PROCEEDINGS VOLUME 4344
26TH ANNUAL INTERNATIONAL SYMPOSIUM ON MICROLITHOGRAPHY | 25 FEBRUARY - 2 MARCH 2001
Metrology, Inspection, and Process Control for Microlithography XV
Editor(s): Neal T. Sullivan
Editor Affiliations +
IN THIS VOLUME

17 Sessions, 90 Papers, 0 Presentations, 0 Posters
Defects I  (2)
Defects II  (2)
Overlay I  (6)
Standards  (3)
Overlay II  (4)
Modeling  (1)
CD Control I  (7)
Proceedings Volume 4344 is from: Logo
26TH ANNUAL INTERNATIONAL SYMPOSIUM ON MICROLITHOGRAPHY
25 February - 2 March 2001
Santa Clara, CA, United States
Invited Session
Christopher P. Ausschnitt
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436719
Defects I
Hidetoshi Nishiyama, Mari Nozoe, Koji Aramaki, Osamu Watanabe, Yoshihiro Ikeda
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436736
Gyu-Ho Lyu, Chang-Hwan Kim, Suk-Joo Lee, Hee-Hong Yang, Dae-Yup Lee, Ji-Yong Yoo, Jeong-Woo Lee, Yoo-Hyon Kim, Jeong-Lim Nam, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436747
Defects II
Michael Cross, Kaustuve Bhattacharyya
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436799
AFM Metrology
Bernardo D. Aumond, Kamal Youcef-Toumi
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436720
John A. Dagata, F. S. S. Chien, S. Gwo, K. Morimoto, Takahito Inoue, J. Itoh, Hiroshi Yokoyama
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436728
Michael Ray, Yves C. Martin
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436729
Overlay I
K. John Prasad, D. Arunagiri Rajan, Yew-Kong Tan, Gin Ping Sun, Stephen Morgan, Merritt Phillips, Bruce Ng
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436730
Chih-Ping Chen, Brian Huang, Wilson Lee, Wen-Jye Chung, Holden T.K. Hou
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436731
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436732
Amit Ghosh, Yew-Kong Tan, D. Arunagiri Rajan, Gin Ping Sun
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436733
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436734
David A. Crow, Ken Flugaur, Joseph C. Pellegrini, Etienne L. Joubert
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436735
Standards
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436737
John S. Villarrubia, Andras E. Vladar, Jeremiah R. Lowney, Michael T. Postek Jr.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436738
Ronald G. Dixson, Ndubuisi George Orji, Joseph Fu, Vincent Tsai, Ellen D. Williams, Raghu Kacker, Theodore V. Vorburger, Hal L. Edwards, Debra Cook, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436739
CD Control: Mask
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436740
Hsien Min Chang, W. B. Shieh, Johnson Liu, Brian Chu, L. H. Tu, James Cheng, David Wang, Jackie Cheng, Steve L. Hentschel, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436741
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436742
John A. Allgair, Michelle Ivy, Kevin Lucas, John L. Sturtevant, Richard C. Elliott, Chris A. Mack, Craig W. MacNaughton, John D. Miller, Mike Pochkowski, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436743
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436744
Overlay II
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436745
Qiang Wu, Zhijian G. Lu, Gary Williams, Franz X. Zach, Bernhard Liegl
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436746
Chen-Fu Chien, Kuo-Hao Chang, Chih-Ping Chen
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436748
Xuemei Chen, Moshe E. Preil, Mathilde Le Goff-Dussable, Mireille Maenhoudt
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436749
Modeling
Luca Grella, Gian Lorusso, Tim Niemi, Tzu-chin Chuang, David L. Adler
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436750
Poster Session
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436751
CD Control I
Kia Huat Gan, Yew-Kong Tan, Gin Ping Sun
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436752
KianSiong Ang, Shu Jin Low, AikChin Lim, CheeKeong Lim, LiahKee Loh, Yew-Kong Tan, Xu Xiang Yang
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436753
Scatterometry
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436754
CD Control I
Byung-Kap Kim, Suk-Joo Lee, Dae-Yup Lee, Jeong-Woo Lee, Jeong-Lim Nam
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436755
Seung-Jae Lee, Su Geun Lee, Min Kim, Sun-Hoo Park, Jeong-Lim Nam, Sang-In Lee
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436756
Amit Zeidler, Klaas-Jelle Veenstra, Terrence E. Zavecz
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436757
Harry Sewell, Victor F. Bunze, Nicholas DeLuca, Diane C. McCafferty
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436758
CD Control II
Michael Fritze, Brian Tyrrell, David K. Astolfi, Paul Davis, Bruce Wheeler, Renee D. Mallen, J. Jarmolowicz, Susan G. Cann, David Y. Chan, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436759
Sandra R. Dupuis, Timothy S. Hayes, Charles N. Archie, Eric P. Solecky
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436760
Beyond CD: Feature Shape and Metrology for Process Control
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436761
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436762
Chris A. Mack, Sven Jug, Rob Jones, Prasad Apte, Scott Richard Williams, Mike Pochkowski
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436763
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436764
New Technologies
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436765
