Dr. Frank Sobel Profile

Dr. Frank Sobel

at SCHOTT Lithotec AG

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 16 June 2005 Paper

High speed reflectometer for EUV mask-blanks

Christian Wies, Rainer Lebert, Bernhard Jagle, L. Juschkin, F. Sobel, H. Seitz, Ronny Walter, C. Laubis, F. Scholze, W. Biel, O. Steffens

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637341

KEYWORDS: Mirrors, Reflectivity, Calibration, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Photons, Charge-coupled devices

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Proceedings Article | 16 June 2005 Paper

Production challenges of making EUV mask blanks

Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Gunter Hess, Konrad Knapp, Christian Wies, Rainer Lebert

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637335

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Metrology, Reflectivity, Dry etching, Inspection, Etching, Process control

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Proceedings Article | 10 May 2005 Paper

High speed reflectometer for EUV mask-blanks

C. Wies, R. Lebert, B. Jaegle, L. Juschkin, F. Sobel, H. Seitz, R. Walter, C. Laubis, F. Scholze, W. Biel, O. Steffens

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599776

KEYWORDS: Mirrors, Reflectivity, Calibration, Reflectometry, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Metrology, Photons, Charge-coupled devices

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Proceedings Article | 6 May 2005 Paper

Recent results on EUV mask blank multilayers and absorbers

Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Guenter Hess, Konrad Knapp, Christian Wies, Rainer Lebert

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600538

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Multilayers, Reflectivity, Etching, Dry etching, Metrology, CCD cameras, Inspection

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Proceedings Article | 6 December 2004 Paper

Absorber stack optimization toward EUV lithography mask blank pilot production

Frank Sobel, Lutz Aschke, Markus Renno, Holger Seitz, Hans Becker, Nathalie Olschewski, Torsten Reichardt, Guenter Hess, Ute Buttgereit, Konrad Knapp, Florian Letzkus, Joerg Butschke, Corinna Koepernik

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568787

KEYWORDS: Coating, Reflectivity, Etching, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Dry etching, Inspection, Manufacturing, Multilayers

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Proceedings Article | 6 December 2004 Paper

SiO2 buffer-etch processes with a TaN absorber for EUV mask fabrication

Florian Letzkus, Joerg Butschke, Corinna Koepernik, Christian Holfeld, Josef Mathuni, Lutz Aschke, Frank Sobel

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569265

KEYWORDS: Etching, Photomasks, Silicon, Dry etching, Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Extreme ultraviolet lithography, Chemistry, Mask making

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Proceedings Article | 6 December 2004 Paper

New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM

Hans Becker, Pascal Schley, Frank Schmidt, Frank Sobel, Markus Renno, Nathalie Olschewski, Holger Seitz, Ute Buttgereit, Konrad Knapp, Guenter Hess

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570217

KEYWORDS: Inspection, Etching, Tantalum, Phase shifts, Dry etching, Lithography, Oxides, Silica, Reflection, Mask cleaning

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Proceedings Article | 20 August 2004 Paper

Performance data on new tunable attenuating PSM for 193-nm and 157-nm lithography

Hans Becker, Frank Schmidt, Frank Sobel, Markus Renno, Ute Buttgereit, Jay Chey, Marie Angelopoulos, Konrad Knapp, Gunter Hess

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557798

KEYWORDS: Particles, Phase shifts, Silica, Lithography, Etching, Photomasks, Tantalum, Surface roughness, Scanning electron microscopy, Deposition processes

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Proceedings Article | 2 June 2004 Paper

Production challenges of making an EUV mask blank

Lutz Aschke, Hans Becker, Falk Friemel, Thomas Leutbecher, Nathalie Olschewski, Markus Renno, Frauke Rueggeberg, Mario Schiffler, Frank Schmidt, Frank Sobel, Kurt Walter, Guenter Hess, Frank Lenzen, Konrad Knapp, Jochen Alkemper, Hrabanus Hack, Klaus Megges, Ina Mitra, Rolf Mueller, Uwe Nolte, Joerg Schumacher, Wolfgang Pannhorst

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568007

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Zerodur, Reflectivity, Polishing, Temperature metrology, Surface finishing, Glasses

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Proceedings Article | 2 June 2004 Paper

Effect of electrostatic chucking on EUVL mask flatness

Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Lutz Aschke, Frauke Rueggeberg, Frank Sobel

