Dr. Charles Tarrio Profile

Dr. Charles Tarrio

retired at (none)

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Author

Publications (40)

Proceedings Article | 21 November 2023 Presentation + Paper

NIST efforts in extreme-ultraviolet metrology

R. Vest, T. Germer, B. Barnes, C. Tarrio, S. Grantham, S. Moffitt, B. Simonds, M. Spidell

Proceedings Volume 12750, 127500F (2023) https://doi.org/10.1117/12.2686832

KEYWORDS: Extreme ultraviolet, Tunable filters, Metrology, Extreme ultraviolet lithography, Radiometry, Scatterometry, Vacuum chambers, Reflectivity, Polarization, Equipment

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Proceedings Article | 9 September 2019 Paper

Thin aluminum/polyimide optical blocking filter study for the Lynx x-ray mission

Benjamin Zeiger, Charles Tarrio, Travis Ayers

Proceedings Volume 11118, 111181P (2019) https://doi.org/10.1117/12.2529755

KEYWORDS: Aluminum, Optical filters, Transmittance, Oxidation, Signal attenuation, X-rays, Ultraviolet radiation, Infrared radiation

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Proceedings Article | 16 March 2015 Paper

Development and evaluation of interface-stabilized and reactive-sputtered oxide-capped multilayers for EUV lithography

Michael Kriese, Yuriy Platonov, Jim Rodriguez, Charles Tarrio, Steven Grantham, Shannon Hill, Thomas Lucatorto, John Curry, Gary Fournier

Proceedings Volume 9422, 94220K (2015) https://doi.org/10.1117/12.2085934

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Annealing, Resistance, Oxides, Reflectometry, Silicon, Oxidation

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Proceedings Article | 13 March 2015 Paper

Collaborative work on reducing the intersite gaps in outgassing qualification

Soichi Inoue, Eishi Shiobara, Takeshi Sasami, Isamu Takagi, Yukiko Kikuchi, Toru Fujimori, Shinya Minegishi, Robert Berg, Thomas Lucatorto, Shannon Hill, Charles Tarrio, Ivan Pollentier, Yu-Jen Fan, Dominic Ashworth, Yen-Chih Lin

Proceedings Volume 9422, 942212 (2015) https://doi.org/10.1117/12.2085700

KEYWORDS: Semiconducting wafers, Contamination, Picosecond phenomena, Temperature metrology, Extreme ultraviolet, Molecules, Extreme ultraviolet lithography, Electron beams, Standards development, Lithography

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Proceedings Article | 17 April 2014 Paper

Improved measurement capabilities at the NIST EUV reflectometry facility

T. Germer, J. Rife, C. Tarrio, S. Grantham, T. Lucatorto, M. Kriese, Y. Platonov, L. Jiang, J. Rodriguez

Proceedings Volume 9048, 90481I (2014) https://doi.org/10.1117/12.2046290

KEYWORDS: Sensors, Extreme ultraviolet, Reflectometry, Polarization, Radiation effects, Reflectivity, Motion models, EUV optics, 3D modeling, Data modeling

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Proceedings Article | 18 March 2014 Paper

Development of an EUVL collector with infrared radiation suppression

Bodo Ehlers, Michael Kriese, Yuriy Platonov, Licai Jiang, Jim Rodriguez, Ulrich Mueller, Jay Daniel, Shayna Khatri, Adam Magruder, Steven Grantham, Charles Tarrio, Thomas Lucatorto

Proceedings Volume 9048, 90483C (2014) https://doi.org/10.1117/12.2049279

KEYWORDS: Extreme ultraviolet, Reflectivity, Infrared radiation, Extreme ultraviolet lithography, Plasma, Infrared technology, Neodymium, Nickel, Surface finishing, Diffraction gratings

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Proceedings Article | 1 April 2013 Paper

Relationship between resist related outgassing and witness sample contamination in the NXE outgas qualification using electrons and EUV

I. Pollentier, R. Lokasani, R. Gronheid, S. Hill, C. Tarrio, T. Lucatorto

Proceedings Volume 8679, 86790K (2013) https://doi.org/10.1117/12.2011541

KEYWORDS: Semiconducting wafers, Contamination, Electrons, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Photons, Mirrors, Beam shaping, EUV optics

