Dr. Michael D. Kriese Profile

Dr. Michael D. Kriese

Coatings Scientist at Rigaku Innovative Technologies

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Publications (13)

Proceedings Article | 26 March 2019 Paper

High-precision MoSi multilayer coatings at high-volume for continued EUVL infrastructure development

Michael Kriese, Yang Li, Jeffery Steele, Yuriy Platonov

Proceedings Volume 10957, 109571I (2019) https://doi.org/10.1117/12.2514989

KEYWORDS: Multilayers, Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Chromium, Scattering, Optical coatings, EUV optics, Reflection

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Proceedings Article | 19 March 2018 Presentation + Paper

Diffuser concepts for in-situ wavefront measurements of EUV projection optics

Mark van de Kerkhof, Robbert Jan Voogd, Ad Schasfoort, Evert Westerhuis, Wouter Engelen, Manfred Dikkers, Yassin Chowdhury, Michael Kriese, Stefan Bäumer, Uwe Zeitner, Torsten Feigl

Proceedings Volume 10583, 105830S (2018) https://doi.org/10.1117/12.2297433

KEYWORDS: Diffusers, Extreme ultraviolet, Scanners, Scattering, Extreme ultraviolet lithography, Molybdenum

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Proceedings Article | 16 October 2017 Paper

High-precision MoSi multilayer coatings for radial and 2D designs on curved optics

Michael Kriese, Yang Li, Yuriy Platonov

Proceedings Volume 10450, 1045025 (2017) https://doi.org/10.1117/12.2281646

KEYWORDS: Multilayers, Optical spheres, Optical coatings, Optical design, EUV optics, Aspheric lenses, Extreme ultraviolet lithography, Optical arrays, Aspheric optics, Modulation

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The development of industrial infrastructure for EUV lithography requires a wide array of optics beyond the mask and the scanner optics, which include optics for critical instruments such as exposure testing and actinic inspection. This paper will detail recent results in the production of a variety of high-precision multilayer coatings achieved to support this development. It is critical that the optical designs factor in the capabilities of the achievable multilayer gradients and the associated achievable precision, including impact to surface distortion from the added figure error of the multilayer coating, which adds additional requirements of a specific shape to the period distribution. For example, two different coatings may achieve a ±0.2% variation in multilayer period, but have considerably different added figure error. Part I of the paper will focus on radially-symmetric spherical and aspherical optics. Typical azimuthal uniformity (variation at a fixed radius) achieved is less than ±0.005nm total variation, including measurement precision, on concave optics up to 200mm diameter. For highly curved convex optics (radius of curvature less than 50mm), precision is more challenging and the total variation increases to ±0.01nm total variation for optics 10-30mm in diameter. Total added figure error achieved has been as low as 0.05nm. Part II of the paper will focus on multilayer designs graded in two directions, rather than radially, in order to accommodate the increased complexity of elliptical, toroidal and hyperbolic surfaces. In most cases, the symmetry of the required multilayer gradient does not match the symmetry of the optical surface, and this interaction must be countered via the process design. Achieving such results requires additional flexibility in the design of the deposition equipment, and will be discussed with several examples in the paper, such as the use of variable velocity of an inline substrate carrier in conjunction with a shaped target aperture to produce ±0.03nm total variation on an off-axis elliptical surface.

Proceedings Article | 16 March 2015 Paper

Development and evaluation of interface-stabilized and reactive-sputtered oxide-capped multilayers for EUV lithography

Michael Kriese, Yuriy Platonov, Jim Rodriguez, Gary Fournier, Steven Grantham, Charles Tarrio, John Curry, Shannon Hill, Thomas Lucatorto

Proceedings Volume 9422, 94220K (2015) https://doi.org/10.1117/12.2085934

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Annealing, Resistance, Oxides, Reflectometry, Silicon, Oxidation

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Proceedings Article | 17 April 2014 Paper

