Dr. Peter Dirksen Profile

Dr. Peter Dirksen

at Philips Research Labs

SPIE Involvement:

Author

Publications (19)

SPIE Journal Paper | 1 July 2006 Open Access

Concise formula for the Zernike coefficients of scaled pupils

Augustus Janssen, Peter Dirksen

JM3, Vol. 5, Issue 03, 030501, (July 2006) https://doi.org/10.1117/12.10.1117/1.2345672

KEYWORDS: Lithography, Scanners, Image processing, Zernike polynomials, Monochromatic aberrations, Solids, Optical lithography, Lithographic illumination, Computer simulations

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Proceedings Article | 15 March 2006 Paper

Aerial image based lens metrology for wafer steppers

Peter Dirksen, Joseph Braat, Augustus Janssen, Ad Leeuwestein, Tomoyuki Matsuyama, Tomoya Noda

Proceedings Volume 6154, 61540X (2006) https://doi.org/10.1117/12.659428

KEYWORDS: Reticles, Wavefronts, Spherical lenses, Monochromatic aberrations, Semiconducting wafers, Metrology, Interferometers, Mirrors, Objectives, Phase measurement

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SPIE Journal Paper | 1 January 2006

Estimating resist parameters in optical lithography using the extended Nijboer-Zernike theory

Peter Dirksen, Joseph Braat, Augustus Janssen

JM3, Vol. 5, Issue 01, 013005, (January 2006) https://doi.org/10.1117/12.10.1117/1.2168449

KEYWORDS: Diffusion, Optical lithography, Mathematical modeling, Monochromatic aberrations, Point spread functions, Image processing, Convolution, Stochastic processes, Photoresist processing, Solids

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Proceedings Article | 12 May 2005 Paper

Aberration retrieval for high-NA optical systems using the extended Nijboer-Zernike theory

Peter Dirksen, Joseph Braat, Augustus Janssen, Ad Leeuwestein

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.597406

KEYWORDS: Point spread functions, Diffusion, Scanners, Monochromatic aberrations, Solids, Diffraction, Lithography, Semiconducting wafers, Water, Mathematical modeling

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Proceedings Article | 12 May 2005 Paper

Influence of mask induced polarization effects on a pattern printability

Yuri Aksenov, Peter Dirksen, Xiuhong Wei, Peter Zandbergen

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.597438

KEYWORDS: Diffraction, Photomasks, Polarization, Chromium, Binary data, Semiconducting wafers, Critical dimension metrology, Reticles, Optical proximity correction, Near field

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Proceedings Article | 5 May 2005 Paper

Evaluating design for manufacturing with process capability analysis

Johannes van Wingerden, Laurent Le Cam, Manish Garg, Yuri Aksenov, Peter Dirksen

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.599648

KEYWORDS: Photomasks, Critical dimension metrology, Manufacturing, Semiconducting wafers, Design for manufacturing, Image processing, Electroluminescence, Lithography, Data modeling, Scanners

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Proceedings Article | 28 May 2004 Paper

Determination of resist parameters using the extended Nijboer-Zernike theory

Peter Dirksen, Joseph Braat, Augustus Janssen, Ad Leeuwestein, Hans Kwinten, David Van Steenwinckel

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.531840

KEYWORDS: Diffusion, Monochromatic aberrations, Stochastic processes, Convolution, Image processing, Point spread functions, Semiconducting wafers, Reticles, Solids, Mathematical modeling

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Proceedings Article | 26 June 2003 Paper

Lithographic process optimization using process capability analysis

Johannes van Wingerden, Peter Dirksen, Casper Juffermans, Yorick Trouiller

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485520

KEYWORDS: Critical dimension metrology, Photomasks, Image processing, Monte Carlo methods, Semiconducting wafers, Electroluminescence, Process control, Optical proximity correction, Lithography, Statistical analysis

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Proceedings Article | 26 June 2003 Paper

Experimental determination of lens aberrations from the intensity point-spread function in the focal region

Peter Dirksen, Joseph Braat, Augustus Janssen, Casper Juffermans, Ad Leeuwestein

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485388

KEYWORDS: Monochromatic aberrations, Spherical lenses, Optical lithography, Semiconducting wafers, Scanners

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SPIE Journal Paper | 1 January 2003

Aberration retrieval using the extended Nijboer-Zernike approach

Peter Dirksen, Joseph Braat, Augustus Janssen, Casper Juffermans

JM3, Vol. 2, Issue 01, (January 2003) https://doi.org/10.1117/12.10.1117/1.1531191

KEYWORDS: Phase retrieval, Monochromatic aberrations, Lithography, Microscopes, Photomasks, Reticles, Scanning electron microscopy, Testing and analysis, Objectives, Optical inspection