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EUV photoresists are considered as a potential source of optics contamination, since they introduce irradiation induced outgassing in the EUV vacuum environment. Therefore, before these resists can be used on e.g. ASML NXE:3100 or NXE:3300, they need to be tested in dedicated equipment according to a well-defined procedure, which is based on exposing a witness sample (WS) in the vicinity of a simultaneously exposed resist as it outgasses. Such an outgassing test infrastructure is available at many sites, but exposure modes on the witness sample and wafer can be significantly different, which potentially could lead to different test results. In this investigation, we first explored in more detail the relationship between resist outgassing as measured by RGA (Residual Gas Analysis) and the carbon growth obtained in the WS test. A good correlation was found by using a timeintegrated and mass-weighted sum of the RGA-measured mass peaks. Next, the impact of the resist exposure mode on the WS contamination result was investigated at imec, where the outgas test setup allows to expose the wafer with EUV irradiation as well as electrons in the same vacuum environment. It was found that minor differences observed in the WS test results, can be explained by adequate characterization of exposure intensity distribution and dose control. Finally the WS test results at imec from the different exposure modes were compared to the test results at NIST. The small differences in contamination that were observed could be explained by differences in test procedure, by using the time dependent RGA approach. From the combined work on outgassing measurements and WS contamination testing we have significantly improved our understanding of the relationship between outgassing and contamination processes induced by EUV photons and electrons. We have also demonstrated how to compare results obtained at different outgas testing sites, which is important in quantifying the potential risk to EUV device manufacturing posed by resist outgassing.

Proceedings Article | 1 April 2013 Paper

Effects of varying the parameters in witness-sample-based photoresist outgas testing: dependence of the carbon growth on pumping speed and the dose, time, and area of resist exposure

S. Hill, C. Tarrio, R. Berg, S. Grantham, N. Faradzhev, T. Lucatorto

Proceedings Volume 8679, 867920 (2013) https://doi.org/10.1117/12.2011663

KEYWORDS: Semiconducting wafers, Carbon, Extreme ultraviolet, Contamination, Photoresist materials, Extreme ultraviolet lithography, Mirrors, Molecules, Manufacturing, Scanners

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Proceedings Article | 26 March 2011 Paper

The NIST EUV facility for advanced photoresist qualification using the witness-sample test

N. Harned, C. Tarrio, C. Kaya, L. Richter, R. Hoefnagels, S. Grantham, M. Silova, S. Hill, T. Lucatorto, J. van Dijk, J. Steinhoff

Proceedings Volume 7969, 79690K (2011) https://doi.org/10.1117/12.879519

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Photoresist materials, Extreme ultraviolet, Contamination, Scanners, Electrons, Mirrors, Carbon, Synchrotrons

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Proceedings Article | 26 March 2011 Paper

Optics contamination studies in support of high-throughput EUV lithography tools

S. Grantham, N. Faradzhev, T. Feigl, S. Hill, C. Tarrio, V. Nesterenko, L. Richter, T. Lucatorto, S. Yulin, M. Schürmann

Proceedings Volume 7969, 79690M (2011) https://doi.org/10.1117/12.879852

KEYWORDS: Contamination, Extreme ultraviolet lithography, Extreme ultraviolet, EUV optics, Carbon, Molecules, Synchrotrons, Mirrors, Ruthenium, Spectroscopic ellipsometry

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Proceedings Article | 26 March 2010 Paper

Polymer photochemistry at the EUV wavelength

Russell Goodman, Charles Tarrio, Alberto Cabral, Thomas Lucatorto, Theodore Fedynyshyn

Proceedings Volume 7639, 76390A (2010) https://doi.org/10.1117/12.845997

KEYWORDS: Polymers, Extreme ultraviolet, Quantum efficiency, Polymer thin films, Extreme ultraviolet lithography, Absorbance, Polymethylmethacrylate, Photochemistry, EUV optics, Semiconducting wafers

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Proceedings Article | 18 March 2009 Paper

EUVL dosimetry at NIST

Noreen Harned, T. Lucatorto, C. Tarrio, R. Vest, M. Cangemi, S. Grantham

Proceedings Volume 7271, 72713X (2009) https://doi.org/10.1117/12.813690

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Calibration, Photoresist materials, Extreme ultraviolet lithography, Polymers, Photodiodes, Standards development, Coating, Transmittance

