Dr. Pierre M. Boher Profile

Dr. Pierre M. Boher

Director R&D at ELDIM

SPIE Involvement:

Author

Profile Summary

Pierre Boher earned an Engineer degree at the ECP (Ecole Centrale des Arts et Manufactures) in 1982. After earning his Ph.D. in material sciences in 1984, he worked in the French Philips Laboratories during nine years on the deposition and characterization of very thin films and multilayers. R&D manager at SOPRA between 1995 and 2002, he participates to the development of different metrology tools for non destructive characterization mainly for microelectronics. He joined ELDIM in 2003 to be involved in the research and development of new metrology heads.

Publications (60)

Proceedings Article | 24 February 2020 Paper

Paper

Quality control optical characterization of NIR VCSEL based light sources for 3D imaging applications

Pierre Boher, Thierry Leroux, Véronique Collomb-Patton

Proceedings Volume 11300, 1130006 (2020) https://doi.org/10.1117/12.2543520

KEYWORDS: Near infrared, Light sources, Vertical cavity surface emitting lasers, Safety, Fourier optics, Stereoscopy, Sensors, Light emitting diodes, Spatial resolution, Calibration

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Proceedings Article | 19 February 2018 Paper

Paper

Color volumes in lab and ICtCp color spaces for viewing angle color characterization of QLED and OLED HDR/WCG displays

Pierre Boher, Thierry Leroux, Pierre Blanc

Proceedings Volume 10556, 105560C (2018) https://doi.org/10.1117/12.2285371

KEYWORDS: Organic light emitting diodes, Colorimetry, Televisions, High dynamic range imaging, Fourier optics, CIE 1931 color space, LCDs

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Proceedings Article | 16 February 2017 Presentation + Paper

Presentation + Paper

New generation of Fourier optics viewing angle measurement systems

Pierre Boher, Thierry Leroux, Vincent Leroux, Thibault Bignon, Véronique Collomb-Patton

Proceedings Volume 10126, 1012604 (2017) https://doi.org/10.1117/12.2256125

KEYWORDS: High angular resolution imaging, Stray light, Goniophotometry, Quality systems, LCDs, Fourier optics, Optical testing, Imaging systems, CMOS sensors, Sensors, Glasses, Control systems, Robotics, Ferroelectric LCDs

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Proceedings Article | 7 March 2016 Paper

Paper

Emissive and reflective properties of curved displays in relation to image quality

Pierre Boher, Thierry Leroux, Thibault Bignon, Véronique Collomb-Patton, Pierre Blanc, Etienne Sandré-Chardonnal

Proceedings Volume 9770, 977002 (2016) https://doi.org/10.1117/12.2207850

KEYWORDS: LCDs, Reflectivity, Image quality, Flexible displays, Ray tracing, Televisions, Computer simulations, Reflective displays, Bidirectional reflectance transmission function, Visualization, Video, Multimedia, Mathematics, Distortion, Fourier optics, Organic light emitting diodes, Diffraction, Light sources and illumination

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Proceedings Article | 13 March 2015 Paper

Paper

New generation of Fourier optics instruments for fast multispectral BRDF characterization

Pierre Boher, Thierry Leroux, Véronique Collomb-Patton, Thibault Bignon

Proceedings Volume 9398, 93980H (2015) https://doi.org/10.1117/12.2077600

KEYWORDS: Bidirectional reflectance transmission function, Polarizers, Fourier optics, LCDs, Reflectivity, Reflection, Collimation, Sensors, Spatial resolution, Backscatter

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Proceedings Article | 11 March 2015 Paper

Paper

Viewing angle and imaging multispectral analysis of OLED display light emission

Pierre Boher, Thierry Leroux, Thibault Bignon, Véronique Collomb-Patton

Proceedings Volume 9385, 93850N (2015) https://doi.org/10.1117/12.2077453

KEYWORDS: Organic light emitting diodes, Multispectral imaging, Polymers, Eye, Fourier optics, Iris, Linear filtering, OLED lighting, Imaging systems, Bandpass filters

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Proceedings Article | 6 March 2014 Paper

Paper

Practical resolution requirements of measurement instruments for precise characterization of autostereoscopic 3D displays