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Proceedings Article | 30 July 2002 Paper

Characterization of a projection lens using the extended Nijboer-Zernike approach

Peter Dirksen, Joseph Braat, Peter De Bisschop, Guido Janssen, Casper Juffermans, Alvina Williams

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474523

KEYWORDS: Point spread functions, Monochromatic aberrations, Phase retrieval, Lithography, Microscopes, Photomasks, Reticles, Scanning electron microscopy, Testing and analysis, Objectives

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Proceedings Article | 30 July 2002 Paper

Aberration determination in early 157-nm exposure system

Bruce Smith, Will Conley, Cesar Garza, Jeff Meute, Daniel Miller, Georgia Rich, Victoria Graffenberg, Kim Dean, Shashikant Patel, Arnie Ford, James Foster, Marco Moers, Kevin Cummings, James Webb, Paul Dewa, Azeddine Zerrade, Susan MacDonald, Greg Hughes, Peter Dirksen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474551

KEYWORDS: Photomasks, Monochromatic aberrations, Scanning electron microscopy, Image processing, Lithography, Manufacturing, Imaging systems, Wavefronts, Zernike polynomials, Edge detection

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Proceedings Article | 5 July 2000 Paper

Impact of high-order aberrations on the performance of the aberration monitor

Peter Dirksen, Casper Juffermans, Andre Engelen, Peter De Bisschop, Henning Muellerke

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389010

KEYWORDS: Monochromatic aberrations, Spherical lenses, Sodium, Interferometry, 3D modeling, Scanners, Deep ultraviolet, Data modeling, Scanning electron microscopy, Optical lithography

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Proceedings Article | 26 July 1999 Paper

Novel aberration monitor for optical lithography

Peter Dirksen, Casper Juffermans, Rudy Pellens, Mireille Maenhoudt, Peter De Bisschop

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354385

KEYWORDS: Monochromatic aberrations, Spherical lenses, Interferometry, Reticles, Binary data, Optical lithography, Zernike polynomials, Data modeling, Prototyping, Critical dimension metrology

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Proceedings Article | 14 June 1999 Paper

Improved wafer stepper alignment performance using an enhanced phase grating alignment system

Jaap Neijzen, Robert Morton, Peter Dirksen, Henry Megens, Frank Bornebroek

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350826

KEYWORDS: Optical alignment, Semiconducting wafers, Coating, Data transmission, Chemical mechanical planarization, Aluminum, Numerical simulations, Oxides, Diffraction, Spatial frequencies

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Proceedings Article | 7 July 1997 Paper

Effect of processing on the overlay performance of a wafer stepper

Peter Dirksen, Casper Juffermans, A. Leeuwestein, Kees Mutsaers, Tom Nuijs, Rudy Pellens, Robert Wolters, Jack Gemen

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275950

KEYWORDS: Optical alignment, Semiconducting wafers, Aluminum, Chemical mechanical planarization, Metals, Photoresist processing, Light scattering, Polishing, Sputter deposition, Diffraction

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Proceedings Article | 7 June 1996 Paper

Focus and exposure dose determination using stepper alignment

Peter Dirksen, Rudy Pellens, Casper Juffermans, Marijan Reuhman-Huisken, Hans van der Laan

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240941

KEYWORDS: Optical alignment, Semiconducting wafers, Silicon, Solids, Deep ultraviolet, Imaging systems, Calibration, Refractive index, Lithography, Chromium

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Proceedings Article | 26 May 1995 Paper

Latent image metrology for production wafer steppers

Peter Dirksen, Walter de Laat, Henry Megens

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209297

KEYWORDS: Semiconducting wafers, Optical alignment, Scanning electron microscopy, Monochromatic aberrations, Metrology, Deep ultraviolet, Silicon, Reticles, Time metrology, Calibration

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Proceedings Article | 17 May 1994 Paper

Simulations on step-and-scan optical lithography

Joerg Bischoff, Wolfgang Henke, Jan van der Werf, Peter Dirksen

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175488

KEYWORDS: Reticles, Semiconducting wafers, Printing, Monochromatic aberrations, Optical lithography, Convolution, Spatial frequencies, Contrast transfer function, Lithography, Fourier transforms

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Showing 5 of 19 publications

Conference Committee Involvement (4)

Optical Microlithography XIX

21 February 2006 | San Jose, California, United States

Optical Microlithography XVIII

1 March 2005 | San Jose, California, United States

Optical Microlithography XVII

24 February 2004 | Santa Clara, California, United States

Optical Microlithography XVI

25 February 2003 | Santa Clara, California, United States

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