3-dimensional chiplet device architectures are expected to provide improved device performance, efficiency, and footprint beyond what is capable with 2-dimensional scaling technologies. Thick resist lithography of damascene and plating resists, as well as organic dielectric materials, plays a critical role in chiplet integration. However, thick resist lithography requires viscous resist solutions, specialized tooling, and long processing times. This makes patterning using these resists inherently prone to uniformity issues, which has become a crucial issue for scaling. This work highlights two strategic areas of thick resist patterning development: improved resist coating methods; and enhanced focus control during exposure. Herein, we show a track-based method for carefully controlled uniformity of the resist coating thickness, with some sacrifice of through-put. In addition, we show stepper-based focus methods to account for die level variations in resist and wafer thickness, as well as local topography. Combined, these provide precise cross-wafer control of thick resist dimensions.
Analyses of unit process trace data are critical components of modern semiconductor manufacturing process control. While process development environments share many characteristics with manufacturing environments, development tools and processes may not be suitable candidates for the deployment of traditional trace analytics such as FDC applications. Here we describe the adaptive use of large scale, proactive process trace monitoring and reactive root cause analytics for supporting development operations. The large-scale monitoring application we have deployed is comprehensive in scope and scale and focusses on monitoring the stability of a chamber over time. The reactive root cause application we have deployed automatically searches large trace data spaces to identify trace data elements with potentially interesting relationships to variations in on-wafer measurements and is designed to handle the small sample sizes encountered frequently in development operations.
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