Pierre Boher, Thierry Leroux, Véronique Collomb-Patton, Thibault Bignon

Proceedings Volume 9011, 90111K (2014) https://doi.org/10.1117/12.2039553

KEYWORDS: Spatial resolution, 3D displays, Eye, Iris, 3D metrology, Imaging systems, Fourier optics, CCD image sensors, Image resolution, Cameras

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Proceedings Article | 25 February 2014 Paper

Paper

Optical characterization of auto-stereoscopic 3D displays: interest of the resolution and comparison to human eye properties

Pierre Boher, Thierry Leroux, Thibault Bignon, Véronique Collomb-Patton

Proceedings Volume 9005, 900504 (2014) https://doi.org/10.1117/12.2039534

KEYWORDS: Spatial resolution, 3D displays, Eye, 3D metrology, Fourier optics, Iris, Imaging systems, CCD image sensors, Stereoscopy, Televisions

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Proceedings Article | 7 February 2012 Paper

Paper

Full optical characterization of autostereoscopic 3D displays using local viewing angle and imaging measurements

Pierre Boher, Thierry Leroux, Thibault Bignon, Véronique Collomb-Patton

Proceedings Volume 8288, 82880S (2012) https://doi.org/10.1117/12.905971

KEYWORDS: 3D displays, Eye, 3D metrology, Imaging systems, Computing systems, Fourier optics, Spatial resolution, Head, CCD image sensors, Sensors

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Proceedings Article | 6 February 2012 Paper

Paper

Optical characterization of different types of 3D displays

Pierre Boher, Thierry Leroux, Thibault Bignon, Véronique Collomb-Patton

Proceedings Volume 8280, 82800A (2012) https://doi.org/10.1117/12.915866

KEYWORDS: Glasses, 3D displays, Eye, LCDs, Polarization, Optical filters, 3D metrology, Transmittance, Optical testing, Camera shutters

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Proceedings Article | 15 February 2011 Paper

Paper

Optical characterization of shutter glasses stereoscopic 3D displays

P. Boher, T. Leroux, V. Collomb Patton, T. Bignon

Proceedings Volume 7863, 786312 (2011) https://doi.org/10.1117/12.870731

KEYWORDS: Glasses, LCDs, Camera shutters, 3D displays, Televisions, Eye, 3D metrology, Transmittance, Plasma display panels, 3D image processing

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Proceedings Article | 24 February 2010 Paper

Paper

Multispectral polarization viewing angle analysis of circular polarized stereoscopic 3D displays

Pierre Boher, Thierry Leroux, Thibault Bignon, Véronique Collomb-Patton

Proceedings Volume 7524, 75240R (2010) https://doi.org/10.1117/12.837509

KEYWORDS: Polarization, 3D displays, Eye, Glasses, 3D metrology, Optical filters, LCDs, Phase shifts, Wave plates, Polarizers

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Proceedings Article | 17 February 2010 Paper

Paper

Imaging polarization for characterization of polarization based stereoscopic 3D displays

Pierre Boher, Thierry Leroux, Véronique Collomb-Patton, Thibault Bignon, David Glinel

Proceedings Volume 7524, 75241K (2010) https://doi.org/10.1117/12.837529

KEYWORDS: Polarization, Eye, 3D displays, Optical filters, Glasses, Polarimetry, Phase shifts, LCDs, 3D metrology, CCD image sensors

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Proceedings Article | 18 February 2009 Paper

Paper

A new way to characterize autostereoscopic 3D displays using Fourier optics instrument

P. Boher, T. Leroux, T. Bignon, V. Collomb-Patton

Proceedings Volume 7237, 72370Z (2009) https://doi.org/10.1117/12.806774

KEYWORDS: 3D displays, 3D metrology, Eye, Spatial resolution, Fourier optics, 3D vision, 3D imaging standards, Image quality standards, Sensors, Standards development

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Proceedings Article | 5 April 2007 Paper

Paper

Robust sub-50-nm CD control by a fast-goniometric scatterometry technique

Jérôme Hazart, Pierre Barritault, Stéphanie Garcia, Thierry Leroux, Pierre Boher, Koichi Tsujino

