PROCEEDINGS VOLUME 8441
PHOTOMASK AND NGL MASK TECHNOLOGY XIX | 17-19 APRIL 2012
Photomask and Next-Generation Lithography Mask Technology XIX
Editor(s): Kokoro Kato
Editor Affiliations +
IN THIS VOLUME

17 Sessions, 59 Papers, 0 Presentations, 0 Posters
Metrology I  (4)
Writing I  (3)
Repair  (3)
MDP I  (4)
Writing II  (2)
Metrology II  (1)
Inspection I  (4)
MDP II  (3)
PHOTOMASK AND NGL MASK TECHNOLOGY XIX
17-19 April 2012
Yokohama, Japan
Front Matter: Volume 8441
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844101 (2013) https://doi.org/10.1117/12.999461
Mask Process and Degradation I
Yun-Yue Lin, Sean Su, Wen-Chang Hsush, Ta-Cheng Lien, Jia-Jen Chen, Shin-Chang Lee, Anthony Yen
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844102 (2012) https://doi.org/10.1117/12.964411
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844103 (2012) https://doi.org/10.1117/12.964671
Jong-Min Kim, Ik-Boum Hur, Dong-Heok Lee, Sang-Soo Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844104 (2012) https://doi.org/10.1117/12.977217
Masatoshi Terayama, Hideaki Sakurai, Mari Sakai, Masamitsu Itoh, Hideo Funakoshi, Hideaki Iwasaka, Junko Iizuka, Mitsuaki Maruyama, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844105 (2012) https://doi.org/10.1117/12.979645
Metrology I
Bertrand Le Gratiet, Raphaël Zékri, Frank Sundermann, Thomas Trautzsch, Thomas Thaler, Robert Birkner, Ute Buttgereit
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844106 (2012) https://doi.org/10.1117/12.976858
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844107 (2012) https://doi.org/10.1117/12.978706
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844108 (2012) https://doi.org/10.1117/12.999462
Yuta Chihara, Keisuke Ito, Masayuki Kuribara, Toshimichi Iwai, Soichi Shida, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844109 (2012) https://doi.org/10.1117/12.964404
Writing I
Erez Graitzer, Avi Cohen, Vladimir Dmitriev, Itamar Balla, Dan Avizemer, Dirk Beyer, Klaus Boehm, Wolfgang Degel
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410A (2012) https://doi.org/10.1117/12.976632
Elmar Platzgummer, Christof Klein, Hans Loeschner
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410B (2012) https://doi.org/10.1117/12.978999
Sukjong Bae, Jin Choi, Sung Hoon Park, Byung Gook Kim, Chan-Uk Jeon
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410C (2012) https://doi.org/10.1117/12.981613
Repair
Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Osamu Takaoka, Yasuhiko Sugiyama, Hiroshi Oba, Kazuo Aita, Anto Yasaka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410D (2012) https://doi.org/10.1117/12.981167
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410E (2012) https://doi.org/10.1117/12.964959
M. Waiblinger, R. Jonckheere, Tristan Bret, D. Van den Heuvel, C. Baur, G. Baralia
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410F (2012) https://doi.org/10.1117/12.978285
EDA, OPC and RET
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410G (2012) https://doi.org/10.1117/12.970297
John L. Sturtevant, Edita Tejnil
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410H (2012) https://doi.org/10.1117/12.978190
Yasushi Kojima, Akemi Moniwa, Tatsuya Maruyama, Manabu Ishibashi, Hironobu Taoka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410I (2012) https://doi.org/10.1117/12.964398
KunYuan Chen, ChunCheng Liao, ChiaWei Tsai, ChaoHeng Chen, Makoto Miyagi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410J (2012) https://doi.org/10.1117/12.939131
Xin Zheng, Jensheng Huang, Fook Chin, Aram Kazarian, Chun-Chieh Kuo
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410K (2012) https://doi.org/10.1117/12.964973
FPD Photomasks
Kazuya Shiojiri
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410L (2012) https://doi.org/10.1117/12.981451
Makoto Takagi, Kouji Yamaguchi, Hideki Chida, Tsuneo Munakata, Nobuto Ono
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410M (2012) https://doi.org/10.1117/12.981996
Peter Ekberg, Axel von Sydow
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410N (2012) https://doi.org/10.1117/12.970249
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410O (2013) https://doi.org/10.1117/12.1000135
Makoto Yonezawa, Tosho Cho, Makoto Takano, Masahiro Toriguchi, Masafumi Shinoda, Mitsuru Hamakawa, Seiki Matsumoto
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410P (2012) https://doi.org/10.1117/12.970391
MDP I
Chang-woo Kang, Jae-pil Shin, Bhardwaj Durvasula, Sang-won Seo, Dae-hyun Jung, Jong-bae Lee, Young-kwan Park
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410Q (2012) https://doi.org/10.1117/12.954019
Kokoro Kato, Yoshiyuki Taniguchi, Tadao Inoue, Kazuya Kadota
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410R (2012) https://doi.org/10.1117/12.970255
Antonio Marques, Corinne Miramond, Omar Ndiaye
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410S (2012) https://doi.org/10.1117/12.978290
Erwin Deng, Rachel Lee, Chun Der Lee
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410T (2012) https://doi.org/10.1117/12.964097
EDA, OPC, and RET
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410U (2012) https://doi.org/10.1117/12.965565
Chain Ting Huang, Cloud Cheng, Ming Jui Chen