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Proceedings Article | 18 March 2009 Paper

Tracking down sources of carbon contamination in EUVL exposure tools

T. Lucatorto, C. Tarrio, R. Caudillo, R. Vest

Proceedings Volume 7271, 727112 (2009) https://doi.org/10.1117/12.813684

KEYWORDS: Molecules, Carbon, Extreme ultraviolet lithography, Statistical analysis, Ions, Contamination, Photoresist materials, Gases, Liquids, Nitrogen

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Proceedings Article | 18 March 2009 Paper

Measuring the EUV-induced contamination rates of TiO2-capped multilayer optics by anticipated production-environment hydrocarbons

T. Lucatorto, C. Tarrio, B. Yakshinskiy, T. Madey, R. Bartynski, S. Hill, N. Faradzhev

Proceedings Volume 7271, 727113 (2009) https://doi.org/10.1117/12.814111

KEYWORDS: Contamination, Extreme ultraviolet lithography, Protactinium, Molecules, Extreme ultraviolet, Reflectivity, Carbon, Synchrotrons, Molecular interactions, Titanium dioxide

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Proceedings Article | 28 March 2008 Paper

Extreme ultraviolet resist outgassing and its effect on nearby optics

Rashi Garg, Gregory Denbeaux, Chimaobi Mbanaso, Alin Antohe, Yu-Jen Fan, Kim Dean, Saša Bajt, Steven Grantham, Eric Gullikson, Kevin Orvek, Warren Montgomery, Frank Goodwin, Charles Tarrio, Chiew-Seng Koay, Andrea Wüest, Andy Aquila, Yayi Wei, Obert Wood, Justin Waterman, Leonid Yankulin

Proceedings Volume 6921, 69211G (2008) https://doi.org/10.1117/12.772670

KEYWORDS: Mirrors, Reflectivity, EUV optics, Molecules, Extreme ultraviolet lithography, Contamination, Spectroscopy, Extreme ultraviolet, Photoresist materials, Calibration

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Proceedings Article | 20 March 2008 Paper

Quantitative measurement of outgas products from EUV photoresists

S. Hill, C. Tarrio, R. Vest, G. Denbeaux, C. Mbanaso, J. Hendricks, K.-W. Choi, B. Benner, K. Orvek, P. Abbott, S. Grantham, A. Antohe, T. Lucatorto

Proceedings Volume 6921, 69211H (2008) https://doi.org/10.1117/12.772686

KEYWORDS: Semiconducting wafers, Molecules, Extreme ultraviolet lithography, Photoresist materials, Statistical analysis, Extreme ultraviolet, Capacitance, EUV optics, Mass spectrometry, Chemical analysis

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Proceedings Article | 20 March 2008 Paper

Accelerated lifetime metrology of EUV multilayer mirrors in hydrocarbon environments

S. Yulin, T. Madey, C. Tarrio, B. Yakshinskiy, S. Hill, T. Lucatorto, E. Loginova, N. Faradzhev

Proceedings Volume 6921, 692117 (2008) https://doi.org/10.1117/12.772627

KEYWORDS: Reflectivity, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Carbon, Ruthenium, Reflectometry, Solids, Molecules, Oxidation

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Proceedings Article | 18 May 2007 Paper

Multilayers for next-generation x-ray sources

S. Grantham, J. Alameda, S. Bajt, C. Tarrio, S. Hau-Riege, B. Kjornrattanawanich, F. Dollar, H. Chapman, C. Walton, E. Spiller, A. Aquila, A. Nelson, E. Gullikson

Proceedings Volume 6586, 65860J (2007) https://doi.org/10.1117/12.724786

KEYWORDS: Reflectivity, Mirrors, Multilayers, Free electron lasers, Silicon, X-ray optics, X-rays, X-ray sources, Coating, Optical components

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Proceedings Article | 19 March 2007 Paper

Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors

T. Madey, M. Chandhok, M. Fang, S. Bajt, C. Tarrio, T. Lucatorto, S. Hill, I. Ermanoski

Proceedings Volume 6517, 65170G (2007) https://doi.org/10.1117/12.712286

KEYWORDS: Reflectivity, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Carbon, Silicon, Ruthenium, Electrons, Ions, Oxidation