Proceedings Volume 6518, 65183A (2007) https://doi.org/10.1117/12.712844

KEYWORDS: Critical dimension metrology, Ellipsometry, Scatterometry, Refractive index, Reflectivity, Silicon, Metrology, Polarizers, Error analysis, Statistical analysis

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Proceedings Article | 10 May 2005 Paper

Paper

Improved CD and overlay metrology using an optical Fourier transform instrument

J. Petit, P. Boher, T. Leroux, P. Barritault, J. Hazart, P. Chaton

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599464

KEYWORDS: Overlay metrology, Diffraction gratings, Diffraction, Fourier transforms, Reflectivity, Double patterning technology, Scattering, Fourier optics, Silicon, Spectroscopic ellipsometry

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Proceedings Article | 10 May 2005 Paper

Paper

Optical Fourier transform scatterometry for LER and LWR metrology

P. Boher, J. Petit, T. Leroux, J. Foucher, Y. Desieres, J. Hazart, P. Chaton

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.594526

KEYWORDS: Line width roughness, Line edge roughness, Dielectrophoresis, Diffraction, Diffraction gratings, Fourier optics, Critical dimension metrology, Fourier transforms, Scatterometry, Metrology

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Proceedings Article | 20 October 2004 Paper

Paper

Rapid photo-goniometric technique for LED emission characterization

Pierre Boher, Mathieu Luet, Thierry Leroux

Proceedings Volume 5530, (2004) https://doi.org/10.1117/12.563937

KEYWORDS: Light emitting diodes, Semiconductor lasers, Sensors, Polarization, CCD image sensors, Laser damage threshold, Optical filters, Fourier transforms, Fourier optics, Charge-coupled devices

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Proceedings Article | 10 September 2004 Paper

Paper

Light-scattered measurements using Fourier optics: a new tool for surface characterization

Pierre Boher, Mathieu Luet, Thierry Leroux

Proceedings Volume 5457, (2004) https://doi.org/10.1117/12.545390

KEYWORDS: Bidirectional reflectance transmission function, Fourier optics, Sensors, Light scattering, Air contamination, Polarization, Printing, Optical testing, Scattering, Polarizers

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Proceedings Article | 24 May 2004 Paper

Paper

A new analysis strategy for CD metrology using rapid photo goniometry method

Jerome Petit, Pierre Barritault, Jerome Hazart, Patrick Chaton, Pierre Boher, Mathieu Luet, Thierry Leroux

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533031

KEYWORDS: Diffraction gratings, Diffraction, Scanning electron microscopy, Critical dimension metrology, Spectroscopic ellipsometry, Polarizers, Specular reflections, Photoresist materials, CCD image sensors, Sensors

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Proceedings Article | 24 May 2004 Paper

Paper

Innovative rapid photogoniometry method for CD metrology

Pierre Boher, Mathieu Luet, Thierry Leroux, Jerome Petit, Pierre Barritault, Jerome Hazart, Patrick Chaton

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533426

KEYWORDS: Diffraction, Diffraction gratings, Fourier optics, Reflection, Polarization, Spectroscopic ellipsometry, CCD image sensors, Refractive index, Silicon, Sensors

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Proceedings Article | 16 June 2003 Paper

Paper

The French R&D program on EUV lithography: PREUVE

Valerie Paret, Pierre Boher, Jean-Yves Robic, Remy Marmoret, Martin Schmidt, Christophe Cachoncille, Roland Geyl, Jean Jacques Ferme, Bernard Vidal, Jean Marie Barbiche

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504564

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Multilayers, Mirrors, Optical coatings, Xenon, Metrology, Plasma, Reflectivity

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Proceedings Article | 27 December 2002 Paper

Paper

Precise and accurate characterization of DUV and V-UV phase-shifting mask materials by combined V-UV spectroscopic ellipsometry and x-ray reflectometry

Pierre Boher, Adrien Darragon, Christophe Defranoux, Jean-Claude Fouere, Jean-Louis Stehle

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.474127

KEYWORDS: Spectroscopic ellipsometry, Reflectometry, X-rays, Thin films, Deep ultraviolet, Reflectivity, Phase shifts, Surface roughness, X-ray characterization, Transmittance

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Proceedings Article | 10 December 2001 Paper