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410V (2012) https://doi.org/10.1117/12.964397
Mohammad K. A. Kamel, Mohamed Al-Imam
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410W (2012) https://doi.org/10.1117/12.977202
Mask Process and Degradation II
Jinsang Yoon, Han-Shin Lee, Hyoyeon Kim, Heungsuk Oh, Jaehyuck Choi, Paul Chung, Inkyun Shin, Chanuk Jeon
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410X (2012) https://doi.org/10.1117/12.979820
Byung Gook Kim, Jin Choi, Sang Hee Lee, Chan Uk Jeon
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410Y (2012) https://doi.org/10.1117/12.979387
Shu Li Chen, T. Y. Fang, Ryan Lai, Chun Der Lee, Shang Hao Yeh, Timmy Chen
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84410Z (2012) https://doi.org/10.1117/12.964254
Mina Douzono, Itsuka Shimada, Tatsuji Ueda, Tatsuo Nonaka, Yukihiro Kawano, Masashi Murakami
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844110 (2012) https://doi.org/10.1117/12.964406
Writing II
Shusuke Yoshitake, Seiji Wake, Yasuo Sengoku, Saiko Hayashi, Tomohiro Iijima, Munehiro Ogasawara, Kiyoshi Hattori
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844111 (2012) https://doi.org/10.1117/12.979626
Sergey Babin, Sergey Borisov, Yasuki Kimura, Kenji Kono, Vladimir Militsin, Ryuuji Yamamoto
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844112 (2012) https://doi.org/10.1117/12.978924
Metrology II
Hidemitsu Hakii, Isao Yonekura, Yasushi Nishiyama, Keishi Tanaka, Kenji Komoto, Tsutomu Murakawa, Mitsuo Hiroyama, Soichi Shida, Masayuki Kuribara, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844113 (2012) https://doi.org/10.1117/12.977362
Inspection I
Kazunori Seki, Karen Badger, Emily Gallagher, Toshio Konishi, Gregory McIntyre
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844114 (2012) https://doi.org/10.1117/12.976059
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844115 (2012) https://doi.org/10.1117/12.964983
Masahiro Hatakeyama, Takeshi Murakami, Tsutomu Karimata, Kenji Watanabe, Yoshihiko Naito, Tsuyoshi Amano, Ryoichi Hirano, Susumu Iida, Hidehiro Watanabe, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844116 (2012) https://doi.org/10.1117/12.978633
Hideaki Hashimoto, Nobutaka Kikuiri, Ikunao Isomura, Manabu Isobe, Noriaki Musashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844117 (2012) https://doi.org/10.1117/12.973655
EUVL and NIL I
Takashi Kamo, Koji Murano, Kosuke Takai, Kazuki Hagihara, Shinji Yamaguchi, Masato Naka, Keiko Morishita, Ryoji Yoshikawa, Masamitsu Itoh, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844118 (2012) https://doi.org/10.1117/12.978976
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 844119 (2012) https://doi.org/10.1117/12.964413
Kazuaki Matsui, Takagi Noriaki, Isogawa Takeshi, Yutaka Kodera, Sakata Yo, Akima Shinji
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411A (2012) https://doi.org/10.1117/12.975824
Hideo Kobayashi, Hiromasa Iyama
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411B (2012) https://doi.org/10.1117/12.978282
Eiji Yamanaka, Keiko Morishita, Takamasa Takaki, Masanori Takahashi, Takashi Hirano, Masamitsu Itoh, Shigeki Nojima, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411C (2012) https://doi.org/10.1117/12.979703
MDP II
Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa, Tadao Inoue
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411D (2012) https://doi.org/10.1117/12.970256
Timothy Lin, Jed Rankin, Yuki Fujita, Adam C. Smith, Emile Sahouria, Ahmad Elayat, Peter Thwaite, Steffen Schulze
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411E (2012) https://doi.org/10.1117/12.978836
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411F (2012) https://doi.org/10.1117/12.981609
Inspection II
Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, Tsuyoshi Amano, Tsuneo Terasawa, Masahiro Hatakeyama, Takeshi Murakami
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411G (2012) https://doi.org/10.1117/12.978240
Takeshi Yamane, Tsuneo Terasawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411H (2012) https://doi.org/10.1117/12.978628
EUVL and NIL II
Tetsuo Harada, Masato Nakasuji, Takeo Watanabe, Yutaka Nagata, Hiroo Kinoshita
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411I (2012) https://doi.org/10.1117/12.952477
O. Brux, P. Dreß, H. Schmalfuß, R. Jonckheere, W. Koolen-Hermkens
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411J (2012) https://doi.org/10.1117/12.978198
Norihito Fukugami, Kazuaki Matsui, Genta Watanabe, Takeshi Isogawa, Shinpei Kondo, Yutaka Kodera, Yo Sakata, Shinji Akima, Jun Kotani, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411K (2012) https://doi.org/10.1117/12.965536
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411L (2012) https://doi.org/10.1117/12.964977
Tetsunori Murachi, Hiroyoshi Tanabe, Seh-Jin Park, Eric Gullikson, Taichi Ogase, Tsukasa Abe, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411M (2012) https://doi.org/10.1117/12.976817
Hideo Kobayashi, Shuji Kishimoto, Kouta Suzuki, Hiromasa Iyama, Sakae Nakatsuka, Kazutake Taniguchi, Takaeshi Kagatsume, Takashi Sato, Tsuyoshi Watanabe
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIX, 84411N (2012) https://doi.org/10.1117/12.978286
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