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Proceedings Article | 15 March 2007 Paper

Energetic and thermal Sn interactions and their effect on EUVL source collector mirror lifetime at high temperatures

M. Nieto, A. Hassanein, C. Tarrio, J. Allain, S. Grantham, V. Bakshi, M. Hendricks

Proceedings Volume 6517, 65171V (2007) https://doi.org/10.1117/12.711270

KEYWORDS: Tin, Mirrors, Extreme ultraviolet, Reflectivity, Palladium, Extreme ultraviolet lithography, Ions, Ruthenium, Particles, Chemical species

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Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources remains one of the highest critical issues of source component lifetime and commercial feasibility of EUV lithography technology. Studies at Argonne have focused on understanding the underlying mechanisms that hinder collector mirror performance under Sn exposure and developing methods to mitigate them. Both Sn ion irradiation and thermal evaporation exposes candidate mirrors tested (i.e., Ru, Rh and Pd) in the experimental facility known as IMPACT (Interaction of Materials with charged Particles and Components Testing). Studies have led to an understanding of how Sn energetic ions compared to Sn thermal atoms affect three main surface properties of the collector mirror: 1) surface chemical state, 2) surface structure and 3) surface morphology. All these properties are crucial in understanding how collector mirrors will respond to Sn-based EUV source operation. This is primarily due to the correlation of how variation in these properties affects the reflectivity of photons in the EUV spectral range of interest (in-band 13.5-nm). This paper discusses the first property and its impact on 13.5-nm reflectivity. Investigation in the IMPACT experiment has focused on Sn thermal and energetic particle exposure on collector mirrors (Ru, Pd and Rh) and its effect on mirror performance as a function of incident thermal flux, incident ion flux, incident angle and temperature. This is possible by a new state-of-the-art in-situ EUV reflectometry system that measures real time relative EUV reflectivity at 15-degree incidence and 13.5-nm during Sn exposure. These results are then compared to at-wavelength EUV reflectivity measurements using the newly upgraded NIST-SURF facility. Sn energetic ions at 1- keV and fluxes of about 10¹³ cm^-2s^-1 are used in conjunction with a moderate flux Sn evaporative source delivering Sn fluences ranging from 10¹⁵-10¹⁷ cm^-2. The temperature of the mirror sample is locally varied between 25 and 200 C with the chemical state of the surface simultaneously monitored using X-ray photoelectron spectroscopy, and lowenergy ion scattering spectroscopy. Results demonstrate the balance between energetic and thermal Sn has on the total Sn surface fraction during exposure and its effect on the structural and reflective properties of the mirror surface.

Proceedings Article | 23 March 2006 Paper

EUV testing of multilayer mirrors: critical issues

S. Grantham, O. Wood, S. Bajt, N. Edwards, T. Lucatorto, P. Yan, S. Hill, S. Wurm, I. Ermanoski, M. Chandhok, T. Madey, C. Tarrio

Proceedings Volume 6151, 61510F (2006) https://doi.org/10.1117/12.656502

KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Carbon monoxide, Extreme ultraviolet lithography, Molecules, EUV optics, Carbon, Reflectometry, Synchrotrons

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Proceedings Article | 8 September 2005 Paper

Narrow-band EUV multilayer coating for the MOSES sounding rocket

Jeffery Gum, Benjawan Kjornrattanawanich, Roger Thomas, Charles Kankelborg, Ritva Keski-Kuha, Joseph Dvorak, Steven Grantham, Charles Tarrio, Scott Owens

Proceedings Volume 5900, 590003 (2005) https://doi.org/10.1117/12.617520

KEYWORDS: Coating, Reflectivity, Extreme ultraviolet, Multilayers, Silicon, Reflection, Iron, Spectrographs, Rockets, Optical design

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Proceedings Article | 6 May 2005 Paper

EUV component and system characterization at NIST for the support of extreme-ultraviolet lithography

R. Vest, S. Grantham, T. Lucatorto, C. Tarrio, S. Hill

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599528

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Sensors, Calibration, Metrology, Silicon, Radiometry, Lithography, Photodiodes, Multilayers

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Proceedings Article | 20 May 2004 Paper