Paper

Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool

Pierre Boher, Jean-Philippe Piel, Jean-Louis Stehle, Christopher Pickering, Alexandre Tarnowka

Proceedings Volume 4449, (2001) https://doi.org/10.1117/12.450081

KEYWORDS: Silicon, Calibration, Metrology, Wave plates, Semiconducting wafers, Spectroscopic ellipsometry, Germanium, Polarizers, Pattern recognition, Semiconductors

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Proceedings Article | 10 December 2001 Paper

Paper

IR spectroscopic ellipsometry for industrial characterization of semiconductors

Pierre Boher, Marc Bucchia, Jean-Philippe Piel, Christophe Defranoux, Jean-Louis Stehle, Christopher Pickering

Proceedings Volume 4449, (2001) https://doi.org/10.1117/12.450110

KEYWORDS: Infrared spectroscopy, Silicon, Dielectrics, Semiconductors, Spectroscopic ellipsometry, Polarizers, Fluorine, Infrared radiation, Spectroscopy, Absorption

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Proceedings Article | 10 December 2001 Paper

Paper

Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm

Pierre Boher, Patrick Evrard, Jean-Philippe Piel, Jean-Louis Stehle

Proceedings Volume 4449, (2001) https://doi.org/10.1117/12.450107

KEYWORDS: Vacuum ultraviolet, Reflectivity, X-rays, Thin films, Dielectrics, Spectroscopic ellipsometry, Contamination, Metrology, Multilayers, Antireflective coatings

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Proceedings Article | 23 October 2001 Paper

Paper

Phase-shifting interference microscope for the characterization of metallic interconnections of flat panel displays

Pierre Boher, Jean-Philippe Piel, Jean-Louis Stehle, Arnaud Dubois, Albert Boccara

Proceedings Volume 4447, (2001) https://doi.org/10.1117/12.446735

KEYWORDS: Flat panel displays, Phase shifts, Glasses, Microscopes, Phase shift keying, Reflection, Metals, Phase modulation, Modulation, Refractive index

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Proceedings Article | 20 August 2001 Paper

Paper

Combined metrology including VUV spectroscopic ellipsometry and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm

Pierre Boher, Patrick Evrard, Jean-Philippe Piel, Sylvie Janicot, Jean-Louis Stehle

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436635

KEYWORDS: Vacuum ultraviolet, X-rays, Reflectivity, Spectroscopic ellipsometry, Thin films, Antireflective coatings, Dielectrics, Metrology, Multilayers, Lithography

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Proceedings Article | 26 April 2001 Paper

Paper

New instrument to characterize materials and optics for 157-nm lithography

Pierre Boher, Patrick Evrard, Jean-Philippe Piel, Jean-Louis Stehle

Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425199

KEYWORDS: Vacuum ultraviolet, X-rays, Reflectivity, Lithography, Spectroscopic ellipsometry, Antireflective coatings, Dielectrics, Polarizers, Contamination, Absorption

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Proceedings Article | 20 April 2001 Paper

Paper

Characterization of ultrathin gate dielectrics using combined grazing x-ray reflectance and spectroscopic ellipsometry

Pierre Boher, Jean-Philippe Piel, Patrick Evard, Christophe Defranoux, Jean-Louis Stehle

Proceedings Volume 4405, (2001) https://doi.org/10.1117/12.425256

KEYWORDS: Dielectrics, X-rays, Spectroscopic ellipsometry, Oxides, Reflectivity, Interfaces, Silicon, Nitrogen, Process control, Metrology

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Proceedings Article | 2 November 2000 Paper

Paper

New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Pierre Boher, Patrick Evrard, Jean-Philippe Piel, Jean-Louis Stehle

Proceedings Volume 4099, (2000) https://doi.org/10.1117/12.405821

KEYWORDS: Reflectivity, Photoresist materials, Dielectrics, X-rays, Spectroscopic ellipsometry, Chromium, Ultraviolet radiation, Refractive index, Oxides, Thin films

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Proceedings Article | 23 August 2000 Paper

Paper

Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool

Pierre Boher, Christopher Pickering, Alexandre Tarnowka, Jean-Philippe Piel, Patrick Evrard, Jean-Louis Stehle

