PROCEEDINGS VOLUME 4099
INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE AND TECHNOLOGY | 30 JULY - 4 AUGUST 2000
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE AND TECHNOLOGY
30 July - 4 August 2000
San Diego, CA, United States
Semiconductor Application
Proc. SPIE 4099, Lithography: a look at what is ahead, 0000 (2 November 2000); doi: 10.1117/12.405806
Proc. SPIE 4099, Development of an automated optical system for the analysis of etch pits density and distribution on semiconductor materials, 0000 (2 November 2000); doi: 10.1117/12.405816
Proc. SPIE 4099, Optical microscopy at sub-0.1-um resolution for semiconductor applications, 0000 (2 November 2000); doi: 10.1117/12.405825
Proc. SPIE 4099, Optical characterization of doping profiles in silicon, 0000 (2 November 2000); doi: 10.1117/12.405834
Surface Roughness and Probe Technology
Proc. SPIE 4099, Nondestructive film thickness measurement using atomic force microscopy at ultrasonic frequencies, 0000 (2 November 2000); doi: 10.1117/12.405835
Proc. SPIE 4099, Evaluating optical and supersmooth surface using AFM in optical maunfacturing technology, 0000 (2 November 2000); doi: 10.1117/12.405836
Optical Scattering and Surface Roughness
Proc. SPIE 4099, Investigation on total scattering at 157 nm and 193 nm, 0000 (2 November 2000); doi: 10.1117/12.405837
Proc. SPIE 4099, DUV/VUV light scattering measurement of optical components for lithography applications, 0000 (2 November 2000); doi: 10.1117/12.405807
Optical Application
Proc. SPIE 4099, Multiscale mapping technique for the simultaneous estimation of absorption and partial scattering of optical coatings, 0000 (2 November 2000); doi: 10.1117/12.405808
Poster Session
Proc. SPIE 4099, X-ray study of the roughness of surfaces and interfaces, 0000 (2 November 2000); doi: 10.1117/12.405809
Optical Scattering and Surface Roughness
Proc. SPIE 4099, Microroughness analysis of thin film components for VUV applications, 0000 (2 November 2000); doi: 10.1117/12.405810
Optical Application
Proc. SPIE 4099, Standardization in optics characterization, 0000 (2 November 2000); doi: 10.1117/12.405811
Proc. SPIE 4099, New procedure for the optical characterization of high-quality thin films, 0000 (2 November 2000); doi: 10.1117/12.405812
Proc. SPIE 4099, Optical testing of long cylindrical lenses by means of scanning deflectometry, 0000 (2 November 2000); doi: 10.1117/12.405813
Proc. SPIE 4099, Methods, error influences, and limits for the ultraprecise measurement of slope and figure for large, slightly nonflat, or steep complex surfaces, 0000 (2 November 2000); doi: 10.1117/12.405814
Proc. SPIE 4099, Calibration tool for a CCD-camera-based vision system, 0000 (2 November 2000); doi: 10.1117/12.405815
Data Storage Application
Proc. SPIE 4099, Present and future interference microscope systems for magnetic head metrology, 0000 (2 November 2000); doi: 10.1117/12.405817
Proc. SPIE 4099, 2D-area/3D-volume holographic optical storage nanotechnology, 0000 (2 November 2000); doi: 10.1117/12.405818
Ellipsometry
Proc. SPIE 4099, Ellipsometry: a sophisticated tool for optical metrology, 0000 (2 November 2000); doi: 10.1117/12.405819
Proc. SPIE 4099, Variable angle spectroscopic ellipsometry in the vacuum ultraviolet, 0000 (2 November 2000); doi: 10.1117/12.405820
Proc. SPIE 4099, New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm, 0000 (2 November 2000); doi: 10.1117/12.405821
Proc. SPIE 4099, In-situ ellipsometric measurements of thin film aluminum oxidation, 0000 (2 November 2000); doi: 10.1117/12.405822
Proc. SPIE 4099, Rotating compensator spectroscopic ellipsometry (RCSE) and its application to high-k dielectric film HfO2, 0000 (2 November 2000); doi: 10.1117/12.405823
Nanostructure Characterization
Proc. SPIE 4099, Numerical investigation of the resolution in solid immersion lens systems, 0000 (2 November 2000); doi: 10.1117/12.405824
Proc. SPIE 4099, Characteristics of tantalum oxynitride films prepared by rf magnetron sputtering, 0000 (2 November 2000); doi: 10.1117/12.405826
Proc. SPIE 4099, Accuracy of the thin metallic wires diameter using Fraunhofer diffraction technique, 0000 (2 November 2000); doi: 10.1117/12.405827
Poster Session
Proc. SPIE 4099, X-ray investigations of a near surface layer of metal samples, 0000 (2 November 2000); doi: 10.1117/12.405828
Proc. SPIE 4099, Advanced methods for surface and subsurface defect characterization of optical components, 0000 (2 November 2000); doi: 10.1117/12.405829
Proc. SPIE 4099, Spectrophotometric determination of absorption in the DUV/VUV spectral range for MgF2 and LaF3 thin films, 0000 (2 November 2000); doi: 10.1117/12.405830
Proc. SPIE 4099, Investigations of transmittance and reflectance in the DUV/VUV spectral range, 0000 (2 November 2000); doi: 10.1117/12.405831
Semiconductor Application
Proc. SPIE 4099, Calibration requirements for identifying and sizing wafer defects by scanner measurements, 0000 (2 November 2000); doi: 10.1117/12.405832
Poster Session
Proc. SPIE 4099, Fast-scanning ellipsometry for thin film characterization, 0000 (2 November 2000); doi: 10.1117/12.405833
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