Mr. Seiji Takeuchi Profile

Seiji Takeuchi

at Canon U.S.A., Inc.

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 15 February 2017 Paper

Ultraminiature video-rate forward-view spectrally encoded endoscopy with straight axis configuration

Zhuo Wang, Tzu-Yu Wu, Mark Hamm, Alexander Altshuler, Anderson Mach, Donald Gilbody, Bin Wu, Santosh Ganesan, James Chung, Mitsuhiro Ikuta, Jacob Brauer, Seiji Takeuchi, Tokuyuki Honda

Proceedings Volume 10040, 100400M (2017) https://doi.org/10.1117/12.2253020

KEYWORDS: Endoscopy, Optical components, Diffraction, Optical design, Reflection, Surgery, Imaging systems, Spectroscopy, Endoscopes, Image processing software, Neodymium, Diffraction gratings

Read Abstract +

SPIE Journal Paper | 1 January 2009

Influence of resist blur on resolution of hyper-NA immersion lithography beyond 45-nm half-pitch

Minoru Yoshii, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Seiji Takeuchi, Tokuyuki Honda, Toyohiko Yatagai

JM3, Vol. 8, Issue 01, 013003, (January 2009) https://doi.org/10.1117/12.10.1117/1.3059551

KEYWORDS: Diffusion, Modulation transfer functions, Photoresist materials, Polymers, Immersion lithography, Interferometry, Lithography, Image resolution, Optical simulations, Optical lithography

Read Abstract +

Proceedings Article | 26 March 2007 Paper

Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithography

Yasuhiro Kishikawa, Miyoko Kawashima, Akinori Ohkubo, Yuichi Iwasaki, Seiji Takeuchi, Minoru Yoshii, Tokuyuki Honda

Proceedings Volume 6520, 65203L (2007) https://doi.org/10.1117/12.711420

KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Image resolution, Interferometry, Photoresist materials, Optical simulations, Immersion lithography, Modulation transfer functions

Read Abstract +

Proceedings Article | 22 March 2006 Paper

Visible light point-diffraction interferometer for testing of EUVL optics

Seiji Takeuchi, Osamu Kakuchi, Kenji Yamazoe, Yoshio Gomei, Todd Decker, Michael Johnson, Donald Phillion, John Taylor

Proceedings Volume 6151, 61510E (2006) https://doi.org/10.1117/12.656275

KEYWORDS: Monochromatic aberrations, Visible radiation, Polarization, Interferometers, Calibration, Wavefronts, Optical testing, Zernike polynomials, Extreme ultraviolet lithography, Near field optics

Read Abstract +

Proceedings Article | 18 August 2005 Paper

Calibration of symmetric and non-symmetric errors for interferometry of ultra-precise imaging systems

Donald Phillion, Gary Sommargren, Michael Johnson, Todd Decker, John Taylor, Yoshio Gomei, Osamu Kakuchi, Seiji Takeuchi

Proceedings Volume 5869, 58690R (2005) https://doi.org/10.1117/12.623187

KEYWORDS: Mirrors, Interferometers, Calibration, Interferometry, Wavefronts, Phase interferometry, Optical testing, CCD cameras, Extreme ultraviolet lithography, Spherical lenses

Read Abstract +

Proceedings Article | 18 August 2005 Paper

Construction and testing of wavefront reference sources for interferometry of ultra-precise imaging systems

Michael Johnson, Donald Phillion, Gary Sommargren, Todd Decker, John Taylor, Yoshio Gomei, Osamu Kakuchi, Seiji Takeuchi

Proceedings Volume 5869, 58690P (2005) https://doi.org/10.1117/12.623185

KEYWORDS: Monochromatic aberrations, Mirrors, Metrology, Polarization, Cameras, Calibration, Silicon, Wavefronts, Charge-coupled devices, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 14 November 2003 Paper

Precise in-situ transmission measurement system at 157 nm

Seiji Takeuchi, Yasuhiro Kishikawa, Minoru Yoshii, Akiyoshi Suzuki

Proceedings Volume 5192, (2003) https://doi.org/10.1117/12.506614

KEYWORDS: Lithography, Beam splitters, Polarization, Reflection, Sensors, Calcium, Reflectivity, Transmittance, Excimer lasers, Pulsed laser operation

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, Akiyoshi Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935

KEYWORDS: Diffraction, Mirrors, Interferometers, Wavefronts, Optical testing, Extreme ultraviolet, Extreme ultraviolet lithography, Diffraction gratings, Wavefront metrology, Shearing interferometers

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Development of environmental control technologies for 157-nm lithography at ASET

Yasuaki Fukuda, Seiji Takeuchi, Takashi Aoki, Hiroyuki Nagasaka, Soichi Owa, Fumika Yoshida, Youichi Kawasa, Keiji Egawa, Takehito Watanabe, Ikuo Uchino, Akira Sumitani, Kiyoharu Nakao

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474622

KEYWORDS: Lithography, Lenses, Quartz, Metals, Oxygen, Scanning electron microscopy, Transmittance, Adhesives, Systems modeling, Information operations

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Present status of development of gas-purging and chemically clean technologies at ASET

Yasuaki Fukuda, Seiji Takeuchi, Takashi Aoki, Soichi Owa, Fumika Yoshida, Youichi Kawasa, Akira Sumitani, Keiji Egawa, Takehito Watanabe, Kiyoharu Nakao

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435763

KEYWORDS: Lithography, Contamination, Sensors, Gases, Nitrogen, Oxygen, Optical testing, Transmittance, Surface finishing, Absorption

Read Abstract +

Showing 5 of 10 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years