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568014

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Polishing, Multilayers, Surface finishing, Data modeling, Finite element methods, Standards development, Mask making, Semiconductors

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Proceedings Article | 20 May 2004 Paper

Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber

Frank Sobel, Lutz Aschke, Frauke Rueggeberg, Holger Seitz, Nathalie Olschewski, Torsten Reichhardt, Hans Becker, Markus Renno, Steffen Kirchner, Thomas Leutbecher, Guenter Hess, Konrad Knapp

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.533292

KEYWORDS: Multilayers, Photomasks, Extreme ultraviolet lithography, Polishing, Extreme ultraviolet, Surface finishing, Magnetorheological finishing, Surface roughness, Silica, Optical coatings

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Proceedings Article | 20 May 2004 Paper

High-throughput EUV reflectometer for EUV mask blanks

Rainer Lebert, Christian Wies, Larissa Juschkin, Bernhard Jaegle, Manfred Meisen, Lutz Aschke, Frank Sobel, Holger Seitz, Frank Scholze, Gerhard Ulm, Konstantin Walter, Willi Neff, Klaus Bergmann, Wolfgang Biel

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537012

KEYWORDS: Reflectometry, Photomasks, Extreme ultraviolet, Mirrors, Spectrographs, Charge-coupled devices, Metrology, Extreme ultraviolet lithography, Photons, Reflectivity

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Proceedings Article | 17 December 2003 Paper

Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography

Hans Becker, Jay Chey, Frank Sobel, Frank Schmidt, Markus Renno, Ute Buttgereit, Marie Angelopoulos, Guenter Hess, Konrad Knapp

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518339

KEYWORDS: Phase shifts, Particles, Tantalum, Phase shifting, Lithography, Photomasks, Chemical lasers, Laser stabilization, Vacuum ultraviolet, Ion beams

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Proceedings Article | 17 December 2003 Paper

Update on the EUVL mask blank activity at Schott Lithotec

Frank Sobel, Lutz Aschke, Hans Becker, Markus Renno, Frauke Ruggeberg, Steffen Kirchner, Thomas Leutbecher, Nathalie Olschewski, Mario Schiffler, Kurt Walter, Guenter Hess, Ute Buttgereit, Konrad Knapp, Rainer Lebert, Larissa Juschkin, Christian Wies, Bernhard Jagle

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518061

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Coating, Reflectivity, Polishing, Reflectometry, Surface finishing, Metrology

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Proceedings Article | 27 December 2002 Paper

High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition

Hans Becker, Frank Sobel, Lutz Aschke, Markus Renno, Juergen Krieger, Ute Buttgereit, Guenter Hess, Frank Lenzen, Konrad Knapp, Sergey Yulin, Torsten Feigl, Thomas Kuhlmann, Norbert Kaiser

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467578

KEYWORDS: Reflectivity, Multilayers, Particles, Extreme ultraviolet, Ion beams, Transmission electron microscopy, Silicon, Sputter deposition, Interfaces, Reflectometry

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Proceedings Article | 19 May 2000 Paper

Spectral characteristics of DFB polymer lasers

Vincent Dumarcher, Licinio Rocha, Christine Denis, Celine Fiorini-Debuisschert, Jean-Michel Nunzi, Frank Sobel, Bouchta Sahraoui, Denis Gindre, Kevin Kretsch, Werner Blau, S. Pfeiffer, Hartwig Tillmann, Hans-Heinrich Hoerhold, Thierry Maillou, Jacques Le Moigne

Proceedings Volume 3939, (2000) https://doi.org/10.1117/12.386358

KEYWORDS: Polymers, Waveguides, Polymethylmethacrylate, Modes of laser operation, Rhodamine, Polymer multimode waveguides, Modulation, Dispersion, Polymer thin films, Luminescence

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Proceedings Article | 11 October 1999 Paper

Laser action in periodically structured polymer films

Jean-Michel Nunzi, Frank Sobel, Denis Gindre, Bouchta Sahraoui, Christine Denis, Vincent Dumarcher, Celine Fiorini-Debuisschert, Barbara Paci, Licinio Rocha

Proceedings Volume 3796, (1999) https://doi.org/10.1117/12.368272

KEYWORDS: Polymers, Polymer thin films, Mirrors, Interferometers, Modes of laser operation, Waveguides, Wave propagation, Absorption, Picosecond phenomena, Luminescence

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Showing 5 of 17 publications

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