry, Diffusion tensor imaging, Bohrium, Neodymium, Mathematics, Scanning electron microscopy, Numerical stability, Metrology

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Proceedings Article | 24 May 2004 Paper

Contact hole application for lithography process development using the Opti-Probe three-dimensional RT/CD technology

Zhiming Jiang, Osman Sorkhabi, Hanyou Chu, XueLong Cao, Guangwei Li, Youxian Wen, Jon Opsal, Yia-Chung Chang

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.556587

KEYWORDS: Semiconducting wafers, Photoresist materials, Lithography, Finite element methods, Inspection, Oxides, Process control, 3D metrology, Metrology, Critical dimension metrology

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Proceedings Article | 4 November 2003 Paper

Finite difference approach to optical scattering of gratings

Hanyou Chu

Proceedings Volume 5188, (2003) https://doi.org/10.1117/12.507464

KEYWORDS: Scattering, Matrices, Dielectrics, Finite difference methods, Bohrium, Differential equations, Silicon, Scatterometry, Magnetism, Diffraction gratings

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Proceedings Article | 2 June 2003 Paper

Contact hole inspection by real-time optical CD metrology

Jon Opsal, Hanyou Chu, Youxian Wen, Guangwei Li, Yia-Chung Chang

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487607

KEYWORDS: Inspection, Critical dimension metrology, Semiconducting wafers, Optical inspection, Diffraction, Scattering, Microelectronics, Oxides, Spectroscopy, Silicon

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Proceedings Article | 16 July 2002 Paper

Fundamental solutions for real-time optical CD metrology

Jon Opsal, Hanyou Chu, Youxian Wen, Yia-Chung Chang, Guangwei Li

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473448

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Inspection, Etching, Microelectronics, Dielectrics, Cadmium, Oxides, Finite element methods, Optical lithography

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Showing 5 of 7 publications

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