Improved measurement capabilities at the NIST EUV reflectometry facility

C. Tarrio, S. Grantham, T. Germer, J. Rife, T. Lucatorto, M. Kriese, Y. Platonov, L. Jiang, J. Rodriguez

Proceedings Volume 9048, 90481I (2014) https://doi.org/10.1117/12.2046290

KEYWORDS: Sensors, Extreme ultraviolet, Reflectometry, Polarization, Radiation effects, Reflectivity, Motion models, EUV optics, 3D modeling, Data modeling

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Proceedings Article | 18 March 2014 Paper

Development of an EUVL collector with infrared radiation suppression

Michael Kriese, Yuriy Platonov, Bodo Ehlers, Licai Jiang, Jim Rodriguez, Ulrich Mueller, Jay Daniel, Shayna Khatri, Adam Magruder, Steven Grantham, Charles Tarrio, Thomas Lucatorto

Proceedings Volume 9048, 90483C (2014) https://doi.org/10.1117/12.2049279

KEYWORDS: Extreme ultraviolet, Reflectivity, Infrared radiation, Extreme ultraviolet lithography, Plasma, Infrared technology, Neodymium, Nickel, Surface finishing, Diffraction gratings

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Proceedings Article | 4 May 2011 Paper

Multilayers for next generation EUVL at 6.X nm

Yuriy Platonov, Jim Rodriguez, Michael Kriese, Eric Gullikson, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 8076, 80760N (2011) https://doi.org/10.1117/12.889519

KEYWORDS: Reflectivity, Extreme ultraviolet lithography, Lanthanum, Multilayers, Extreme ultraviolet, Mirrors, Sputter deposition, Laser beam diagnostics, Boron, X-ray optics

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Proceedings Article | 6 May 2005 Paper

Characterization of prototype optical surfaces and coatings for the EUV reticle imaging microscope

H. Glatzel, J. Daniel, K. Khajehnouri, T. Roff, S. Sporer, S. Wong, M. Kriese, Y. Platonov, J. Rodriguez

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.619290

KEYWORDS: Optical coatings, Reflectivity, Photovoltaics, Extreme ultraviolet, Microscopes, Reticles, Light scattering, Mirrors, Atomic force microscopy, Prototyping

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Proceedings Article | 17 December 2003 Paper

Initial results of new photomask-blank deposition tool

Michael Kriese, James Rodriguez, Yuriy Platonov, James Wood

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518314

KEYWORDS: Multilayers, Photomasks, Extreme ultraviolet, Thin films, Thin film coatings, Ions, Particles, Reflectivity, Ion beams, Sputter deposition

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Proceedings Article | 28 August 2003 Paper

Initial capability of new photomask-blank deposition tool

Michael Kriese, James Wood, James Rodriguez, Gary Fournier, David Thompson, David Mercer, Jason Gass, Dale Mauldin

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504179

KEYWORDS: Multilayers, Photomasks, Extreme ultraviolet, Thin films, Thin film coatings, Particles, Reflectivity, Ions, Ion beams, Sputter deposition

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Proceedings Article | 5 January 2001 Paper

Controlling thin film thickness distribution in two dimensions

David Broadway, Michael Kriese, Yuriy Platonov

Proceedings Volume 4145, (2001) https://doi.org/10.1117/12.411623

KEYWORDS: Coating, Thin films, Spherical lenses, Sputter deposition, Chemical species, Data modeling, Process control, Thin film deposition, Geometrical optics, Reflectors

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Proceedings Article | 23 November 1999 Paper

Control of Mo/Si multilayers for soft x-ray performance

Michael Kriese, Gary Fournier, James Rodriguez, Yuriy Platonov

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371123

KEYWORDS: X-rays, Optical coatings, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Reflectivity, Photomasks, X-ray optics, Sputter deposition, Process control

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Proceedings Article | 23 November 1999 Paper

Progress in the development of three-aspherical mirror optics for EUVL

Hiroo Kinoshita, Takeo Watanabe, Daniel Bajuk, Jay Daniel, Yachiyo Kimpara, Michael Kriese, Yuriy Platonov

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371114

KEYWORDS: Mirrors, Extreme ultraviolet lithography, Multilayers, Reflectivity, Coating, Surface finishing, Polishing, Phase interferometry, Interferometers, Semiconducting wafers

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Showing 5 of 13 publications

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