Scaling studies of capping layer oxidation by water exposure with EUV radiation and electrons

Stefan Wurm, Nora Edwards, Leonard Klebanoff, W. Clift, Charles Tarrio, Obert Wood, Steven Grantham

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537403

KEYWORDS: Electrons, Extreme ultraviolet lithography, Silicon, Oxides, Extreme ultraviolet, Oxygen, EUV optics, Mirrors, Reflectivity, Oxidation

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Proceedings Article | 16 June 2003 Paper

Design and performance of capping layers for EUV multilayer mirrors

Michael Malinowski, Steven Grantham, Andy Aquila, Henry Chapman, Eric Gullikson, Nhan Nguyen, Charles Tarrio, Sasa Bajt, Jennifer Alameda, Jeffrey Robinson

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484966

KEYWORDS: Reflectivity, Multilayers, Electron beams, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Ruthenium, Silicon, Molybdenum, Oxidation

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Proceedings Article | 1 July 2002 Paper

First results from the updated NIST/DARPA EUV reflectometry facility

Thomas Lucatorto, Matthew Squires, Charles Tarrio, Steven Grantham

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472309

KEYWORDS: Reflectivity, Sensors, Monochromators, Reflectometry, Extreme ultraviolet, Mirrors, Signal detection, Extreme ultraviolet lithography, Optical filters, Cameras

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Proceedings Article | 20 December 2001 Paper

Upgrades to the NIST/DARPA EUV reflectometry facility

Matthew Squires, Steven Grantham, Charles Tarrio, Thomas Lucatorto, Lu Deng, Uwe Arp

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450961

KEYWORDS: Extreme ultraviolet, Sensors, Reflectometry, Mirrors, Reflectivity, EUV optics, Extreme ultraviolet lithography, Monochromators, Optical filters, Beryllium

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Proceedings Article | 18 June 2001 Paper

Absolute extreme-ultraviolet metrology

Robert Vest, Charles Tarrio, Steven Grantham

Proceedings Volume 4450, (2001) https://doi.org/10.1117/12.431244

KEYWORDS: Extreme ultraviolet, Sensors, Photodiodes, Calibration, Reflectivity, Silicon, Mirrors, Multilayers, Metrology, Extreme ultraviolet lithography

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Proceedings Article | 23 November 1999 Paper

Smoothing of mirror substrates by thin-film deposition

Eberhard Spiller, Sherry Baker, Charles Tarrio, Enrique Parra

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371112

KEYWORDS: Mirrors, Multilayers, Thin films, Silicon, Spatial frequencies, Atomic force microscopy, Extreme ultraviolet, Scattering, Thin film deposition, EUV optics

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Proceedings Article | 22 September 1999 Paper

Methods to remove distortion artifacts in scanned projections

Charles Tarrio, Cornelia Retsch, Ian McNulty, Barry Winn, Zachary Levine, Y. Wang, Andrew Kalukin, Sean Frigo, Markus Kuhn

Proceedings Volume 3772, (1999) https://doi.org/10.1117/12.363726

KEYWORDS: Distortion, Tomography, Aluminum, 3D image processing, X-rays, Integrated circuits, Image segmentation, X-ray microscopy, Microscopes, Reconstruction algorithms

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Proceedings Article | 15 October 1997 Paper

Objective Crystal Spectrometer (OXS) on the Spectrum-X-y satellite: crystal calibrations

Leif Gerward, Charles Tarrio, Harm-Jan Voorma, Herbert Schnopper, Eric Louis, Eberhard Spiller, Salim Abdali, Hans-Joachim Wiebicke, Finn Christensen, Ingolf Halm

Proceedings Volume 3114, (1997) https://doi.org/10.1117/12.283779

KEYWORDS: Crystals, Reflectivity, Mirrors, Spectroscopy, Multilayers, Silicon, Laser induced fluorescence, X-rays, Calibration, Laser crystals

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Proceedings Article | 19 July 1996 Paper

Soft x-ray calibration of the Co/C multilayer mirrors for the Objective Crystal Spectrometer on the Spectrum Roentgen-Gamma satellite

