Dr. Seongtae Jeong Profile

Dr. Seongtae Jeong

Samsung Fellow at Samsung Electronics Co Ltd

SPIE Involvement:

Conference Program Committee | Author

Proceedings Article | 22 April 2024 Poster + Paper

Advanced pattern selection and coverage check for computational lithography

Keonwoo Bae, Taekyum Kim, Sanghwa Lee, Bongkeun Kim, Seongtae Jeong, Jenny Tang, Qian Zhao, Yiqiong Zhao, Chang-Il Choi, Jiao Liang, Uwe Paul Schroeder, Mark Simmons

Proceedings Volume 12957, 129571M (2024) https://doi.org/10.1117/12.3009845

KEYWORDS: Calibration, Optical proximity correction, Extreme ultraviolet, Data modeling, Education and training, Performance modeling, Advanced patterning, Metrology, Machine learning, Databases

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Proceedings Article | 10 April 2024 Presentation + Paper

Advanced pattern defect detection and analysis with artificial intelligence

Sangchul Yeo, Yongsun Jang, Yeongju Guk, Seungju Shin, Hee Jeong, Kyungjae Park, Dawoon Choi, Jaewon Yang, Bongkeun Kim, Kyoil Koo, Seongtae Jeong

Proceedings Volume 12955, 129551E (2024) https://doi.org/10.1117/12.3009806

KEYWORDS: Image classification, Semiconducting wafers, Feature extraction, Artificial intelligence, Machine learning, Visualization, Image processing, Image enhancement, Design, Advanced patterning

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Proceedings Article | 21 November 2023 Presentation + Paper

Deep learning-based detection of mask rule check violations in curvilinear mask

Sooyong Lee, Jeeyong Lee, Sinjeung Park, Byungjun Kang, Juyun Park, Bongkeun Kim, Joonsung Kim, Seung-Hune Yang, Seongtae Jeong

Proceedings Volume 12751, 1275109 (2023) https://doi.org/10.1117/12.2685488

KEYWORDS: Transformers, Visualization, Design and modelling, Deep learning, Image classification, Data modeling

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Proceedings Article | 21 November 2023 Presentation + Paper

Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection

Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang, Chang-Min Park, Kyoil Koo, Seongtae Jeong, John Biafore, Mark Smith, Trey Graves, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Kunlun Bai, Janez Krek, Craig Higgins, Sergei Bakarian, Kyeongeun Ko, Roel Gronheid, Kaushik Sah, Andrew Cross, Yi Liu, Alessandro Vaglio Pret, Chris Walker, Vikram Tolani, George Hwa, Peter Hu, Chang Song, Alex Arkhipov, Loemba Bouckou, Chi-Ping Liu, Xiaochun Yang, Kana O'Hara, Donghwan Son

Proceedings Volume 12750, 127500C (2023) https://doi.org/10.1117/12.2687373

KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Printing, Semiconducting wafers, Photoresist materials, Extreme ultraviolet lithography, Statistical analysis, Physical phenomena

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Proceedings Article | 1 May 2023 Presentation + Paper

A novel approach to etch-process-aware intensive layout retarget

Jeeyong Lee, Yangwoo Heo, Ryanggeun Lee, Sangwook Kim, Jisuk Hong, Kyoil Koo, Changmook Yim, Jungmin Kim, Sooyong Lee, Joonsung Kim, Dongho Kim, Seung-Hune Yang, Seongtae Jeong

Proceedings Volume 12499, 124990C (2023) https://doi.org/10.1117/12.2657880

KEYWORDS: Etching, Data modeling, Modeling, Machine learning, Design and modelling, Statistical modeling, Optical proximity correction, Reflection, Feature extraction, Artificial intelligence

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Proceedings Article | 28 April 2023 Presentation + Paper

Unsupervised ML classification driven process model coverage check

SeungWon Song, Seokyoon Jeong, Sangwoo Park, Jungkee Choi, WoonHyuk Choi, No-young Chung, Seongtae Jeong, Fan Jiang, Liang Cao, Le Hong, Junhyoung Park, Doohwan Kwak, Jongwon Lee, Harin Kim, Jiyoung Lee

Proceedings Volume 12495, 1249518 (2023) https://doi.org/10.1117/12.2658322

KEYWORDS: Data modeling, Process modeling, Machine learning, Optical proximity correction, Statistical modeling, Calibration, Instrument modeling, Metrology, Design and modelling, Resolution enhancement technologies

