Dr. Wolfgang Hoppe
at Synopsys GmbH
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 10 April 2024 Presentation + Paper
Enas Sakr, Zac Levinson, Rob DeLancey, C. Jay Lee, Jinguang Li, Ryan Chen, Robert Iwanow, Delian Yang, Wolfgang Hoppe, Folarin Latinwo, Kevin Lucas, Peng Liu
Proceedings Volume 12954, 129540N (2024) https://doi.org/10.1117/12.3013089
KEYWORDS: Optical proximity correction, Electromagnetism, Semiconducting wafers, Extreme ultraviolet, Cadmium, 3D mask effects, Modeling, Lithography, Computational lithography, Ranging

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12954, 129540V (2024) https://doi.org/10.1117/12.3012806
KEYWORDS: Optical proximity correction, Design, Reticles, Image processing, Reflectivity, Extreme ultraviolet lithography, Scanners, Semiconducting wafers, Printing, Optical simulations

Proceedings Article | 28 April 2023 Presentation + Paper
Enas Sakr, Rob DeLancey, Wolfgang Hoppe, Zac Levinson, Robert Iwanow, Ryan Chen, Delian Yang, Kevin Lucas
Proceedings Volume 12495, 124950P (2023) https://doi.org/10.1117/12.2658720
KEYWORDS: Extreme ultraviolet, Optical proximity correction, Multilayers, Optical lithography, Modeling, 3D mask effects

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 124950B (2023) https://doi.org/10.1117/12.2659721
KEYWORDS: Reticles, Etching, Tolerancing, Extreme ultraviolet lithography, Simulations, Mirrors, Scanners, Manufacturing, Semiconducting wafers, Metals

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 124950W (2023) https://doi.org/10.1117/12.2658780
KEYWORDS: Stochastic processes, Resistance, Simulations, Overlay metrology, Optical lithography, Lithography, Optical proximity correction, Ruthenium, Etching

Showing 5 of 21 publications
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