Dr. Theodore H. Fedynyshyn
Senior Staff Member at MIT Lincoln Lab
SPIE Involvement:
Author
Publications (41)

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10146, 101461H (2017) https://doi.org/10.1117/12.2256649
KEYWORDS: Electron beam lithography, Maskless lithography, Etching, Photoresist processing, Silicon, Photoresist materials, Microfabrication, Lithography, Semiconducting wafers, Critical dimension metrology, Resistance

Proceedings Article | 8 April 2011 Paper
Gian Lorusso, Natalia Davydova, Mark Eurlings, Cemil Kaya, Yue Peng, Kees Feenstra, Theodore Fedynyshyn, Oliver Natt, Peter Huber, Christoph Zaczek, Stuart Young, Paul Graeupner, Eric Hendrickx
Proceedings Volume 7969, 79692O (2011) https://doi.org/10.1117/12.879381
KEYWORDS: Deep ultraviolet, Extreme ultraviolet, Photomasks, Aluminum, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Plasma, Photoresist materials, Data modeling

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7637, 76370N (2010) https://doi.org/10.1117/12.846000
KEYWORDS: Electron beam lithography, Nanostructures, Picosecond phenomena, Silicon, Polymers, Scanning electron microscopy, Semiconducting wafers, Lithography, Photomicroscopy, Polymer thin films

Proceedings Article | 26 March 2010 Paper
Theodore Fedynyshyn, Russell Goodman, Alberto Cabral, Charles Tarrio, Thomas Lucatorto
Proceedings Volume 7639, 76390A (2010) https://doi.org/10.1117/12.845997
KEYWORDS: Polymers, Extreme ultraviolet, Quantum efficiency, Polymer thin films, Extreme ultraviolet lithography, Absorbance, Polymethylmethacrylate, Photochemistry, EUV optics, Semiconducting wafers

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72731W (2009) https://doi.org/10.1117/12.814342
KEYWORDS: Extreme ultraviolet, Absorbance, Reflectivity, Semiconducting wafers, Polymers, Extreme ultraviolet lithography, Mirrors, Lithography, Silicon, Titanium dioxide

Showing 5 of 41 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 12 June 2003

SPIE Conference Volume | 24 July 2002

Conference Committee Involvement (2)
Advances in Resist Technology and Processing XX
24 February 2003 | Santa Clara, California, United States
Advances in Resist Technology and Processing XIX
4 March 2002 | Santa Clara, California, United States
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