Frank Scholze, Burkhard Beckhoff, G. Brandt, R. Fliegauf, Alexander Gottwald, Roman Klein, Bernd Meyer, U. D. Schwarz, R. Thornagel, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436766
Eric K. Lin, Wen-li Wu, Qinghuang Lin, Marie Angelopoulos
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436767
Steven D. Berger, Denis Desloge, Robert J. Virgalla, Todd Davis, Ted A. Paxton, David Witko
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436768
Scatterometry
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436769
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436770
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436771
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436772
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436773
300-mm production
Kevin M. Monahan, Arun K. Chatterjee, Georges Falessi, Ady Levy, Meryl D. Stoller
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436774
Late Breaking News
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436775
Xu Ouyang, C. Neil Berglund, Roger Fabian W. Pease
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436776
Richard M. Silver, Jau-Shi Jay Jun, Edward Kornegay, Robert D. Morton
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436777
Poster Session
Tetsuo Ohara
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436778
Fu-Hsiang Ko, Hsuen-Li Chen, Tiao-Yuan Huang, Hsu-Chun Cheng, Chu-Jung Ko, Tieh-Chi Chu
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436779
Shinichi Nakajima, Yuho Kanaya, Akira Takahashi, Koji Yoshida, Hideo Mizutani
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436780
Runhui Huang, Ryan E. Giedd
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436781
Sheng-Bai Zhu
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436782
Osamu Miyahara, Yukio Kiba, Yuko Ono
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436783
Dong-Seok Kim, JongHo Jeong, Byung-Ho Nam, Young Ju Hwang, Young Jin Song
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436784
Brian Martin, Tom Tighe, Graham G. Arthur
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436785
Defects II
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436786
Poster Session
Brian N. Martinick, William R. Roberts
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436787
Brian Martin, Graham G. Arthur
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436788
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436789
Graham G. Arthur, Brian Martin, Christine Wallace
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436790
Mauro Vasconi, Maddalena Bollin, Gina Cotti, Laurent Pain, Vincent Tirard
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436791
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436792
Dae-Joung Kim, Seok-Hwan Oh, Gisung Yeo, Yong-Guk Bae, Jaehwan Kim, Young-Hee Kim
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436793
Dryver R. Huston, Wolfgang Sauter, Patricia S. Bunt, Brian Esser
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436794
Ramon Navarro, Stefan Keij, Arie J. den Boef, Sicco Schets, Frank van Bilsen, Geert Simons, Ron Schuurhuis, Jaap Burghoorn
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436795
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436796
Xuelong Shi, Stephen Hsu, Robert John Socha, J. Fung Chen, Andy Cheng, Clyde Su, Jackie Cheng, Andy Chen, Henry Lin, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436797
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436798
Kelvin Walch, A. Meyyappan, Sylvain Muckenhirn, Jacques Margail
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436800
A. Meyyappan, Martin A. Klos, Sylvain Muckenhirn
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436801
Devon A. Kinkead, Anatoly Grayfer, Oleg P. Kishkovich
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436802
Ying Liu, Iain Black, Kezhou Xie
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436803
Ying Liu, Iain Black
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436804
Bradley N. Damazo, Andras E. Vladar, Alice V. Ling, M. Alkan Donmez, Michael T. Postek Jr., E. C. Jayewardene
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436805
Stephen Hsu, Xuelong Shi, Robert John Socha, J. Fung Chen, Jason C. Yee, Mohan Anath, Sunil Desai, Philip H. Imamura, Micheal J. Sherrill, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436806
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436807
Kyle Patterson, John L. Sturtevant, John R. Alvis, Nancy Benavides, Douglas Bonser, Nigel Cave, Carla Nelson-Thomas, William D. Taylor, Karen L. Turnquest
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436808
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436721
CD Control I
Grace H. Ho, Anthony Cheng, Chung-Jen Chen, C. K. Fang, Meng C. Li, I-Chung Chang, P. T. Chu, Y. C. Chu, K. Y. Shu, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436722
Poster Session
Andras E. Vladar, Michael T. Postek Jr., Nien-Fan Zhang, Robert D. Larrabee, Samuel N. Jones, Russell E. Hajdaj
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436723
Andras E. Vladar, Michael T. Postek Jr., Ronald Vane
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436724
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436725
Haiqing Zhou, Chih-Yu Wang, Joseph P. Pratt
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436726
Chien-Sung Liang, Haiqing Zhou, Mark A. Boehm, Ricky A. Jackson, Chih-Yu Wang, Michael D. Slessor
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XV, (2001) https://doi.org/10.1117/12.436727
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