Proceedings Volume 4182, (2000) https://doi.org/10.1117/12.410067

KEYWORDS: Metrology, Silicon, Spectroscopic ellipsometry, Oxides, Semiconducting wafers, Polarizers, Germanium, Interfaces, Chlorine, Spectroscopy

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Proceedings Article | 2 June 2000 Paper

Paper

New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Pierre Boher, Jean-Philippe Piel, Patrick Evrard, Christophe Defranoux, Marta Espinosa, Jean-Louis Stehle

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386494

KEYWORDS: X-rays, Photoresist materials, Spectroscopic ellipsometry, Reflectivity, Dielectrics, Thin films, Ultraviolet radiation, Spectroscopy, Reflection, Transmittance

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Proceedings Article | 14 June 1999 Paper

Paper

High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm wafer technology

Pierre Boher, Christophe Defranoux, Sophie Bourtault, Jean-Louis Stehle

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350873

KEYWORDS: Semiconducting wafers, Photoresist materials, Deep ultraviolet, Antireflective coatings, Mirrors, Spectroscopes, Multilayers, Spectroscopy, Spectroscopic ellipsometry, Wafer-level optics

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Proceedings Article | 11 June 1999 Paper

Paper

New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry

Pierre Boher, Christophe Defranoux, Jean-Philippe Piel, Jean-Louis Stehle

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350195

KEYWORDS: Photoresist materials, Refractive index, Absorption, Spectroscopy, Semiconducting wafers, Spectroscopic ellipsometry, Silicon, Calibration, Refraction, Lithography

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Proceedings Article | 28 April 1999 Paper

Paper

New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry

Pierre Boher, Christophe Defranoux, Jean-Philippe Piel, Jean-Louis Stehle

Proceedings Volume 3741, (1999) https://doi.org/10.1117/12.346880

KEYWORDS: Photoresist materials, Refractive index, Absorption, Spectroscopy, Spectroscopic ellipsometry, Semiconducting wafers, Silicon, Lithography, Time metrology, Calibration

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Proceedings Article | 28 April 1999 Paper

Paper

New versatile system for characterization of antireflective coatings using combined spectroscopic ellipsometry and grazing x-ray reflectance

Pierre Boher, Patrick Evrard, Jean-Louis Stehle

Proceedings Volume 3741, (1999) https://doi.org/10.1117/12.346881

KEYWORDS: X-rays, Reflectivity, Deep ultraviolet, Antireflective coatings, Spectroscopic ellipsometry, X-ray characterization, Optical lithography, Spectroscopy, Thin films, Multilayers

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Proceedings Article | 27 April 1999 Paper

Paper

High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm-wafer technology

Pierre Boher, Christophe Defranoux, Sophie Bourtault, Jean-Louis Stehle

Proceedings Volume 3743, (1999) https://doi.org/10.1117/12.346910

KEYWORDS: Photoresist materials, Semiconducting wafers, Deep ultraviolet, Antireflective coatings, Mirrors, Spectroscopes, Spectroscopic ellipsometry, Wafer-level optics, Multilayers, Spectroscopy

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Proceedings Article | 4 September 1998 Paper

Paper

New process for manufacturing thin SiGe and SiGeC epitaxial films on silicon by ion implantation and excimer laser annealing

Pierre Boher, Jean-Louis Stehle, Jean-Philippe Piel, Eric Fogarassy

Proceedings Volume 3506, (1998) https://doi.org/10.1117/12.323972

KEYWORDS: Silicon, Annealing, Carbon, Excimer lasers, Semiconductor lasers, Germanium, Crystals, Silicon carbide, Helium, Ion implantation

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Proceedings Article | 3 September 1998 Paper

Paper

Real-time spectroscopic reflectometer for end-point detection on multichamber deposition processes

Pierre Boher, Sebastien Noygues, Jean-Louis Stehle

Proceedings Volume 3507, (1998) https://doi.org/10.1117/12.324348

KEYWORDS: Reflectance spectroscopy, Amorphous silicon, Glasses, Silicon, Digital signal processing, Spectroscopy, Deposition processes, Optical fibers, Reflectometry, Process control

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Proceedings Article | 3 September 1998 Paper