Charles Tarrio, Salim Abdali, Herbert Schnopper, Finn Christensen

Proceedings Volume 2805, (1996) https://doi.org/10.1117/12.245114

KEYWORDS: Crystals, Reflectivity, X-rays, Spectroscopy, Satellites, Solids, Calibration, Mirrors, Polishing, Multilayers

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Proceedings Article | 20 June 1995 Paper

Fabrication of multilayer optics by sputtering: application to EUV optics with greater than 30% normal reflectance

Richard Watts, Richard Hoover, Palmer Peters, Arthur Walker, Charles Tarrio

Proceedings Volume 2515, (1995) https://doi.org/10.1117/12.212625

KEYWORDS: Sputter deposition, Multilayers, EUV optics, Reflectivity, Niobium, Plasma, Extreme ultraviolet, X-ray optics, Contamination, Gases

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Proceedings Article | 20 June 1995 Paper

Multilayer x-ray mirrors for the objective crystal spectrometer on the Spectrum Roentgen Gamma satellite

Finn Christensen, Peter Frederiksen, Charles Tarrio, Fred Bijkerk, Salim Abdali, Eric Gullikson, Harm-Jan Voorma, Eberhard Spiller, Eric Louis, Norbert Koster

Proceedings Volume 2515, (1995) https://doi.org/10.1117/12.212588

KEYWORDS: Crystals, Reflectivity, Multilayers, Polishing, X-rays, Mirrors, Spectroscopy, Krypton, Ions, Interfaces

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Proceedings Article | 20 June 1995 Paper

Normal incidence optics for solar coronal imaging

George Nystrom, Eric Gullikson, Eberhard Spiller, Charles Tarrio, Janusz Wilczynski, Leon Golub

Proceedings Volume 2515, (1995) https://doi.org/10.1117/12.212583

KEYWORDS: Mirrors, Reflectivity, Polishing, X-rays, Telescopes, X-ray telescopes, Multilayers, Surface finishing, Coronagraphy, Ions

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Proceedings Article | 11 November 1994 Paper

Design, structure, and performance of narrow band multilayer mirrors for solar imaging

Richard Deslattes, Richard Watts, Charles Tarrio, Axel Bartos, Joseph Pedulla

Proceedings Volume 2279, (1994) https://doi.org/10.1117/12.193138

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet, X-rays, Mirrors, Reflectometry, Interfaces, Data modeling, Spectral resolution, Ion beams

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Proceedings Article | 1 February 1994 Paper

Improved reflectometry facility at the National Institute of Standards and Technology

Richard Watts, Charles Tarrio, M. Haass, Thomas Lucatorto, T. Callcott, J. Jia

Proceedings Volume 2011, (1994) https://doi.org/10.1117/12.167221

KEYWORDS: Monochromators, Reflectometry, Reflectivity, X-rays, Standards development, X-ray optics, Mirrors, Spectral resolution, Diffraction gratings, Beryllium

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Proceedings Article | 21 January 1993 Paper

New method for achieving accurate thickness control for uniform and graded multilayer coatings on large flat substrates

Kevin Parker, John Keem, Charles Tarrio, James Wood, George Gutman, Richard Watts

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140602

KEYWORDS: Multilayers, Mirrors, Sputter deposition, X-rays, Photomasks, Silicon, Optical coatings, Calibration, X-ray diffraction, X-ray optics

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Proceedings Article | 21 January 1993 Paper

Soft x-ray reflectometry program at the National Insitute of Standards and Technology

Richard Watts, Thomas Lucatorto, Charles Tarrio

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140570

KEYWORDS: Reflectometry, Monochromators, Extreme ultraviolet, Mirrors, Reflectivity, X-rays, X-ray technology, Multilayers, Standards development, Optical filters

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Proceedings Article | 21 January 1993 Paper

Ultrahigh-resolution photographic films for x-ray/EUV/FUV astronomy

Arthur Walker, Craig DeForest, Charles Tarrio, Richard Watts, Richard Hoover

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140587

KEYWORDS: Extreme ultraviolet, Photography, X-ray telescopes, Spatial resolution, X-rays, Spectroscopy, Coronagraphy, Image resolution, Sensors, Calibration

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Showing 5 of 40 publications

Conference Committee Involvement (1)

Optical Constants of Materials for UV to X-Ray Wavelengths

4 August 2004 | Denver, Colorado, United States

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