Mr. Peter Zandbergen Profile

Peter Zandbergen

at Philips Research

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Author

Publications (9)

Proceedings Article | 15 March 2006 Paper

Compensation of high-NA mask topography effects by using object modified Kirchhoff model for 65 and 45nm nodes

Yuri Aksenov, Peter Zandbergen, Masaki Yoshizawa

Proceedings Volume 6154, 61541H (2006) https://doi.org/10.1117/12.659345

KEYWORDS: Diffraction, Reticles, Photomasks, Binary data, Polarization, Signal attenuation, Chromium, Optical proximity correction, Printing, Phase shifts

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Proceedings Article | 12 May 2005 Paper

Influence of mask induced polarization effects on a pattern printability

Yuri Aksenov, Peter Dirksen, Xiuhong Wei, Peter Zandbergen

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.597438

KEYWORDS: Diffraction, Photomasks, Polarization, Chromium, Binary data, Semiconducting wafers, Critical dimension metrology, Reticles, Optical proximity correction, Near field

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Proceedings Article | 4 May 2005 Paper

Anti-bubble topcoat for immersion lithography

Laurent Marinier, Yuri Aksenov, Rob Morton, David Van Steenwinckel, Peter Zandbergen

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599643

KEYWORDS: Particles, Immersion lithography, Point spread functions, Pellicles, Defect detection, Monochromatic aberrations, Scanning electron microscopy, Liquids, Mie scattering, Scattering

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Proceedings Article | 5 July 2000 Paper

Limits of optical lithography

Mireille Maenhoudt, Staf Verhaegen, Kurt Ronse, Peter Zandbergen, Edward Muzio

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389027

KEYWORDS: Critical dimension metrology, Photomasks, Reticles, Resolution enhancement technologies, 193nm lithography, Monte Carlo methods, Binary data, Lithographic illumination, Optical lithography, Lithography

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Proceedings Article | 26 July 1999 Paper

Optical extension at the 193-nm wavelength

Peter Zandbergen, Martin McCallum, Gilles Amblard, Wolf-Dieter Domke, Bruce Smith, Lena Zavyalova, John Petersen

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354343

KEYWORDS: Fiber optic illuminators, Photomasks, 193nm lithography, Binary data, Lithography, Optical lithography, Phase shifts, Lithographic illumination, Photoresist processing, Optics manufacturing

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Proceedings Article | 11 June 1999 Paper

193-nm single-layer process for 150-nm technology generation and below

Gilles Amblard, Peter Zandbergen, Martin McCallum, Alan Stephen, Jeff Byers, Kim Dean, Jeff Meute, Carla Nelson-Thomas

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350270

KEYWORDS: Photoresist processing, Reflectivity, Lithography, Silicon, Semiconducting wafers, 193nm lithography, Photomasks, Binary data, Phase shifts, Organic materials

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Proceedings Article | 29 June 1998 Paper

Can sub-0.18-um FEOL be realized in production with KrF DUV?

Wendy Gehoel-van Ansem, Peter Zandbergen, Jos de Klerk

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312420

KEYWORDS: Etching, Front end of line, Critical dimension metrology, Deep ultraviolet, Lithography, Logic, Process control, Reflectivity, Optical lithography, Lithographic illumination

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Proceedings Article | 29 June 1998 Paper

Proximity bias swing: origin and characterization

Peter Zandbergen, Wendy Gehoel-van Ansem, Jos de Klerk, Geert Vandenberghe, Frank Linskens

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312433

KEYWORDS: Diffraction, Reflectivity, Critical dimension metrology, Deep ultraviolet, Lithography, Photomasks, Photoresist processing, Picture Archiving and Communication System, Coherence (optics), Phase shifts

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Proceedings Article | 7 July 1997 Paper

Characterization and optimization of positive-tone DUV resists on TiN substrates

Peter Zandbergen, Wendy Gehoel-van Ansem, Geert Vandenberghe, Veerle Van Driessche, Hans Vloeberghs

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275832

KEYWORDS: Tin, Deep ultraviolet, Nitrogen, Absorbance, Contamination, Metals, Optical lithography, Semiconducting wafers, Reflectivity, Optical properties

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Showing 5 of 9 publications

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