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Proceedings Article | 12 May 2005 Paper

Lithography enabling for the 65 nm node gate layer patterning with alternating PSM

Alexander Tritchkov, Seongtae Jeong, Christopher Kenyon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601606

KEYWORDS: Photomasks, Optical proximity correction, Optical lithography, Model-based design, Semiconducting wafers, Lithography, Critical dimension metrology, Binary data, Logic, Phase shifts

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Proceedings Article | 21 July 2000 Paper

Actinic defect counting statistics over 1-cm2 area of EUVL mask blank

Seongtae Jeong, Chih-wei Lai, Senajith Rekawa, Christopher Walton, Jeffrey Bokor

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390080

KEYWORDS: Inspection, Extreme ultraviolet, Photons, Photomasks, Extreme ultraviolet lithography, Interference (communication), Mirrors, Defect inspection, Scattering, Particles

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Proceedings Article | 30 December 1999 Paper

Comparison of at-wavelenth inspection, printability, and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography (EUVL)

Gregory Cardinale, John Goldsmith, Avijit Ray-Chaudhuri, Aaron Fisher, Scott Hector, Pawitter Mangat, Zorian Masnyj, David Mancini, Bill Wilkinson, Jeffrey Bokor, Seongtae Jeong, Scott Burkhart, Charles Cerjan, Christopher Walton, Cindy Larson, Pei-yang Yan, Guojing Zhang

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373339

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Inspection, Chromium, Scanning electron microscopy, Reticles, Silicon films, Printing

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Proceedings Article | 30 December 1999 Paper

Cross-correlation between actinic and visible defect inspection tool for extreme ultraviolet lithography

Seongtae Jeong, Chih-wei Lai, Senajith Rekawa, Christopher Walton, Shon Prisbrey, Jeffrey Bokor

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373375

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Scattering, Photomasks, Sensors, Scanners, Signal detection, Defect inspection, Multilayers

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Proceedings Article | 19 July 1999 Paper

Nondestructive picosecond ultrasonic characterization of Mo/Si multilayers using a novel pump-probe scheme

Nen-Wen Pu, Seongtae Jeong, Rian Zhao, Jeffrey Bokor

Proceedings Volume 3749, (1999) https://doi.org/10.1117/12.355075

KEYWORDS: Picosecond phenomena, Ultrasonics, Multilayers, Nondestructive evaluation, Reflectivity, Absorption, X-ray optics, Signal to noise ratio, Molybdenum, Acoustics

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Proceedings Article | 25 June 1999 Paper

Actinic EUVL mask blank defect inspection system

Seongtae Jeong, Lewis Johnson, Yun Lin, Senajith Rekawa, Pei-yang Yan, Patrick Kearney, Edita Tejnil, James Underwood, Jeffrey Bokor

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351101

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Opacity, Sensors, Multilayers, Inspection, Defect detection, Signal detection, Defect inspection, Particles

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Proceedings Article | 25 June 1999 Paper

Picosecond ultrasonic characterization of Mo/Si multilayers for extreme ultraviolet lithography

Nen-Wen Pu, Seongtae Jeong, Rian Zhao, Jeffrey Bokor

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351136

KEYWORDS: Multilayers, Reflectivity, Picosecond phenomena, Ultrasonics, Extreme ultraviolet lithography, Molybdenum, Extreme ultraviolet, Nondestructive evaluation, Acoustics, Laser beam diagnostics

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Proceedings Article | 18 December 1998 Paper

Actinic detection of EUVL mask blank defects

Seongtae Jeong, Mourad Idir, Lewis Johnson, Yun Lin, Phillip Batson, Richard Levesque, Patrick Kearney, Pei-yang Yan, Eric Gullikson, James Underwood, Jeffrey Bokor

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332865

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Sensors, Multilayers, Reflectivity, Mirrors, Defect detection, Etching

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Showing 5 of 14 publications

Conference Committee Involvement (3)

DTCO and Computational Patterning IV

23 February 2025 | San Jose, California, United States

DTCO and Computational Patterning III

26 February 2024 | San Jose, California, United States

DTCO and Computational Patterning II

27 February 2023 | San Jose, California, United States

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