Paper

SOPRA SE3000: a new tool for high-accuracy characterization of multilayer structures on very small spot size

Pierre Boher, Marc Bucchia, Jean Pierre Rey, Jean-Louis Stehle

Proceedings Volume 3507, (1998) https://doi.org/10.1117/12.324358

KEYWORDS: Semiconducting wafers, Wafer-level optics, Mirrors, Multilayers, Optical parametric oscillators, Spectroscopic ellipsometry, UV optics, Deep ultraviolet, Spectroscopy, Silicon

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Proceedings Article | 26 May 1998 Paper

Paper

Synthesis of high-quality Si1-yCy and Si1-x-yGexCy epitaxial layers on <100> Si by ion implantation and pulsed excimer laser crystallization

Jean-Jacques Grob, Eric Fogarassy, Adriana Grob, Dominique Muller, Bernard Prevot, Roland Stuck, Salome de Unamuno, Pierre Boher, Marc Stehle

Proceedings Volume 3404, (1998) https://doi.org/10.1117/12.308655

KEYWORDS: Silicon, Silicon carbide, Excimer lasers, Carbon, Germanium, Crystals, Annealing, Pulsed laser operation, Ion implantation, Laser crystals

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Proceedings Article | 7 July 1997 Paper

Paper

Precise measurement of ARC optical indices in the deep-UV range by variable-angle spectroscopic ellipsometry

Pierre Boher, Jean-Louis Stehle, Jean-Philippe Piel, Christophe Defranoux, Louis Hennet

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275961

KEYWORDS: Deep ultraviolet, Reflectivity, X-rays, Absorption, Spectroscopic ellipsometry, Silicon, Optical testing, Reflection, UV optics, Antireflective coatings

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Proceedings Article | 9 May 1997 Paper

Paper

Growth of Si1-yCy/Si and Si1-x-yGexCy/Si heterostructures by ion implantation and pulsed excimer laser-induced epitaxy

Eric Fogarassy, Adriana Grob, Jean-Jacques Grob, Dominique Muller, Bernard Prevot, Roland Stuck, Salome de Unamuno, Pierre Boher, Marc Stehle

Proceedings Volume 2991, (1997) https://doi.org/10.1117/12.273728

KEYWORDS: Silicon, Silicon carbide, Excimer lasers, Carbon, Germanium, Annealing, Crystals, Semiconductor lasers, Pulsed laser operation, Laser crystals

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Proceedings Article | 16 August 1996 Paper

Paper

Characterization of laser-annealed polysilicon by spectroscopic ellipsometry and comparison to other techniques

Pierre Boher, Jean-Louis Stehle, Y. Suzuki, Akira Iwasaki

Proceedings Volume 2873, (1996) https://doi.org/10.1117/12.246245

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Proceedings Article | 16 August 1996 Paper

Paper

Fine characterization of ITO layers by spectroscopic ellipsometry

Pierre Boher, Christophe Defranoux, Jean-Philippe Piel, Jean-Louis Stehle, Y. Suzuki

Proceedings Volume 2873, (1996) https://doi.org/10.1117/12.246246

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Proceedings Article | 16 August 1996 Paper

Paper

Single-shot excimer laser annealing of PECVD amorphous silicon

Pierre Boher, Dorian Zahorski, Sylvie Prochasson, Bruno Godard, Jean-Louis Stehle, Y. Suzuki, Akira Iwasaki

Proceedings Volume 2873, (1996) https://doi.org/10.1117/12.246244

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Proceedings Article | 7 June 1996 Paper

Paper

Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range

Pierre Boher, Jean-Philippe Piel, Christophe Defranoux, Jean-Louis Stehle, Louis Hennet

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240988

KEYWORDS: Deep ultraviolet, Reflectivity, Absorption, Ultraviolet radiation, Spectroscopic ellipsometry, X-rays, Antireflective coatings, Reflection, Silicon, Oxides

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Proceedings Article | 21 January 1993 Paper

Paper

Ni/C and Rh/C multilayers for soft x-ray optics: influence of the deposition conditions on the nanostructure

Pierre Boher, Philippe Houdy, M. Ouahabi, Robert Barchewitz, Philippe Troussel, J. Joud, C. Senillou

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140569

KEYWORDS: Carbon, Rhodium, Interfaces, Etching, Nickel, Crystals, X-rays, Argon, Sputter deposition, Ions

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Proceedings Article | 21 January 1993 Paper

Paper

Fabrication and performance of linear multilayer gratings in the 44-130 Angstrom wavelength range

Pierre Boher, Philippe Houdy, Chantal Khan Malek, F. Ladan, S. Bac, Daniel Schirmann, Philippe Troussel, Michael Krumrey, Peter Mueller, Frank Scholze

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140580

KEYWORDS: Multilayers, Carbon, X-rays, Diffraction gratings, Reflectivity, Silicon, Gold, Sensors, Reflection, Interfaces

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Proceedings Article | 23 November 1992 Paper

Paper

rf-sputtered Fe/Ge multilayers for neutron-polarizing monochromators

Pierre Boher, Philippe Houdy, M. Monkenbusch, J. Penfold, J. Eastoe, David Smith

Proceedings Volume 1738, (1992) https://doi.org/10.1117/12.130629

KEYWORDS: Iron, Germanium, Crystals, Interfaces, X-rays, Mirrors, Optical components, Magnetism, Monochromators, X-ray diffraction

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Proceedings Article | 23 November 1992 Paper

Paper

Low d-spacing titanium-based multilayers for neutrons

Pierre Boher, Philippe Houdy, Andreas Magerl, K. Yamada, Yasuo Endoh, P. Ruterana

Proceedings Volume 1738, (1992) https://doi.org/10.1117/12.130620

KEYWORDS: Titanium, X-rays, Tin, Nitrogen, Interfaces, Reflectivity, Scattering, Transmission electron microscopy, Optical components, X-ray diffraction

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Proceedings Article | 1 January 1992 Paper

Paper

Experimental study of Fe/C multilayer performance: effects of substrate quality and of x-ray irradiation

Eric Ziegler, M. Krisch, L. Vasquez, Jean Susini, Pierre Boher, Philippe Houdy

Proceedings Volume 1547, (1992) https://doi.org/10.1117/12.51286

KEYWORDS: Multilayers, X-rays, Scanning tunneling microscopy, X-ray optics, Reflectivity, Synchrotrons, Iron, Coating, Carbon, Silicon

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Proceedings Article | 1 January 1992 Paper

Paper

Structural characteristics and performances of rf-sputtered Mo/Si and Co/Si multilayers for soft x-ray optics

Pierre Boher, Philippe Houdy, Louis Hennet, Mikhael Kuehne, Peter Mueller, J. Frontier, P. Trouslard, C. Senillou, J. Joud, P. Ruterana

Proceedings Volume 1547, (1992) https://doi.org/10.1117/12.51267

KEYWORDS: Silicon, Interfaces, Molybdenum, X-rays, Crystals, Cobalt, X-ray optics, Argon, Mirrors, Reflectivity

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Proceedings Article | 1 January 1992 Paper

Paper

Magnesium-silicide-based multilayers for soft x-ray optics

Pierre Boher, Philippe Houdy, Louis Hennet, Zhigang Li, Abhijit Modak, David Smith, M. Idir, T. Moreno, Robert Barchewitz, Mikhael Kuehne, Peter Mueller, Jean-Pierre Delaboudiniere

Proceedings Volume 1546, (1992) https://doi.org/10.1117/12.51211

KEYWORDS: X-rays, Magnesium, Silicon, Multilayers, Interfaces, Tungsten, Reflectivity, Californium, X-ray optics, Grazing incidence

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Using a diode rf-sputtering technique, different magnesium silicide based multilayer systems have been deposited in very thin films for optical applications in the soft x-ray range. A detailed structural analysis of the different multilayers has been made using in-situ kinetic ellipsometry, ex-situ grazing x-ray reflection at the copper K-(alpha) line and transmission electron microscopy. The multilayer performances have been measured by synchrotron radiation at the magnesium K-(alpha) and L-(alpha) lines and related to the structural characteristics. For short wavelength, the W/Mg2Si system shows characteristics very similar to those of the more common W/Si system. Non-negligible interdiffusion and limited interface roughness allow the layer thicknesses to be reduced to very low values. Well-defined Bragg peaks are observed even when the double period is as low as 44 angstrom. First Bragg peak reflectivity as high as 31 has been measured at 9.89 angstrom for a multilayer with a double period equal to 84 angstrom and a limited number of periods. This preliminary result is very promising for future applications in the field of x-ray fluorescence analysis. W/Mg2Si and Si3N4/Mg2Si multilayers have also been fabricated for use at higher wavelengths around the Mg L-(alpha) line (286 angstrom). In the case of the W/Mg2Si multilayers have also been fabricated for use at higher wavelengths around the Mg L-(alpha) line (286 angstrom). In the case of the W/Mg2Si system, the tungsten layers are crystallized due to their higher thickness and consequently the interface roughness is slightly higher. In spite of this, more than 20 reflectivity at the first Bragg peak has been measured at normal incidence on different W/Mg2Si samples, with a selectivity two times better than conventional Mo/Si mirrors ((lambda) /(delta) (lambda) approximately equals 20). When we replace tungsten by a thin silicon nitride layer deposited by reactive sputtering, we increase the selectivity up to (lambda) /(delta) (lambda) approximately equals 30, and the thermal stability is drastically improved ( 800 degree(s)C).

Proceedings Article | 1 January 1992 Paper

Paper

Tungsten/boron nitride multilayers for XUV optical applications

Pierre Boher, Louis Hennet, F. Pierre, David Smith, Abhijit Modak, M. Idir, Robert Barchewitz

Proceedings Volume 1546, (1992) https://doi.org/10.1117/12.51212

KEYWORDS: Boron, Nitrogen, X-rays, Multilayers, Tungsten, Reflectivity, Interfaces, Grazing incidence, Surface roughness, X-ray optics

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SPIE Journal Paper | 1 August 1991

Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical applications

Pierre Boher, Philippe Houdy, Louis Hennet, Jean-Pierre Delaboudiniere, Mikhael Kuehne, P. Muller, Zhigang Li, David Smith

OE, Vol. 30, Issue 08, (August 1991) https://doi.org/10.1117/12.10.1117/12.55920

KEYWORDS: Silicon, Multilayers, X-rays, Reflectivity, Oxygen, Nitrogen, Interfaces, Ellipsometry, Reflection, Absorption

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Proceedings Article | 1 February 1991 Paper

Paper

Silicon/silicon oxide and silicon/silicon nitride multilayers for XUV optical applications

Pierre Boher, Philippe Houdy, Louis Hennet, Jean-Pierre Delaboudiniere, Mikhael Kuehne, Peter Mueller, Zhigang Li, David Smith

Proceedings Volume 1343, (1991) https://doi.org/10.1117/12.23176

KEYWORDS: Silicon, X-rays, Multilayers, Reflectivity, Oxygen, Nitrogen, Ellipsometry, Interfaces, Absorption, Astronomical imaging

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Proceedings Article | 1 January 1991 Paper

Paper

Comparative study of carbon and boron carbide spacing layers inside soft x-ray mirrors

Pierre Boher, Philippe Houdy, P. Kaikati, Robert Barchewitz, L. Van Ijzendoorn, Zhigang Li, David Smith, J. Joud

Proceedings Volume 1345, (1991) https://doi.org/10.1117/12.23312

KEYWORDS: Boron, Carbon, Rhodium, Interfaces, X-rays, Tungsten, Iron, Argon, Reflectivity, Crystals

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Proceedings Article | 1 January 1991 Paper

Paper

Three materials soft x-ray mirrors: theory and application

Pierre Boher, Louis Hennet, Philippe Houdy

Proceedings Volume 1345, (1991) https://doi.org/10.1117/12.23315

KEYWORDS: Reflectivity, Carbon, X-rays, Rhodium, Boron, Tungsten, Interfaces, Argon, Absorption, Crystals

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Advances in Display Technologies XIII

30 January 2023 | San Francisco, California, United States

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24 January 2022 | San Francisco, California, United States

Advances in Display Technologies XI

6 March 2021 | Online Only, California, United States

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5 February 2020 | San Francisco, California, United States

Advances in Display Technologies IX

7 February 2019 | San Francisco, California, United States

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